Patents by Inventor Eiji Suzuki

Eiji Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9352609
    Abstract: A method for collecting a liquid surface residual film floating on the surface of the liquid after transfer, and a transfer tank that includes a film holding mechanism, provided at inner sides of both right and left side walls, for holding both sides of the transfer film and conveying the transfer film to an immersion area. When a film that is no longer needed after the transfer is collected, dividing means divides the liquid surface residual film so as to split the liquid surface residual film in a longitudinal direction of the transfer tank before the object is removed from the transfer liquid, and the divided films are moved closer to the both side walls of the transfer tank. At the side wall portions, the film holding mechanism is canceled, and from this canceled portion, the divided liquid surface residual films are discharged out of the tank.
    Type: Grant
    Filed: October 27, 2010
    Date of Patent: May 31, 2016
    Assignee: TAICA CORPORATION
    Inventors: Youichiro Yoshii, Eiji Suzuki, Sakae Ushiwata
  • Publication number: 20160125584
    Abstract: An image processing apparatus includes: a calculation unit configured to calculate deformation information of an object deformed from a first deformation state to a second deformation state; a degree-of-deviation calculation unit configured to calculate a degree of deviation of the deformation information with respect to a deformation model representing a deformation state of the object; and a display control unit configured to display the calculated degree of deviation.
    Type: Application
    Filed: October 29, 2015
    Publication date: May 5, 2016
    Inventors: Eiji Suzuki, Itaru Otomaru, Kiyohide Satoh
  • Publication number: 20160111220
    Abstract: The exemplary embodiment has an object to provide a nonaqueous electrolyte solution having a flame retardancy over a long period and having a good capacity maintenance rate. The exemplary embodiment is a nonaqueous electrolyte solution containing a lithium salt, at least one oxo-acid ester derivative of phosphorus selected from compounds represented by a predetermined formula, and at least one disulfonate ester selected from a cyclic disulfonate ester and a linear disulfonate ester represented by the predetermined formulae.
    Type: Application
    Filed: December 22, 2015
    Publication date: April 21, 2016
    Applicant: NEC ENERGY DEVICES, LTD.
    Inventors: Shinako KANEKO, Hitoshi ISHIKAWA, Yoko HASHIZUME, Eiji SUZUKI
  • Patent number: 9312073
    Abstract: The exemplary embodiment has an object to provide a nonaqueous electrolyte solution having a flame retardancy over a long period and having a good capacity maintenance rate. The exemplary embodiment is a nonaqueous electrolyte solution containing a lithium salt, at least one oxo-acid ester derivative of phosphorus selected from compounds represented by a predetermined formula, and at least one disulfonate ester selected from a cyclic disulfonate ester and a linear disulfonate ester represented by the predetermined formulae.
    Type: Grant
    Filed: February 10, 2011
    Date of Patent: April 12, 2016
    Assignee: NEC ENERGY DEVICES, LTD.
    Inventors: Shinako Kaneko, Hitoshi Ishikawa, Yoko Hashizume, Eiji Suzuki
  • Patent number: 9253824
    Abstract: A small steam generator uses a cylindrical steam generation vessel having a steam generation portion formed to store an amount of water for generating steam and a steam passage portion formed on the upper end of the steam generation portion for spouting steam generated in the steam generation portion. A heater element is disposed within the steam generation vessel, and an induction heating coil is wound around the periphery of the steam generation vessel for energizing the heater element. The heater element is energized by supply of electric power to the heating coil so that steam generated by boiling of the water in the steam generation portion spouts upward from the steam passage.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: February 2, 2016
    Assignees: HOSHIZAKI DENKI KABUSHIKI KAISHA, SETA GIKEN CO., LTD.
    Inventors: Kazuhiko Inoue, Eiji Suzuki, Shinichi Kaga, Yukimasa Takeda, Akihiko Hirano, Hiroshi Kai, Masao Sanuki, Motohiko Mouri, Yoshitaka Uchihori
  • Patent number: 9225287
    Abstract: An oscillator has an oscillation portion that generates oscillatory electric signals due to a magnetization motion; and a first electric circuit that is connected in parallel to the oscillation portion. A current whose magnitude oscillates flows to the first electric circuit, and the first electric circuit is arranged such that a magnetic field generated by the current is applied to the oscillation portion.
    Type: Grant
    Filed: April 18, 2014
    Date of Patent: December 29, 2015
    Assignee: TDK CORPORATION
    Inventors: Eiji Suzuki, Tsuyoshi Suzuki
  • Patent number: 9056925
    Abstract: A process for producing a modified conjugated diene based polymer includes a step (a) of reacting a silicon compound with a conjugated diene based polymer having an active end so that the reaction takes place at the active end, the silicon compound having a protected primary amino group in the molecule thereof and a silicon atom to which a hydrocarbyloxy group and a reactive group are bonded, to thereby modify the active end, and a step (b) of performing condensation reaction, in the presence of a titanium compound serving as a titanium-based condensation-accelerating agent. A rubber composition contains the modified diene polymer, and a tire is produced from the rubber composition.
    Type: Grant
    Filed: October 25, 2007
    Date of Patent: June 16, 2015
    Assignees: BRIDGESTONE CORPORATION, JSR CORPORATION
    Inventors: Ken Tanaka, Kouji Masaki, Yoichi Ozawa, Eiji Suzuki, Christine M. Rademacher, Terrence E. Hogan, Takuo Sone, Takaomi Matsumoto
  • Publication number: 20150162203
    Abstract: Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container.
    Type: Application
    Filed: December 2, 2014
    Publication date: June 11, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akinori KITAMURA, Eiji SUZUKI
  • Publication number: 20150140822
    Abstract: In one embodiment of the present invention, there is provided a method for etching a multilayer film formed by laminating a plurality of alternating layers of a first layer having a first dielectric constant and a second layer having a second dielectric constant. This method includes (a) a multilayer film etching step, in which an etchant gas is supplied into a processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the etchant gas; and (b) a resist mask reducing step in which an oxygen-containing gas and a fluorocarbon-based gas are supplied to the processing chamber and a microwave is supplied into the processing chamber to excite a plasma of the oxygen-containing gas and the fluorocarbon-based gas. In this method, the steps (a) and (b) are alternately repeated.
    Type: Application
    Filed: January 23, 2015
    Publication date: May 21, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shota YOSHIMURA, Eiji SUZUKI, Tomiko KAMADA, Hiroto OHTAKE
  • Publication number: 20150109063
    Abstract: A magnetoresistive effect oscillator is provided which is highly endurable against external noise in an initial state. Starting from a state of an operating point of an magnetoresistive effect element being in a region where only a static condition is stabilized, a current applying unit applies a current, which has a first current density not less than a critical current density for oscillation, to the magnetoresistive effect element, and then applies a current having a second current density to the magnetoresistive effect element to make the operating point of the magnetoresistive effect element positioned in a region of bistability such that the magnetoresistive effect element oscillates at a predetermined frequency.
    Type: Application
    Filed: October 16, 2014
    Publication date: April 23, 2015
    Inventors: Tsuyoshi SUZUKI, Eiji SUZUKI
  • Publication number: 20150109062
    Abstract: A magnetoresistive effect oscillator is provided which can realize a rise or a fall of oscillation at a higher speed. In the magnetoresistive effect oscillator, at the rise, a current having a first current density, which is larger than a critical current density for oscillation, is applied, and thereafter a current having a second current density, which is less than the current density corresponding to the first current density and not less than the critical current density for oscillation, is applied such that the magnetoresistive effect element oscillates at a predetermined frequency. In the magnetoresistive effect oscillator, at the fall, starting from the state where a first current density is applied to hold the magnetoresistive effect element in an oscillating condition, a current having a second current density and having polarity reversed to that of the first current density is applied such that the oscillation disappears.
    Type: Application
    Filed: October 16, 2014
    Publication date: April 23, 2015
    Inventors: Tsuyoshi SUZUKI, Eiji SUZUKI
  • Publication number: 20150064922
    Abstract: Provided is a method of selectively removing a first region from a workpiece which includes the first region formed of silicon oxide and a second region formed of silicon. The method performs a plurality of sequences. Each sequence includes: forming a denatured region by generating plasma of a processing gas that contains hydrogen, nitrogen, and fluorine within a processing container that accommodates the workpiece so as to denature a portion of the first region, and removing the denatured region within the processing container. In addition, a sequence subsequent to a predetermined number of sequences after a first sequence among the plurality of sequences further includes exposing the workpiece to plasma of a reducing gas which is generated within the processing container, prior to the forming of the denatured region.
    Type: Application
    Filed: August 27, 2014
    Publication date: March 5, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akinori KITAMURA, Hiroto OHTAKE, Eiji SUZUKI
  • Publication number: 20140367024
    Abstract: Disclosed are an activation method and a liquid pressure transfer technique, where a transfer film is supplied to the surface of a transfer liquid and then is activated, capable of continuously performing a precise transfer. In forming an appropriate transfer pattern on the surface of an object by pressing the object from the upper side of a transfer tank, in the transfer tank, a pre-activation guide mechanism that holds both sides of the film, which is supplied with the center position matching the center of the transfer tank, at horizontally equivalent positions of the transfer tank and guides the film to an activation area is disposed. Accordingly, the film is urged to swell up in the thickness direction, and, in the activation area, the film is coated with an activating agent in a state in which the guide action of the film using the pre-activation guide mechanism is cancelled.
    Type: Application
    Filed: December 8, 2011
    Publication date: December 18, 2014
    Applicant: TAICA CORPORATION
    Inventors: Youichiro Yoshii, Eiji Suzuki, Katsumi Iyanagi, Sakae Ushiwata
  • Publication number: 20140332372
    Abstract: An isotropic etching process can be performed with high uniformity. A plasma etching method of etching an etching target layer containing silicon includes preparing a processing target object having the etching target layer in a processing chamber; removing an oxide film on a surface of the etching target layer by generating plasma of a first processing gas that contains a fluorocarbon gas or a fluorohydrocarbon gas but does not contain oxygen; removing a carbon-based reaction product generated when the removing of the oxide film by generating plasma of a second processing gas that does not contain oxygen; and etching the etching target layer without applying a high frequency bias power to a lower electrode serving as a mounting table configured to mount the processing target object thereon by generating plasma of a third processing gas containing a fluorocarbon gas or a fluorohydrocarbon gas with a microwave.
    Type: Application
    Filed: May 7, 2014
    Publication date: November 13, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Tomiko Kamada, Akinori Kitamura, Hiroto Ohtake, Yutaka Osada, Yuji Otsuka, Masayuki Kohno, Yusuke Takino, Eiji Suzuki
  • Publication number: 20140315498
    Abstract: An oscillator has an oscillation portion that generates oscillatory electric signals due to a magnetization motion; and a first electric circuit that is connected in parallel to the oscillation portion. A current whose magnitude oscillates flows to the first electric circuit, and the first electric circuit is arranged such that a magnetic field generated by the current is applied to the oscillation portion.
    Type: Application
    Filed: April 18, 2014
    Publication date: October 23, 2014
    Applicant: TDK CORPORATION
    Inventors: Eiji SUZUKI, Tsuyoshi SUZUKI
  • Patent number: 8827785
    Abstract: To provide a game device capable of preferably producing an image of a picture in which a first game character loses sight of a second game character having moved so as to disappear from view of the first game character, and thus delays in responding to the second game character. An operation target selection unit (72) selects an operation target character from among the plurality of first game characters. An operation target control unit (74a) changes a state of the first game character selected by the operation target selection unit (72), in the game space, based on a signal input from an operation unit. A selection restriction unit (72b) restricts, in the case where it is determined by the determination unit (72a) that the position of the second game character is included in a determination target area determined based on the position and orientation of the first game character, selection of that first game character by the operation target selection unit (72).
    Type: Grant
    Filed: March 6, 2007
    Date of Patent: September 9, 2014
    Assignee: Konami Digital Entertainment Co., Ltd.
    Inventors: Eiji Suzuki, Hajime Matsumaru
  • Patent number: 8808562
    Abstract: A method of etching an aluminum-containing layer on a substrate is described. The method includes forming plasma from a process composition containing a halogen element, and exposing the substrate to the plasma to etch the aluminum-containing layer. The method may additionally include exposing the substrate to an oxygen-containing environment to oxidize a surface of the aluminum-containing layer and control an etch rate of the aluminum-containing layer. The method may further include forming first plasma from a process composition containing HBr and an additive gas having the chemical formula CxHyRz (wherein R is a halogen element, x and y are equal to unity or greater, and z is equal to zero or greater), forming second plasma from a process composition containing HBr, and exposing the substrate to the first plasma and the second plasma to etch the aluminum-containing layer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: August 19, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Yusuke Ohsawa, Hiroto Ohtake, Eiji Suzuki, Kaushik Arun Kumar, Andrew W. Metz
  • Publication number: 20140144884
    Abstract: It is an object to provide a small-hole electrical discharge machining device to discharge the machining debris efficiently and to drill a small hole by electrical discharge machining at a high speed.
    Type: Application
    Filed: September 1, 2011
    Publication date: May 29, 2014
    Applicant: ASTEC CO., LTD.
    Inventors: Eiji Suzuki, Yuta Shimoda
  • Patent number: 8678893
    Abstract: To provide a game system capable of preferably producing a picture in which a first game character loses sight of a second game character having moved so as to disappear from the view of the first game character. The present invention relates to a game system for displaying on a display unit (82a) a picture of a display target area in a common game space where a first game character corresponding to a game machine A (10a) and a second game character corresponding to a game machine B (10b) are placed. A position condition determination unit (78a) determines whether or not a position of the second game character included in the display target area satisfies a position condition based on the position and orientation of at least one of the first game characters. A display control unit (80a; display restriction means) restricts display output of the second game character included in the display target area on the display unit (82a), based on a result of determination.
    Type: Grant
    Filed: March 6, 2007
    Date of Patent: March 25, 2014
    Assignee: Konami Digital Entertainment Co., Ltd.
    Inventors: Eiji Suzuki, Hajime Matsumaru
  • Publication number: 20130255514
    Abstract: The present invention relates to a liquid pressure transferring technique for forming an appropriate transfer pattern on the surface of an object by pressing the object from the upper side of a transfer tank, in a liquid-leaving area in which the object is pulled up from the transfer liquid in the transfer tank, a design surface oppositely-separating flow that is separated away from a design surface of the object that is in the process of getting out of a liquid is formed by using the design surface cleaning device such as an overflow tank, and foam on a surface of the transfer liquid and foreign substances staying in the liquid are separated away from the design surface of the object that is in the process of getting out of the liquid and are discharged outside the transfer tank.
    Type: Application
    Filed: December 8, 2011
    Publication date: October 3, 2013
    Applicant: TAICA CORPORATION
    Inventors: Youichiro Yoshii, Eiji Suzuki, Sakae Ushiwata, Katsumi Iyanagi