Abstract: A method of fabricating a composite material part, the method including making a consolidated fiber preform, the fibers of the preform being carbon or ceramic fibers and being coated with an interphase; obtaining a consolidated and partially densified fiber preform, the partial densification comprising using chemical vapor infiltration to form a first matrix phase on the interphase; and continuing densification of the fiber preform by infiltrating an infiltration composition containing at least silicon and at least one other element suitable for lowering the melting temperature of the infiltration composition to a temperature less than or equal to 1150° C.

Abstract: A part including a substrate in which at least a portion adjacent to a surface of the substrate is made of a refractory material containing silicon, is protected by an environmental barrier formed on the surface of the substrate and having at least a self-healing layer containing a rare earth silicate. The self-healing layer is formed: for at least 90 mol %, by a system constituted by 30 mol % to at most 80 mol % of at least one rare earth silicate RE2Si2O7, RE being a rare earth, and at least 20 mol % to 70 mol % of manganese oxide MnO; and for at most 10 mol %, by one or more oxides other than MnO, having a eutectic point with SiO2 less than or equal to 1595° C.; the self-healing layer presenting a liquid phase having a self-healing function at least throughout the temperature range 1200° C. to 1400° C., while conserving a majority solid phase.

Abstract: A part made of composite material includes fiber reinforcement densified by a ceramic matrix. The part presents an outside surface and is coated over at least a portion of its outside surface by a surface coating in solid form including an alloy of silicon and nickel presenting a content by weight of silicon lying in the range 29% to 45%, or an alloy of silicon and cobalt.

Abstract: A refractory material withstanding high temperatures in an oxidizing medium contains at least hafnium boride and tantalum boride, hafnium and tantalum being present in the refractory material exclusively in compound form.

Abstract: A part including a substrate in which at least a portion adjacent to a surface of the substrate is made of a refractory material containing silicon, is protected by an environmental barrier formed on the surface of the substrate and having at least a self-healing layer containing a rare earth silicate. The self-healing layer is formed: for at least 90 mol %, by a system constituted by 30 mol % to at most 80 mol % of at least one rare earth silicate RE2Si2O7, RE being a rare earth, and at least 20 mol % to 70 mol % of manganese oxide MnO; and for at most 10 mol %, by one or more oxides other than MnO, having a eutectic point with SiO2 less than or equal to 1595° C.; the self-healing layer presenting a liquid phase having a self-healing function at least throughout the temperature range 1200° C. to 1400° C., while conserving a majority solid phase.

Abstract: A refractory material withstanding high temperatures in an oxidizing medium contains at least hafnium boride and tantalum boride, hafnium and tantalum being present in the refractory material exclusively in compound form.

Abstract: In order to protect a substrate having at least a portion adjacent to a surface that is made of a refractory material containing silicon, while the substrate is in use at high temperature in a medium that is oxidizing and wet, there is formed on the surface of the substrate an environmental barrier that contains no boron and that has at least one layer that is essentially constituted by a system of oxides formed by at least one rare earth oxide, silica, and alumina, and that is capable of self-healing by maintaining the presence of at least one solid phase in a temperature range extending up to at least 1400° C. approximately.

Abstract: In order to protect a substrate having at least a portion adjacent to a surface that is made of a refractory material containing silicon, while the substrate is in use at high temperature in a medium that is oxidizing and wet, there is formed on the surface of the substrate an environmental barrier that contains no boron and that has at least one layer that is essentially constituted by a system of oxides formed by at least one rare earth oxide, silica, and alumina, and that is capable of self-healing by maintaining the presence of at least one solid phase in a temperature range extending up to at least 1400° C. approximately.