Abstract: The present disclosure is directed to an authentication system, tools, and methods for authentication including a first inspection tool that generates first images for a first inspection of a device, and a first processor for processing the first images using a hashing algorithm, for which the first inspection tool and the first processor are sited at a first location, and a second inspection tool that generates second images for a second inspection of the device, and a second processor for processing the second images using the hashing algorithm, for which the second inspection tool and the second processor are sited at a second location. The second processor compares the first and second sets of hash values to authenticate the device as being authentic and untampered.

Abstract: The present disclosure relates to the field of fabricating microelectronic devices, wherein a microelectronic device substrate, such as a microelectronic wafer, may be diced into individual microelectronic dice using an adhesive tape which reduces the potential of electrostatic discharge damage by the incorporation or anti-static, and may be compatible with a laser scribing process by the incorporation of ultraviolet light absorbing agents into an adhesive layer of the adhesive tape.

Abstract: A method of forming a microball grid array includes adhering a microball precursor material to a transfer medium under conditions to reflect a selective charge pattern. The method includes transferring the microball precursor material from the transfer medium across a gap and to an integrated circuit substrate under conditions to reflect the selective charge pattern. The method includes achieving the microball grid array without the aid of a mask.

Abstract: A wafer-cutting process includes first cutting a semiconductive wafer along a first path at a given first cutting intensity including cutting across an intersection. The process also includes second cutting the semiconductive wafer along a second path at a given second cutting intensity. The second cutting intensity is diminished during crossing the intersection and resumed to the given cutting intensity after crossing the intersection.

Abstract: A method of forming a microball grid array includes adhering a microball precursor material to a transfer medium under conditions to reflect a selective charge pattern. The method includes transferring the microball precursor material from the transfer medium across a gap and to an integrated circuit substrate under conditions to reflect the selective charge pattern. The method includes achieving the microball grid array without the aid of a mask.

Abstract: Embodiments of an apparatus and methods of reducing defects through selective laser scribing are described herein. Other embodiments may be described and claimed.

Abstract: A wafer-cutting process includes first cutting a semiconductive wafer along a first path at a given first cutting intensity including cutting across an intersection. The process also includes second cutting the semiconductive wafer along a second path at a given second cutting intensity. The second cutting intensity is diminished during crossing the intersection and resumed to the given cutting intensity after crossing the intersection.