Abstract: A method of monitoring an amount of building material in a cartridge that supplies the material to an additive manufacturing system, comprises introducing gas into the cartridge and measuring the pressure within the cartridge. When the pressure reaches a predetermined level, the amount of building material in the cartridge is determined based on a volume of gas introduced into the cartridge or based on a proxy of the volume.

Abstract: A printhead assembly includes a printbar beam member, a printhead, and a first eccentric pin. The printbar beam member includes a beam surface and a first cavity disposed through the beam surface. The printhead includes a printhead surface and a second cavity disposed through the printhead surface. The first eccentric pin may be inserted into the first cavity and the second cavity to couple the printhead to the printbar beam member. The first eccentric pin may rotate to adjust a position of the printhead relative to the printbar beam member along a first axis along the beam surface.

Abstract: A printhead assembly includes a printbar beam member, a printhead, and a first eccentric pin. The printbar beam member includes a beam surface and a first cavity disposed through the beam surface. The printhead includes a printhead surface and a second cavity disposed through the printhead surface. The first eccentric pin may be inserted into the first cavity and the second cavity to couple the printhead to the printbar beam member. The first eccentric pin may rotate to adjust a position of the printhead relative to the printbar beam member along a first axis along the beam surface.

Abstract: A carriage unit useable with a printhead is provided. The carriage unit includes an alignment member and a support member. The alignment member positions the printhead and includes at least one positioning unit to engage with a fastener. The at least one positioning unit has a positioning surface and a retaining device to retain the fastener against the positioning surface. The support member is connected to the alignment member to support the printhead.

Abstract: The invention discloses a charged particle detecting apparatus for detecting positive ions, negative ions and electrons emitted from a sample, the apparatus comprising a housing, defining a chamber in its interior, which is confined by conductive walls, and has an opening to the outside of said housing; a grid for selectively attracting charged particles, wherein the grid is electrically biasable with respect to said housing and functionally aligned with said opening; a converter arrangement with a converter surface, which is electrically biasable with respect to the grid and with respect to the housing, and which is positioned such that charged particles attracted into the chamber by the grid impact on the converter surface; an electron detector, which is biasable with respect to the converter surface in such a way that electrons emitted from the converter surface impact on the electron detector.

Abstract: The invention discloses a charged particle detecting apparatus for detecting positive ions, negative ions and electrons emitted from a sample, the apparatus comprising a housing, defining a chamber in its interior, which is confined by conductive walls, and has an opening to the outside of said housing; a grid for selectively attracting charged particles, wherein the grid is electrically biasable with respect to said housing and functionally aligned with said opening; a converter arrangement with a converter surface, which is electrically biasable with respect to the grid and with respect to the housing, and which is positioned such that charged particles attracted into the chamber by the grid impact on the converter surface; an electron detector, which is biasable with respect to the converter surface in such a way that electrons emitted from the converter surface impact on the electron detector.

Abstract: A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and unloading of a substrate to/from the chamber. Thus, when the chamber is in a loading/unloading position it is at least partially uncovered from the plate. The translation system may be further configured to provide vertical displacement of the chamber with respect to the plate so as to position an upper surface of a wall of the chamber in close proximity to a lower surface of the plate when the chamber is in an inspection position. In such a position, the upper surface of the wall of the chamber and the lower surface of the plate may be separated by an air gap.

Abstract: A gas turbo pump assembly for connection to a port of a vacuum chamber and having high throughput with low vibration. The assembly comprises a turbo pump and a vibration damper. The pump has a pump body with an external surface and a center axis defining a first axial end and a second axial end of the pump. The pump also has a pump inlet port, the inlet port being coupled to the vacuum chamber port disposed at the first axial end of the pump, and an exit port disposed proximate the second axial end of the pump. The assembly vibration damper is structured to enclose a substantial portion of the pump in a nested arrangement.

Abstract: A substrate inspection system includes two or more inspection modules supported on a plate. A chamber is supported beneath the plate by a translation system, which is configured to provide horizontal displacement of the chamber under the plate to permit loading and unloading of a substrate to/from the chamber. Thus, when the chamber is in a loading/unloading position it is at least partially uncovered from the plate. The translation system may be further configured to provide vertical displacement of the chamber with respect to the plate so as to position an upper surface of a wall of the chamber in close proximity to a lower surface of the plate when the chamber is in an inspection position. In such a position, the upper surface of the wall of the chamber and the lower surface of the plate may be separated by an air gap.

Abstract: The invention provides an apparatus and a method for directing gas towards a specimen, said apparatus includes: (i) means for directing a beam of charged particles towards the specimen; and (ii) a gas conduit providing gas to an area of incidence of said beam of charged particles onto said specimen. The gas conduit includes an intermediate portion having a first end for receiving the inert gas and a substantially sealed second end. The intermediate portion has a first and second apertures that are positioned such as to define a space through which the beam of charged particles can propagate. The intermediate portion is shaped such as to allow a first portion of the inert gas to exit the second aperture and to allow a second portion of the gas to propagate towards the second end and to be returned through the second aperture.

Abstract: The invention provides an apparatus and a method for directing gas towards a specimen, said apparatus includes: (i) means for directing a beam of charged particles towards the specimen; and (ii) a gas conduit providing gas to an area of incidence of said beam of charged particles onto said specimen. The gas conduit includes an intermediate portion having a first end for receiving the inert gas and a substantially sealed second end. The intermediate portion has a first and second apertures that are positioned such as to define a space through which the beam of charged particles can propagate. The intermediate portion is shaped such as to allow a first portion of the inert gas to exit the second aperture and to allow a second portion of the gas to propagate towards the second end and to be returned through the second aperture.

Abstract: A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving elements. In one embodiment, the internal chamber has a first element, such as a lid or cover, and a second element, such as the body of the chamber. The first element and the second element meet at the interface. The internal chamber may further include a substrate support, mounted inside the internal chamber, supporting a substrate. A first movement system may produce at least one type of relative movement between the first element and the second element. A second movement system may produce second relative movement between the second element and the substrate support. The resulting structure allows movement of the chamber, while maintaining pressure inside the chamber.

Abstract: A gas turbo pump assembly for connection to a port of a vacuum chamber and having high throughput with low vibration. The assembly comprises a turbo pump and a vibration damper. The pump has a pump body with an external surface and a center axis defining a first axial end and a second axial end of the pump. The pump also has a pump inlet port, the inlet port being coupled to the vacuum chamber port disposed at the first axial end of the pump, and an exit port disposed proximate the second axial end of the pump. The assembly vibration damper is structured to enclose a substantial portion of the pump in a nested arrangement.

Abstract: A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving elements. In one embodiment, the internal chamber has a first element, such as a lid or cover, and a second element, such as the body of the chamber. The first element and the second element meet at the interface. The internal chamber may further include a substrate support, mounted inside the internal chamber, supporting a substrate. A first movement system may produce at least one type of relative movement between the first element and the second element. A second movement system may produce second relative movement between the second element and the substrate support. The resulting structure allows movement of the chamber, while maintaining pressure inside the chamber.