Patents by Inventor Enno Mirring

Enno Mirring has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9117637
    Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
    Type: Grant
    Filed: November 6, 2006
    Date of Patent: August 25, 2015
    Assignee: VON ARDENNE GmbH
    Inventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser
  • Patent number: 8980072
    Abstract: In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: March 17, 2015
    Assignee: VON ARDENNE Anlagentechnik GmbH
    Inventors: Goetz Teschner, Enno Mirring, Johannes Struempfel, Andreas Heisig
  • Publication number: 20110180390
    Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
    Type: Application
    Filed: April 5, 2011
    Publication date: July 28, 2011
    Applicant: VON ARDENNE ANLAGENTECHNIK GMBH
    Inventors: Goetz TESCHNER, Falk MILDE, Enno MIRRING, Frank MEISSNER, Goetz GROSSER
  • Publication number: 20100230275
    Abstract: In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.
    Type: Application
    Filed: September 25, 2008
    Publication date: September 16, 2010
    Applicant: VON ARDENNE ANLAGENTECHNIK GMBH
    Inventors: Goetz Teschner, Enno Mirring, Johannes Struempfel, Andreas Heisig
  • Publication number: 20080308410
    Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
    Type: Application
    Filed: November 6, 2006
    Publication date: December 18, 2008
    Applicant: Von Ardenne Anlagentechnik GmbH
    Inventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser