Abstract: A deposition device includes: a generation chamber; a deposition chamber; a transfer tubing; a target; a stage; and a mask member. The target is disposed in the deposition chamber, has an irradiation surface to be irradiated with the aerosol injected from the nozzle, and causes the raw material particles to be charged to plasma by collision with the irradiation surface. The stage has a support surface that supports a base material, fine particles of the raw material particles produced by discharging of the charged raw material particles being deposited on the base material. The mask member is disposed in the deposition chamber, and inhibits raw material particles specularly reflected on the irradiation surface, of the raw material particles that have been collided with the irradiation surface, from reaching the stage.

Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

Abstract: A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

Abstract: A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.

Abstract: An apparatus for manufacturing carbon nanohorns includes a production chamber configured to irradiate a solid carbon material with a laser beam to produce a product containing carbon nanohorns; and a separation mechanism configured to separate the product produced in the production chamber into a lightweight component and a heavyweight component. The heavyweight component includes carbon nanohorn aggregate with high purity, and high-purity carbon nanotubes can be obtained by collecting the heavyweight component.

Abstract: A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 ?m, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.

Abstract: A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.

Abstract: [Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 ?m diameter) to be more stably deposited on a substrate by using a simple configuration. [Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container 2, and a carrier gas is introduced into the container, thereby triboelectrically charging the fine particles and generating an aerosol A of the fine particles. The fine particles in question are charged by friction with the inner surface of a transfer tubing 6 connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber 3 which is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate S placed in the deposition chamber.

Abstract: [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method. [Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 ?m or more and 11 ?m or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.

Abstract: [Object] To provide a method for forming a zirconia film, which is capable of obtaining favorable film quality by an aerosol gas deposition method. [Solving Means] The method for forming a zirconia film by an aerosol gas deposition method, the method including: placing zirconia fine particles P having a mean particle diameter of 0.7 ?m or more and 11 ?m or less and a specific surface area of 1 m2/g or more and 7 m2/g or less in a closed container 2; generating aerosol A of the zirconia fine particles P by introduction of a gas into the closed container 2; conveying the aerosol A through a transfer pipe 6 connected to the closed container 2 into a deposition chamber 3 kept at a pressure lower than that of the closed container 2; and depositing the zirconia fine particles P on a substrate S placed in the deposition chamber 3. It is possible to form a zirconia thin film that is dense and highly adhesive to the substrate by zirconia fine particles satisfying the above-mentioned conditions.

Abstract: An apparatus for manufacturing carbon nanohorns includes a production chamber configured to irradiate a solid carbon material with a laser beam to produce a product containing carbon nanohorns; and a separation mechanism configured to separate the product produced in the production chamber into a lightweight component and a heavyweight component. The heavyweight component includes carbon nanohorn aggregate with high purity, and high-purity carbon nanotubes can be obtained by collecting the heavyweight component.

Abstract: A lithium or lithium alloy film forming method comprises: the step of heating and evaporating lithium or lithium alloy under an atmosphere of inert gas in an ultra fine particle producing chamber to produce ultra fine particles of lithium or lithium alloy therein; the step of transporting the ultra fine particles through a transfer pipe with the inert gas into a film forming chamber under vacuum atmosphere; the step of jetting the ultra fine particles onto a substrate arranged in the film forming chamber from a nozzle; the step of moving a substrate holder holding the substrate in the X-direction and/or Y-direction; the step of preheating the substrate at a predetermined temperature within the range of 100 to the melting point of lithium or lithium alloy: and the step of forming a film of lithium or lithium alloy on the substrate being moved with the substrate holder.

Abstract: In a gas deposition apparatus includes: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe directly facing to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing to the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles evaporated from the evaporation source by heating the latter, are transported together with inert gas through the transfer pipe and they are ejected out from the nozzle onto the substrate to form a film or condensation of ultra fine particle thereon, a DC

Abstract: In a gas deposition apparatus including: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe indirect facing relationship to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles are evaporated from the evaporation source by heating the latter.