Patents by Inventor Eiji Imai
Eiji Imai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10458924Abstract: A defect inspection apparatus includes a light irradiation unit irradiating a sample placed on a table unit with illumination light, a detection optical system forming a scattered light image from the sample and detecting the generated scattered light image through an image sensor, a processing unit receiving a signal from the image sensor of the detection optical system that detects the scattered light image, generating an image of the scattered light, and detecting a defect of the sample by processing the generated image, an output unit outputting the defect image processed by the image processing unit, and a control unit controlling the stable unit, the light irradiation unit, the detection optical system, and the image processing unit. The image processing unit includes an image generation unit that receives the signal and generates the image, a correction unit that corrects lightness discontinuity and a defect detection unit for image processing.Type: GrantFiled: July 4, 2016Date of Patent: October 29, 2019Assignee: Hitachi High-Technologies CorporationInventors: Hisaaki Kanai, Masami Makuuchi, Yukihisa Mohara, Eiji Imai
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Publication number: 20190178813Abstract: A defect inspection apparatus includes a light irradiation unit irradiating a sample placed on a table unit with illumination light, a detection optical system forming a scattered light image from the sample and detecting the generated scattered light image through an image sensor, a processing unit receiving a signal from the image sensor of the detection optical system that detects the scattered light image, generating an image of the scattered light, and detecting a defect of the sample by processing the generated image, an output unit outputting the defect image processed by the image processing unit, and a control unit controlling the stable unit, the light irradiation unit, the detection optical system, and the image processing unit. The image processing unit includes an image generation unit that receives the signal and generates the image, a correction unit that corrects lightness discontinuity and a defect detection unit for image processing.Type: ApplicationFiled: July 4, 2016Publication date: June 13, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hisaaki KANAI, Masami MAKUUCHI, Yukihisa MOHARA, Eiji IMAI
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Patent number: 8525984Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: GrantFiled: May 10, 2012Date of Patent: September 3, 2013Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Yukihisa Mohara, Eiji Imai
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Publication number: 20130194579Abstract: In a conventional art, vibrations of compositions (for example, a Z-stage, a ?-stage, a wafer chuck, and a detection optical system mounted above a stage linear scale) within a device are not precisely fed back to a coordinate value.Type: ApplicationFiled: July 19, 2011Publication date: August 1, 2013Inventors: Yukihisa Mohara, Hidetoshi Nishiyama, Shuichi Chikamatsu, Eiji Imai, Koichi Taniguchi
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Patent number: 8422009Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.Type: GrantFiled: July 12, 2011Date of Patent: April 16, 2013Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
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Patent number: 8395766Abstract: Selection with alignment marks of an optimal template, its identification and similarity judgment are conducted by a calculation function of a correlation value provided to a foreign matter inspection apparatus. In other words, the foreign matter inspection apparatus includes unit for registering feature points of alignment marks formed on a surface of an inspected object, unit for collecting image data of the alignment marks formed on the surface of the inspected object and a data processor for extracting a feature point from the image data and calculating a correlation value of both feature points, and registers the image data of the alignment mark on the basis of a threshold value of the correlation value.Type: GrantFiled: January 19, 2011Date of Patent: March 12, 2013Assignee: Hitachi High-Technologies CorporationInventors: Eiji Imai, Masami Ooyama, Hideyuki Okamoto, Hiroyuki Yamashita
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Publication number: 20120224173Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: ApplicationFiled: May 10, 2012Publication date: September 6, 2012Inventors: Hiroyuki Yamashita, Yukihisa Mohara, Eiji Imai
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Publication number: 20110285989Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: ApplicationFiled: August 3, 2011Publication date: November 24, 2011Inventors: Hiroyuki YAMASHITA, Yukihisa MOHARA, Eiji IMAI
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Publication number: 20110267605Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.Type: ApplicationFiled: July 12, 2011Publication date: November 3, 2011Applicant: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
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Patent number: 7999932Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: GrantFiled: April 30, 2010Date of Patent: August 16, 2011Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Yukihisa Mohara, Eiji Imai
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Patent number: 7986405Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.Type: GrantFiled: April 12, 2010Date of Patent: July 26, 2011Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
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Publication number: 20110109901Abstract: Selection with alignment marks of an optimal template, its identification and similarity judgment are conducted by a calculation function of a correlation value provided to a foreign matter inspection apparatus. In other words, the foreign matter inspection apparatus includes unit for registering feature points of alignment marks formed on a surface of an inspected object, unit for collecting image data of the alignment marks formed on the surface of the inspected object and a data processor for extracting a feature point from the image data and calculating a correlation value of both feature points, and registers the image data of the alignment mark on the basis of a threshold value of the correlation value.Type: ApplicationFiled: January 19, 2011Publication date: May 12, 2011Applicant: HITACHI HIGH TECHNOLOGIES CORPORATIONInventors: Eiji IMAI, Masami Ooyama, Hideyuki Okamoto, Hiroyuki Yamashita
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Patent number: 7898653Abstract: Selection with alignment marks of an optimal template, its identification and similarity judgment are conducted by a calculation function of a correlation value provided to a foreign matter inspection apparatus. In other words, the foreign matter inspection apparatus includes unit for registering feature points of alignment marks formed on a surface of an inspected object, unit for collecting image data of the alignment marks formed on the surface of the inspected object and a data processor for extracting a feature point from the image data and calculating a correlation value of both feature points, and registers the image data of the alignment mark on the basis of a threshold value of the correlation value.Type: GrantFiled: December 20, 2007Date of Patent: March 1, 2011Assignee: Hitachi High-Technologies CorporationInventors: Eiji Imai, Masami Ooyama, Hideyuki Okamoto, Hiroyuki Yamashita
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Publication number: 20100208251Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage,a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: ApplicationFiled: April 30, 2010Publication date: August 19, 2010Inventors: Hiroyuki YAMASHITA, Yukihisa MOHARA, Eiji IMAI
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Publication number: 20100195095Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.Type: ApplicationFiled: April 12, 2010Publication date: August 5, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiroyuki YAMASHITA, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
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Patent number: 7733473Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: GrantFiled: March 27, 2008Date of Patent: June 8, 2010Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Yukihisa Mohara, Eiji Imai
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Patent number: 7719671Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.Type: GrantFiled: February 23, 2007Date of Patent: May 18, 2010Assignee: Hitachi High-Technologies CorporationInventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
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Publication number: 20080262219Abstract: A novel crystal (B-type crystal) of 7-[2-(2-aminothiazol-4-yl)-2-hydroxyiminoacetamide-3-vinyl-3-cephem-4-carboxylic acid (a syn isomer) , characterized in that it exhibits peaks at diffraction angles shown in the following Table 1, in its powder X ray diffraction pattern: TABLE 1 Diffraction Angle 2? (°) approximately 11.7 approximately 16.1 approximately 18.6 approximately 21.2 approximately 22.3 approximately 24.4 approximately 26.2 This crystal is obtained by forming a crystal from a solution at a temperature of ?5 to 5° C. in an acidic state. The crystal is not bulky, exhibits good stability and good filterability, and is excellent in the solubility toward water, and thus can be prepared with case.Type: ApplicationFiled: April 30, 2008Publication date: October 23, 2008Inventors: Eiji Imai, Niwa Hiroyuki
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Publication number: 20080239319Abstract: An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.Type: ApplicationFiled: March 27, 2008Publication date: October 2, 2008Inventors: Hiroyuki YAMASHITA, Yukihisa MOHARA, Eiji Imai
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Publication number: 20080151234Abstract: Selection with alignment marks of an optimal template, its identification and similarity judgment are conducted by a calculation function of a correlation value provided to a foreign matter inspection apparatus. In other words, the foreign matter inspection apparatus includes unit for registering feature points of alignment marks formed on a surface of an inspected object, unit for collecting image data of the alignment marks formed on the surface of the inspected object and a data processor for extracting a feature point from the image data and calculating a correlation value of both feature points, and registers the image data of the alignment mark on the basis of a threshold value of the correlation value.Type: ApplicationFiled: December 20, 2007Publication date: June 26, 2008Inventors: Eiji Imai, Masami Ooyama, Hideyuki Okamoto, Hiroyuki Yamashita