Patents by Inventor Erik Foerster

Erik Foerster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8794770
    Abstract: A projection display includes at least one light source, at least one reflective image generator configured to represent frames in a two-dimensional distribution of subareas of same, a projection optics arrangement having a two-dimensional arrangement of optical projection elements and being configured to image an associated subarea of the at least one image generator onto an image plane in each case, so that images of the frames superimpose within the image plane to form an overall picture, and at least one beam splitter arranged within an optical path between the at least one reflective image generator and the two-dimensional arrangement of optical projection elements, on the one hand, and the optical path between the at least one light source and the at least one reflective image generator, on the other hand.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: August 5, 2014
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Marcel Sieler, Peter Schreiber, Erik Foerster
  • Patent number: 8777424
    Abstract: A projection display having at least one light source and also regularly-disposed optical channels. The optical channels comprise at least one field lens, to which respectively one object structure to be imaged and also at least one projection lens are assigned. The distance of the projection lenses from the assigned object structures corresponds to the focal distance of the projection lenses while the distance of the object structures to be imaged from the assigned field lens is chosen such that a Köhler illumination of the assigned projection lens is made possible. Then the individual projections are superimposed to form the total image.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: July 15, 2014
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
    Inventors: Peter Schreiber, Marcel Sieler, Erik Foerster
  • Publication number: 20110304825
    Abstract: A projection display includes at least one light source, at least one reflective image generator configured to represent frames in a two-dimensional distribution of subareas of same, a projection optics arrangement having a two-dimensional arrangement of optical projection elements and being configured to image an associated subarea of the at least one image generator onto an image plane in each case, so that images of the frames superimpose within the image plane to form an overall picture, and at least one beam splitter arranged within an optical path between the at least one reflective image generator and the two-dimensional arrangement of optical projection elements, on the one hand, and the optical path between the at least one light source and the at least one reflective image generator, on the other hand.
    Type: Application
    Filed: March 18, 2011
    Publication date: December 15, 2011
    Applicant: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Marcel SIELER, Peter SCHREIBER, Erik FOERSTER
  • Publication number: 20110228231
    Abstract: The invention relates to a projection display having at least one light source and also regularly-disposed optical channels. The optical channels comprise at least one field lens, to which respectively one object structure to be imaged and also at least one projection lens are assigned. The distance of the projection lenses from the assigned object structures corresponds to the focal distance of the projection lenses whilst the distance of the object structures to be imaged from the assigned field lens is chosen such that a Köhler illumination of the assigned projection lens is made possible. Then the individual projections are superimposed to form the total image.
    Type: Application
    Filed: June 11, 2010
    Publication date: September 22, 2011
    Inventors: Peter Schreiber, Marcel Sieler, Erik Foerster
  • Patent number: 7883578
    Abstract: Homogeneity residuals of the refractive index have a strong influence on the performance of lithography tools for both 193 and 157 nm application wavelengths. By systematic investigations of various defects in the real structure of CaF2 crystals, the origin of homogeneity residuals can be shown. Based on a quantitative analysis we define limiting values for the individual defects which can be either tolerated or controlled by optimized process steps, e.g. annealing. These correlations were carried out for all three relevant main crystal lattice orientations of CaF2 blanks. In conclusion we achieved a strong improvement of the critical parameters of both refractive index homogeneity and striae for large size lens blanks up to 270 mm diameter.
    Type: Grant
    Filed: February 23, 2005
    Date of Patent: February 8, 2011
    Assignee: Hellma Materials GmbH & Co. KG
    Inventors: Lutz Parthier, Michael Selle, Erik Foerster
  • Publication number: 20070277725
    Abstract: Homogeneity residuals of the refractive index have a strong influence on the performance of lithography tools for both 193 and 157 nm application wavelengths. By systematic investigations of various defects in the real structure of CaF2 crystals, the origin of homogeneity residuals can be shown. Based on a quantitative analysis we define limiting values for the individual defects which can be either tolerated or controlled by optimized process steps, e.g. annealing. These correlations were carried out for all three relevant main crystal lattice orientations of CaF2 blanks. In conclusion we achieved a strong improvement of the critical parameters of both refractive index homogeneity and striae for large size lens blanks up to 270 mm diameter.
    Type: Application
    Filed: February 23, 2005
    Publication date: December 6, 2007
    Inventors: Lutz Parthier, Michael Selle, Erik Foerster