Patents by Inventor Enrico Zordan
Enrico Zordan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10761435Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.Type: GrantFiled: January 17, 2018Date of Patent: September 1, 2020Assignee: ASML Holding N.V.Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
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Publication number: 20190391501Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.Type: ApplicationFiled: January 17, 2018Publication date: December 26, 2019Applicant: ASML Holding N.V.Inventors: Enrico ZORDAN, Brandon Adam EVANS, Daniei Nathan BURBANK, Ankur Ramesh BAHET!, Samir A. NAYFEH
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Patent number: 9915674Abstract: An aspiration apparatus adapted to allow aspiration verification of a liquid such as of a biological liquid or reagent liquid, especially at low aspiration volumes (e.g., less than 25 ?L). The apparatus includes a pump operable at an operating frequency, the pump optionally including a pumping chamber, a probe having a probe interior, a main supply line containing a backing liquid coupled to and extending from the pump and including the probe interior, a striction coupled to the main supply line, or the pump chamber, if present, and a reservoir fluidly coupled to the striction, wherein the striction is sized to minimize backing liquid flow through the striction at one or more disturbance frequencies above the operating frequency. Systems and methods for carrying out the liquid aspiration are provided, as are other aspects.Type: GrantFiled: October 15, 2014Date of Patent: March 13, 2018Assignee: Siemens Healthcare Diagnostics Inc.Inventor: Enrico Zordan
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Publication number: 20160258972Abstract: An aspiration apparatus adapted to allow aspiration verification of a liquid such as of a biological liquid or reagent liquid, especially at low aspiration volumes (e.g., less than 25 ?L). The apparatus includes a pump operable at an operating frequency, the pump optionally including a pumping chamber, a probe having a probe interior, a main supply line containing a backing liquid coupled to and extending from the pump and including the probe interior, a striction coupled to the main supply line, or the pump chamber, if present, and a reservoir fluidly coupled to the striction, wherein the striction is sized to minimize backing liquid flow through the striction at one or more disturbance frequencies above the operating frequency. Systems and methods for carrying out the liquid aspiration are provided, as are other aspects.Type: ApplicationFiled: October 15, 2014Publication date: September 8, 2016Applicant: Siemens Healthcare Diagnostics Inc.Inventor: Enrico Zordan
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Patent number: 9335621Abstract: A support structure for positioning an exchangeable object in a lithographic apparatus. The support structure has a chuck to support and clamp the object and an actuating structure. The actuating structure may have a first actuating structure (e.g., spring) and a second actuating structure (e.g., linear actuator). The first actuating structure is moveable relative to the chuck and is configured to move the second actuating structure between a first position in contact with a side of the object and a second position out of contact with the side of the object. The second actuating structure is configured to move at least a portion thereof relative to the first actuating structure between a first position in contact with the side of the object and a second position out of contact with the side of the object and to apply a pushing force to the side of the object.Type: GrantFiled: February 7, 2011Date of Patent: May 10, 2016Assignee: ASML HOLDING N.V.Inventor: Enrico Zordan
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Patent number: 9274439Abstract: A support structure for positioning an exchangeable object (e.g., patterning device) in a lithographic apparatus. The support structure has a chuck and at least two clamp mechanisms spaced from one another in a first direction. Each clamp mechanism has a plurality of vacuum sections to support the object and apply a localized clamping force to the object to hold the object. The separation between the vacuum sections is in a second direction different from the first direction. The support structure may have a chuck and a clamp mechanism having a plurality of clamp sections to support the object and apply a clamping force to the object. The sections may move relative to each other. Each section may include a channel to communicate a low pressure to hold the object. The stiffness of the clamp mechanism(s) reduces and/or avoids stress and/or slip at the interface of the chuck/clamp and object.Type: GrantFiled: June 24, 2011Date of Patent: March 1, 2016Assignee: ASML HOLDING N.V.Inventor: Enrico Zordan
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Patent number: 9229341Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.Type: GrantFiled: November 30, 2009Date of Patent: January 5, 2016Assignee: ASML Holding N.V.Inventors: Santiago E. Del Puerto, Enrico Zordan
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Patent number: 8885148Abstract: A linear motor for vacuum environment includes a core and a housing. The core includes a plurality of cooling plates and a plurality of electrical coils sandwiched between the plurality of cooling plates. The core further includes a plurality of thermally conductive epoxy layers positioned between the plurality of electrical coils and the plurality of cooling plates, and a plurality of shims located between the plurality of electrical coils and the plurality of cooling plates to determine a distance between the plurality of electrical coils and the plurality of cooling plates. The core is assembled and tested independently and before being assembled in the housing. The housing encloses the core and includes a body, a plurality of feed throughs, and a lid.Type: GrantFiled: December 8, 2011Date of Patent: November 11, 2014Assignee: ASML Holding N.V.Inventor: Enrico Zordan
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Patent number: 8308452Abstract: A valveless MEMS micropump capable of improved efficiency and performance is disclosed. The micropump includes two adjoining chambers separated by a piezoelectric actuated pump membrane. The micropump moves fluid through the chambers through diffuser elements characterized by differential directional resistance to fluid flow by piezoelectric actuation of the pump membrane.Type: GrantFiled: September 11, 2006Date of Patent: November 13, 2012Assignee: The Board of Trustees of the University of IllinoisInventors: Farid Amirouche, Enrico Zordan
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Publication number: 20120170016Abstract: A linear motor for vacuum environment includes a core and a housing. The core includes a plurality of cooling plates and a plurality of electrical coils sandwiched between the plurality of cooling plates. The core further includes a plurality of thermally conductive epoxy layers positioned between the plurality of electrical coils and the plurality of cooling plates, and a plurality of shims located between the plurality of electrical coils and the plurality of cooling plates to determine a distance between the plurality of electrical coils and the plurality of cooling plates. The core is assembled and tested independently and before being assembled in the housing. The housing encloses the core and includes a body, a plurality of feed throughs, and a lid.Type: ApplicationFiled: December 8, 2011Publication date: July 5, 2012Applicant: ASML Netherlands B.V.Inventor: Enrico ZORDAN
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Publication number: 20120002187Abstract: A support structure for positioning an exchangeable object (e.g., patterning device) in a lithographic apparatus. The support structure has a chuck and at least two clamp mechanisms spaced from one another in a first direction. Each clamp mechanism has a plurality of vacuum sections to support the object and apply a localized clamping force to the object to hold the object. The separation between the vacuum sections is in a second direction different from the first direction. The support structure may have a chuck and a clamp mechanism having a plurality of clamp sections to support the object and apply a clamping force to the object. The sections may move relative to each other. Each section may include a channel to communicate a low pressure to hold the object. The stiffness of the clamp mechanism(s) reduces and/or avoids stress and/or slip at the interface of the chuck/clamp and object.Type: ApplicationFiled: June 24, 2011Publication date: January 5, 2012Applicant: ASML Holding N.V.Inventor: Enrico ZORDAN
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Publication number: 20110194094Abstract: A support structure for positioning an exchangeable object in a lithographic apparatus. The support structure has a chuck to support and clamp the object and an actuating structure. The actuating structure may have a first actuating structure (e.g., spring) and a second actuating structure (e.g., linear actuator). The first actuating structure is moveable relative to the chuck and is configured to move the second actuating structure between a first position in contact with a side of the object and a second position out of contact with the side of the object. The second actuating structure is configured to move at least a portion thereof relative to the first actuating structure between a first position in contact with the side of the object and a second position out of contact with the side of the object and to apply a pushing force to the side of the object.Type: ApplicationFiled: February 7, 2011Publication date: August 11, 2011Applicant: ASML Holding NVInventor: Enrico ZORDAN
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Publication number: 20100195081Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.Type: ApplicationFiled: November 30, 2009Publication date: August 5, 2010Applicant: ASML Holding N.V.Inventors: Santiago E. DEL PUERTO, Enrico Zordan
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Publication number: 20090297372Abstract: A valveless MEMS micropump capable of improved efficiency and performance is disclosed. The micropump includes two adjoining chambers separated by a piezoelectric actuated pump membrane. The micropump moves fluid through the chambers through diffuser elements characterized by differential directional resistance to fluid flow by piezoelectric actuation of the pump membrane.Type: ApplicationFiled: September 11, 2006Publication date: December 3, 2009Applicant: BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOISInventors: Farid Amirouche, Enrico Zordan