Abstract: A fan system is disclosed that includes a braking mechanism for physically stopping rotation of a fan rotor. The braking mechanism is activated when the fan system is at least partially removed from a chassis or enclosure or when the chassis or enclosure including the fan system is opened. The fan rotor, of the fan system, may include a rotating blade assembly configured to rotate around an axis. A fan motor, of the fan system, is configured to cause rotation of the rotating blade assembly around the axis. The braking mechanism, of the fan system, is configured to apply friction to at least one component of the fan rotor when the braking mechanism is engaged. Application of friction to the at least one component of the fan rotor may stop rotation of the rotating blade assembly around the axis.

Abstract: A fan system is disclosed that includes a braking mechanism for physically stopping rotation of a fan rotor. The braking mechanism is activated when the fan system is at least partially removed from a chassis or enclosure or when the chassis or enclosure including the fan system is opened. The fan rotor, of the fan system, may include a rotating blade assembly configured to rotate around an axis. A fan motor, of the fan system, is configured to cause rotation of the rotating blade assembly around the axis. The braking mechanism, of the fan system, is configured to apply friction to at least one component of the fan rotor when the braking mechanism is engaged. Application of friction to the at least one component of the fan rotor may stop rotation of the rotating blade assembly around the axis.

Abstract: A functional EMI containment plug or assembly useful to block an opening or hole in an electronics cabinet or enclosure so as to provide EMI containment. Functionality is achieved by combining a membrane with a circuit board. The EMC assembly functions as a circuit board-based membrane keyboard, which includes tactile switches a user can press to actuate a circuit board function. The switches may be a dome switch that has collapsing action (e.g., amount of travel), and the thickness of the membrane layers placed on top of the front of the circuit board are matched to the chosen dome switch to allow a proper amount of travel. The layers of the membrane act as an EMI shield. In one embodiment, the membrane includes a metal foil layer and a conductive material layer, and the combination of foil and conductive layers of the membrane act to provide a shield for EMI.

Abstract: A rack-mountable system is provided that includes fastening mechanisms mounted to the chassis sidewalls. The fastening mechanisms or “ears” of a rack-mountable chassis are each provided as a unitary part or piece rather than as multiple sheet metal or cast/extruded metallic parts that have to be assembled. The ear is attached or mounted to the chassis in a tool-less manner through specific design of the ear and its chassis-locking features and of holes and/or receiving/mating surfaces and/or openings on the chassis sidewalls. The left and right (or first and second) ears are manufactured in a number of ways including 3D printing, casting, and molding in a shock and impact-resistant material, such as a plastic (e.g., a thermoplastic). The chassis with the low-cost, tool-less ears are useful for mounting routers, switches, servers, digital data storage units, and instrumentation in a rack (e.g., a conventional enclosure for computer and telecommunications equipment).

Abstract: A computer enclosure with a mounting assembly for accurately positioning, attaching, and supporting a circuit board within an enclosure or module without tools or fasteners. The mounting assembly includes a number of components and features that act as low-cost, tool-less mechanisms for mounting and fastening a circuit board within an enclosure with accurate locating of the board for later mating with other boards and/or electrical connectors. The mounting assembly allows for a circuit board to be installed and securely mounted to an enclosure without hardware, fasteners, and tools. This is accomplished through components that were designed and engineered to provide accurate positioning of the board within the enclosure when the board is snapped into place with a single hand of the installer and without the use of tools for fastening the board in a predefined location within the enclosure.

Abstract: A rack-mountable system is provided that includes fastening mechanisms mounted to the chassis sidewalls. The fastening mechanisms or “ears” of a rack-mountable chassis are each provided as a unitary part or piece rather than as multiple sheet metal or cast/extruded metallic parts that have to be assembled. The ear is attached or mounted to the chassis in a tool-less manner through specific design of the ear and its chassis-locking features and of holes and/or receiving/mating surfaces and/or openings on the chassis sidewalls. The left and right (or first and second) ears are manufactured in a number of ways including 3D printing, casting, and molding in a shock and impact-resistant material, such as a plastic (e.g., a thermoplastic). The chassis with the low-cost, tool-less ears are useful for mounting routers, switches, servers, digital data storage units, and instrumentation in a rack (e.g., a conventional enclosure for computer and telecommunications equipment).

Abstract: A computing apparatus adapted for rear access installation of a computer card with blind mating. The apparatus includes an enclosure with a rear access opening and a circuit board mounted in an interior space of the enclosure with an upward facing connector. The apparatus includes a guide assembly comprising a guide mounted within the interior space, and the guide includes a travel surface extending over the upward facing connector of the circuit board. The apparatus includes a card carrier with a frame that houses a computer card, e.g., a PCIe card, which includes a connector extending outward from the card carrier frame. The card carrier rides upon the travel surface when the card carrier is inserted into the enclosure and then pivots about a contact surface in the guide assembly when the computer card connector is proximate to the upward facing connector to provide vertical insertion of the computer card.

Abstract: An accessory receives sheets from an inkjet printer.

Abstract: A sheet cutter assembly concurrently cuts a leading edge and a trailing edge of an image.

Abstract: An accessory receives sheets from an inkjet printer.

Abstract: One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.

Abstract: One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.

Abstract: One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

Abstract: One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.

Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.

Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.

Abstract: A compact magnetic energy filter having at least four magnetic fields to deflect the trajectory of an electron beam from the entrance window to the exit slit. A rotational symmetry axis is located midway between the second and third magnetic fields. The magnetic fields on the opposite sides of the rotational symmetry axis are opposite in polarity.

Abstract: An apparatus for projection lithography is disclosed. The apparatus has at least one magnetic doublet lens. An aperture scatter filter is interposed between the two lenses of the magnetic doublet lens. The aperture scatter filter is in the back focal plane of the magnetic doublet lens system, or in an equivalent conjugate plane thereof. The apparatus also has two magnetic clamps interposed between the two lenses in the magnetic doublet lens. The clamps are positioned and configured to prevent substantial overlap of the magnetic lens fields. The magnetic clamps are positioned so that the magnetic fields from the lenses in the magnetic doublet lens do not extend to the aperture scatter filter.

Abstract: A method and apparatus for a charged particle scanning system and an automatic inspection system, including wafers and masks used in microcircuit fabrication. A charged particle beam is directed at the surface of a substrate for scanning that substrate and a selection of detectors are included to detect at least one of the secondary charged particles, back-scattered charged particles and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary charged particles. The system facilitates inspection at low beam energies on charge sensitive insulating substrates and has the capability to accurately measure the position of the substrate with respect to the charged particle beam.