Patents by Inventor Eric N. Vella

Eric N. Vella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7012683
    Abstract: Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e.g., scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam.
    Type: Grant
    Filed: November 18, 2004
    Date of Patent: March 14, 2006
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Ralph C. Wolf, Eva L. Benitez, Dongsheng (Don) Chen, John D. Greene, Jamie M. Sullivan, Eric N. Vella, Khiem D. Vo
  • Patent number: 6833913
    Abstract: Disclosed are methods and apparatus for detecting a relatively wide dynamic range of intensity values from a beam (e.g., scattered light, reflected light, or secondary electrons) originating from a sample, such as a semiconductor wafer. In other words, the inspection system provides detected output signals having wide dynamic ranges. The detected output signals may then be analyzed to determine whether defects are present on the sample. For example, the intensity values from a target die are compared to the intensity values from a corresponding portion of a reference die, where a significant intensity difference may be defined as a defect. In a specific embodiment, an inspection system for detecting defects on a sample is disclosed. The system includes a beam generator for directing an incident beam towards a sample surface and a detector positioned to detect a detected beam originating from the sample surface in response to the incident beam.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: December 21, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Ralph C. Wolf, Eva L. Benitez, Dongsheng Don Chen, John D. Greene, Jamie M. Sullivan, Eric N. Vella, Khiem D. Vo
  • Patent number: 6686995
    Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square. The PSF provides selective filtering in two directions. In other words, the PSF provides two dimensional filtering.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: February 3, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Dieter E. Wilk, Anlun Tang, Eric N. Vella, Rex Runyon, Jamie Michael Sullivan, Ralph Thomas Johnson
  • Patent number: 6686994
    Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: February 3, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Dieter Wilk, Anlun Tang, Eric N. Vella, Rex Runyon, Jamie M. Sullivan
  • Publication number: 20040001198
    Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square. The PSF provides selective filtering in two directions. In other words, the PSF provides two dimensional filtering.
    Type: Application
    Filed: June 4, 2002
    Publication date: January 1, 2004
    Applicant: KLA-Tencor Technologies Corporation
    Inventors: Dieter E. Wilk, Anlun Tang, Eric N. Vella, Rex Runyon, Jamie Michael Sullivan, Ralph Thomas Johnson
  • Publication number: 20030184739
    Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square.
    Type: Application
    Filed: June 4, 2002
    Publication date: October 2, 2003
    Applicant: KLA-Tencor Technologies Corporation
    Inventors: Dieter E. Wilk, Anlun Tang, Eric N. Vella, J. Rex Runyon, Jamie M. Sullivan