Patents by Inventor Erich Merz
Erich Merz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8810934Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.Type: GrantFiled: March 17, 2011Date of Patent: August 19, 2014Assignee: Carl Zeiss SMT GmbHInventors: Karl-Eugen Aubele, Erich Merz, Thorsten Rassel
-
Patent number: 8514371Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: April 28, 2011Date of Patent: August 20, 2013Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Publication number: 20110235005Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.Type: ApplicationFiled: March 17, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Karl-Eugen Aubele, Erich Merz, Thorsten Rassel
-
Publication number: 20110199597Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: April 28, 2011Publication date: August 18, 2011Applicant: CARL ZEISS SMT GMBHInventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 7961294Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: October 8, 2008Date of Patent: June 14, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 7768721Abstract: In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.Type: GrantFiled: June 20, 2008Date of Patent: August 3, 2010Assignee: Carl Zeiss SMT AGInventors: Jochen Weber, Erich Merz, Ole Fluegge, Kai-Uwe Berroth, Cornelia Buehler, Markus Hauf
-
Patent number: 7710542Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: November 7, 2007Date of Patent: May 4, 2010Assignee: Carl Zeiss SMT AGInventors: Wolfgang Hummel, Jürgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 7548387Abstract: An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).Type: GrantFiled: April 6, 2006Date of Patent: June 16, 2009Assignee: Carl Zeiss SMT AGInventors: Thorsten Rassel, Erich Merz, Martin Mahlmann
-
Publication number: 20090141258Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: January 30, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Publication number: 20090040487Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: October 8, 2008Publication date: February 12, 2009Applicant: CARL ZEISS SMT AGInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 7486382Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: GrantFiled: December 21, 2005Date of Patent: February 3, 2009Assignee: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Publication number: 20080316621Abstract: In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.Type: ApplicationFiled: June 20, 2008Publication date: December 25, 2008Inventors: Jochen Weber, Erich Merz, Ole Fluegge, Kai-Uwe Berroth, Cornelia Buehler, Markus Hauf
-
Publication number: 20080174757Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: November 7, 2007Publication date: July 24, 2008Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muhlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 7304717Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: December 17, 2002Date of Patent: December 4, 2007Assignee: Carl Zelss SMT AGInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Publication number: 20060230413Abstract: An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).Type: ApplicationFiled: April 6, 2006Publication date: October 12, 2006Inventors: Thorsten Rassel, Erich Merz, Martin Mahlmann
-
Publication number: 20060164619Abstract: An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: December 21, 2005Publication date: July 27, 2006Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Patent number: 6904388Abstract: A method for preventing or minimizing operational failures in a technical installation (1) is disclosed, in which, in accordance with influence quantities (17) accessible by a control system, at least one criterion (18-20) is defined so as to forecast an impending failure of one or more parts of the installation. This criterion is constantly monitored at short time intervals so as to establish a forecast of the expected failure probability. This forecast makes it possible, if necessary, to take early countermeasures (21-23) for preventing the failure of the installation or to take steps for minimizing the effects of the imminent failure.Type: GrantFiled: October 15, 2003Date of Patent: June 7, 2005Assignee: Siemens AktiengesellschaftInventors: Herbert Grieb, Karl-Heinz Kirchberg, Edmund Linzenkirchner, Erich Merz, Robert Schwab
-
Publication number: 20040263812Abstract: An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).Type: ApplicationFiled: August 20, 2004Publication date: December 30, 2004Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muhlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
-
Publication number: 20040162705Abstract: A method for preventing or minimizing operational failures in a technical installation (1) is disclosed, in which, in accordance with influence quantities (17) accessible by a control system, at least one criterion (18-20) is defined so as to forecast an impending failure of one or more parts of the installation. This criterion is constantly monitored at short time intervals so as to establish a forecast of the expected failure probability. This forecast makes it possible, if necessary, to take early countermeasures (21-23) for preventing the failure of the installation or to take steps for minimizing the effects of the imminent failure.Type: ApplicationFiled: October 15, 2003Publication date: August 19, 2004Applicant: SIEMENS AKTIENGESELLSCHAFTInventors: Herbert Grieb, Karl-Heinz Kirchberg, Edmund Linzenkirchner, Erich Merz, Robert Schwab
-
Patent number: 6388823Abstract: An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.Type: GrantFiled: July 22, 2000Date of Patent: May 14, 2002Assignee: Carl-Zeiss-Stiftung trading as Carl ZeissInventors: Erwin Gaber, Christian Wagner, Hubert Holderer, Michael Gerhard, Erich Merz, Jochen Becker, Arie Cornelis Scheiberlich