Abstract: A method of manufacturing an insulated superconducting wire material comprising the steps of: removing a flux (S01) by heating a superconducting wire material at a temperature equals to or higher than a flux volatilization temperature and equals to or lower than a heatproof temperature of the superconducting wire material, the superconducting wire material comprising a channel with a channel groove and a superconducting core wire material accommodated in the channel groove of the channel, and the channel groove and the superconducting core wire material being bonded with a solder including the flux; and forming an insulated superconducting wire material (S02) of forming an insulating film on a surface of the superconducting wire material.

Abstract: A method of manufacturing an insulated conductor wire material having a flat surface (12) with a groove (11, 51) formed on the flat surface (13) and coated with an insulating film, comprising: an electrodeposition step of dipping the conductor wire material in an electrodeposition dispersion (62) and forming an insulating layer (13) on a surface of the conductor wire material; an electrodeposition dispersion removal step of removing the electrodeposition dispersion (62) on the insulating layer (13) by taking out the conductor wire material from the electrodeposition dispersion (62) and by blowing a gas on a side of the flat surface (62) with the groove (11, 51); a baking step of coating the conductor wire material with an insulating film by heating the conductor wire material with the insulating layer (13) formed thereon and by baking the insulating layer (13) onto the conductor wire material.

Abstract: An apparatus 1 for manufacturing trichlorosilane includes a decomposition furnace 2 into which polymers and hydrogen chloride are introduced, the decomposition furnace 2 includes: a heating device 11 which heats an interior of the decomposition furnace 2; a reaction chamber 4 which is formed in the decomposition furnace; a center tube 3 which is inserted in the reaction chamber 4 along a longitudinal direction of the reaction chamber and has a lower-end opening portion 3a; raw-material-supply pipes 5 and 6 which supplies the polymer and the hydrogen chloride to the reaction chamber 4 at an exterior of the center tube 3; and a gas-discharge pipe 7 which leads out reacted gas from the center tube 3, the apparatus 1 further includes a fin 14 that leads the polymer and the hydrogen chloride to the lower-end opening portion 3a of the center tube 3 so as to stir the polymer and the hydrogen chloride.

Abstract: An apparatus for producing trichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

Abstract: A method for manufacturing trichlorosilane in which hydrogen chloride and polymers including high-boiling chlorosilanes generated in a polycrystalline silicon manufacture process, a trichlorosilane manufacture process, or a conversion process are introduced into a decomposition furnace and are decomposition reacted at a high temperature, the method including: heating the decomposition furnace and a fin provided in the decomposition furnace; supplying the polymers and the hydrogen chloride to the decomposition furnace from an upper portion thereof so as to react the polymers and the hydrogen chloride by leading to an inner-bottom portion of the decomposition furnace while heating and stirring; and discharging a reacted gas from the inner-bottom portion upwardly above the decomposition furnace through a center of the decomposition furnace.

Abstract: An apparatus for producing tichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

Abstract: An apparatus 1 for manufacturing trichlorosilane includes a decomposition furnace 2 into which polymers and hydrogen chloride are introduced, the decomposition furnace 2 includes: a heating device 11 which heats an interior of the decomposition furnace 2; a reaction chamber 4 which is formed in the decomposition furnace; a center tube 3 which is inserted in the reaction chamber 4 along a longitudinal direction of the reaction chamber and has a lower-end opening portion 3a; raw-material-supply pipes 5 and 6 which supplies the polymer and the hydrogen chloride to the reaction chamber 4 at an exterior of the center tube 3; and a gas-discharge pipe 7 which leads out reacted gas from the center tube 3, the apparatus 1 further includes a fin 14 that leads the polymer and the hydrogen chloride to the lower-end opening portion 3a of the center tube 3 so as to stir the polymer and the hydrogen chloride.

Abstract: An apparatus for producing trichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

Abstract: An apparatus for producing trichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

Abstract: An apparatus 1 for manufacturing trichlorosilane includes a decomposition furnace 2 into which polymers and hydrogen chloride are introduced, the decomposition furnace 2 includes: a heating device 11 which heats an interior of the decomposition furnace 2; a reaction chamber 4 which is formed in the decomposition furnace; a center tube 3 which is inserted in the reaction chamber 4 along a longitudinal direction of the reaction chamber and has a lower-end opening portion 3a; raw-material-supply pipes 5 and 6 which supplies the polymer and the hydrogen chloride to the reaction chamber 4 at an exterior of the center tube 3; and a gas-discharge pipe 7 which leads out reacted gas from the center tube 3, the apparatus 1 further includes a fin 14 that leads the polymer and the hydrogen chloride to the lower-end opening portion 3a of the center tube 3 so as to stir the polymer and the hydrogen chloride.

Abstract: An apparatus for producing trichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace.

Abstract: An apparatus 1 for manufacturing trichlorosilane includes a decomposition furnace 2 into which polymers and hydrogen chloride are introduced, the decomposition furnace 2 includes: a heating device 11 which heats an interior of the decomposition furnace 2; a reaction chamber 4 which is formed in the decomposition furnace; a center tube 3 which is inserted in the reaction chamber 4 along a longitudinal direction of the reaction chamber and has a lower-end opening portion 3a; raw-material-supply pipes 5 and 6 which supplies the polymer and the hydrogen chloride to the reaction chamber 4 at an exterior of the center tube 3; and a gas-discharge pipe 7 which leads out reacted gas from the center tube 3, the apparatus 1 further includes a fin 14 that leads the polymer and the hydrogen chloride to the lower-end opening portion 3a of the center tube 3 so as to stir the polymer and the hydrogen chloride.

Abstract: Firstly, a powder matrix is kept in a fluent state, said powder matrix consisting of a first oxide having an absorbed water amount of 0.1 to 50%, an averaged particle diameter of 0.005 to 0.5 &mgr;m and a surface hydroxyl group number of 0.1 to 25 &mgr;mol/m2. Then, one or both of a halide and an alkoxide including metal or semi-metal identical with or different from the metal or semi-metal constituting said first oxide is allowed to contact with said powder matrix kept in the fluent state, by means of an inert carrier gas, and then they are heated at a temperature of from 25 to 800° C., to thereby coat said powder matrix by a coating layer consisting of a second oxide. Further, a reaction by-product consisting of one or both of a hydrogen halide or an alcohol generated by said contacting is heated at a temperature of from 200 to 1000° C. within the inert carrier gas to thereby eliminate the reaction by-product.

Abstract: The tribo-electro static charge is stabilized by treating the surface of the metallic-oxide fine powders such as a silica powder, using the mixed solution which consists of a specific silane coupling agent containing primary amino group, other silane coupling agent containing amino group and the hydrophobic agent The powder such as silica has the small charge variation with time, and is suitable as the additive of the powder coatings or the electrophotographic toner.

Abstract: Firstly, a powder matrix is kept in a fluent state, said powder matrix consisting of a first oxide having an absorbed water amount of 0.1 to 50%, an averaged particle diameter of 0.005 to 0.5 &mgr;m and a surface hydroxyl group number of 0.1 to 25 &mgr;mol/m2. Then, one or both of a halide and an alkoxide including metal or semi-metal identical with or different from the metal or semi-metal constituting said first oxide is allowed to contact with said powder matrix kept in the fluent state, by means of an inert carrier gas, and then they are heated at a temperature of from 25 to 800° C., to thereby coat said powder matrix by a coating layer consisting of a second oxide. Further, a reaction by-product consisting of one or both of a hydrogen halide or an alcohol generated by said contacting is heated at a temperature of from 200 to 1000° C. within the inert carrier gas to thereby eliminate the reaction by-product.

Abstract: The tribo-electro static charge is stabilized by treating the surface of the metallic-oxide fine powders such as a silica powder, using the mixed solution which consists of a specific silane coupling agent containing primary amino group, other silane coupling agent containing amino group and the hydrophobic agent The powder such as silica has the small charge variation with time, and is suitable as the additive of the powder coatings or the electrophotographic toner.

Abstract: A fine powder of hydrophobic titanium oxide, which, when added to toner powder, gives it high flowability and good electrification stability. The titanium oxide is prepared by hydrolyzing a volatile titanium compound while in a high-temperature vapor-phase condition, in the presence of a combustible or incombustible gas, and has a BET specific surface area of from 55 to 150 m2/g and an anatase/rutile crystal structure with a ratio of anatase falling between 0.3 and 0.98. It is processed for surface modification with a silane coupling agent and/or a silicone compound to produce a fine powder of hydrophobic titanium oxide.

Abstract: A fine powder of a hydrophobic metal oxide is provided which is produced through surface treatment of fine powder of a metal oxide with an epoxy compound and an alkylsilazane or ammonia thereby ring-opening the epoxy groups in the surface of the fine powder followed by introducing an amino group and an alkylsilyl group, or an amino group into the ring-opened epoxy groups. The fine hydrophobic metal oxide powder has good dispersability, flowability and electrification properties, and has good time-dependent stability. A toner composition for electrophotography that contains the fine hydrophobic metal oxide powder has stable and good imaging capabilities for a long period of time. Also provided is a method for modifying the surface of the fine metal oxide powder with a surface modifier, in which ammonia is introduced into the reaction system prior to the treatment of the fine powder with the surface modifier.