Patents by Inventor Emi Ueta

Emi Ueta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polysilane type photosensitive resin composition and method for forming pattern using the same
    Patent number: 5776764
    Abstract: The present invention provides a photosensitive resin composition wherein a sensitiveness of polysilane to photodegradation is improved and a time required for photodegradation is short. The photosensitive resin composition comprises:(a) a polysilane having a structure of the formula: ##STR1## ?wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, the same or different, are selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group, and m and n indicate an integer!,(b) a photoradical generator, and(c) an oxidizing agent. A method for forming a pattern using the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: July 7, 1998
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Emi Ueta, Hiroshi Tsushima, Iwao Sumiyoshi