Patents by Inventor Engelbertus Antonius Fransiscus Van Der Pasch
Engelbertus Antonius Fransiscus Van Der Pasch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200089126Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.Type: ApplicationFiled: November 19, 2019Publication date: March 19, 2020Inventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
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Patent number: 10571815Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: August 22, 2019Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Patent number: 10509325Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.Type: GrantFiled: November 19, 2018Date of Patent: December 17, 2019Assignee: Carl Zeiss SMT GmbHInventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
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Publication number: 20190377267Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: ApplicationFiled: November 16, 2017Publication date: December 12, 2019Applicant: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan OEMRAWSINGH, Arno Jan BLEEKER, Alexander Matthijs STRUYCKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Bert Pieter VAN DRIEËNHUIZEN
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Publication number: 20190377266Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: August 22, 2019Publication date: December 12, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 10466599Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: April 20, 2017Date of Patent: November 5, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Patent number: 10444635Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.Type: GrantFiled: April 5, 2017Date of Patent: October 15, 2019Assignee: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina Schoormans, Johannes Jacobus Matheus Baselmans, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Aldegonda Theodorus Marie Van Den Homberg, Maksym Yuriiovych Sladkov, Andreas Johannes Antonius Brouns, Alexander Viktorovych Padiy
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Publication number: 20190265019Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.Type: ApplicationFiled: June 29, 2017Publication date: August 29, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Jozef JANSEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Suzanne Johanna Antonetta Geertruda COSIJNS
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Publication number: 20190235398Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: ApplicationFiled: February 25, 2019Publication date: August 1, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Gerardus Arnoldus Hendricus Franciscus JANSSEN, Peter Paul STEIJAERT, Engelbertus Antonius Fransiscus VAN DER PASCH, Franciscus VAN DE MAST
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Patent number: 10345717Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.Type: GrantFiled: April 20, 2018Date of Patent: July 9, 2019Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
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Patent number: 10331045Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.Type: GrantFiled: May 26, 2016Date of Patent: June 25, 2019Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Robbert Edgar Van Leeuwen
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Publication number: 20190187566Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: April 20, 2017Publication date: June 20, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 10310392Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.Type: GrantFiled: November 17, 2016Date of Patent: June 4, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20190163072Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina SCHOORMANS, Johannes Jacobus Matheus BASELMANS, Engelbertus Antonius Fransiscus VAN DER PASCH, Johannes Aidegonda Theodorus Marie VAN DEN HOMBERG, Maksym Yurllovych SLADKOV, Andreas Johannes Antonius BROUNS, Alexander Viktorovych PADIY
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Patent number: 10289011Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.Type: GrantFiled: July 29, 2016Date of Patent: May 14, 2019Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen
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Publication number: 20190086813Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.Type: ApplicationFiled: November 19, 2018Publication date: March 21, 2019Inventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
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Patent number: 10216102Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.Type: GrantFiled: February 12, 2018Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
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Patent number: 10209634Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.Type: GrantFiled: January 26, 2016Date of Patent: February 19, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Maurice Willem Jozef Etiënne Wijckmans, Engelbertus Antonius Fransiscus Van Der Pasch, Christiaan Alexander Hoogendam, Bernardus Antonius Johannes Luttikhuis
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Publication number: 20180364594Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.Type: ApplicationFiled: May 26, 2016Publication date: December 20, 2018Applicant: ASML NETHERLANDS B.V.Inventor: Engelbertus Antonius Fransiscus VAN DER PASCH