Patents by Inventor Eric Souleillet

Eric Souleillet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern
    Patent number: 6893780
    Abstract: A photomask and method for reducing electrostatic discharge on the photomask with an ESD protection pattern are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer includes an electrostatic discharge (ESD) patterned formed between an outer perimeter of an active region and an inner perimeter of a frame region. The ESD pattern reduces ESD effects in the patterned layer.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: May 17, 2005
    Assignee: DuPont Photomasks, Inc.
    Inventors: Gérald Galan, Eric Souleillet