Abstract: The invention relates to improved alkaline phosphatases, pharmaceutical compositions comprising improved alkaline phosphatases and the use of improved alkaline phosphatases for preventing, treating or curing diseases.

Abstract: A light emitting device (1) adapted for projecting a light beam (15) onto a target surface, the light emitting device (1) comprising a light engine (2) comprising a light source (3), a light mixing chamber (4), and an optical component (5) having a spherical shape with a curved light-receiving surface (51), where the light source (3) is arranged to, in operation, emit light towards a light exit window (41) of the at least one light mixing 5 chamber, the light exit window (41) of the at least one light mixing chamber (4) thereby acting as an extended light source with a curved light-emitting surface, where the optical component (5) is provided adjacent to the light exit window (41) of the light mixing chamber, and where the curved light emitting surface of the at least one light mixing chamber (4) is conformal to an the curved light-receiving surface (51) of the optical component (5) and 10 coincident with a focal surface (52) of the optical component (5).

Abstract: A removal device for removing gas bubbles and/or dirt particles from a liquid in a liquid conduit system includes a main channel for a main flow, the main channel having an entry and an exit which are configured to be connected to the conduit system; a housing which defines an inner space; at least one supply channel extending from the main channel to the inner space; at least one return channel extending from the inner space back to the main channel; and a branch flow control member positioned in the main channel. The branch flow control member being movable between a first position to branch off at least a part of the incoming main flow into the inner space via the supply channel and a second position to branch off at least a part of the incoming main flow into the inner space via the supply channel.

Abstract: The present disclosure relates to a strip element configured to be internally or externally, fixedly or removably provided to an absorbent hygiene article, such as a diaper. The strip element comprises at least one sensing element for obtaining excretion-related information in a hygiene article such as a diaper, the sensing element having a capacitor electrode, a signal line, and a ground element such as a ground electrode and/or ground line. The capacitor electrode and the ground element are for measuring an impedance. The capacitor electrode is electrically connected to the signal line. The sensing element further comprises a shielding component provided between the signal line and the ground element. The strip element is configured such that an electric potential of the shielding component synchronously oscillates with an electric potential of the signal line.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: Disclosed is a method of distinguishing between types of excretion in an absorbent hygiene article provided with a strip element including a first temperature sensing element, and a first impedance sensing element, the method including detecting a first temperature value, and detecting a first impedance value the method further including at least one determining that no excretion is present if the first temperature value does not pass a first temperature threshold and the first impedance value does not pass a first impedance threshold, determining that a first type of excretion is present if the first temperature value passes the first temperature threshold and the first impedance value passes the first impedance threshold; and determining that a second type of excretion is present if the first temperature value passes the first temperature threshold and the first impedance value does not pass the first impedance threshold.

Abstract: Disclosed is a strip element configured to be externally and removably provided to an absorbent hygiene article, the strip element comprising at least two sensing elements for obtaining excretion-related information in the absorbent hygiene article, at least two close contact sensing zones for being removably attached to a garment facing surface of the absorbent hygiene article, respectively, and each comprising one of the at least two sensing elements, wherein, each close contact sensing zone includes first attachment means for keeping the close contact sensing zone in contact with the absorbent hygiene article by a first attachment force, the two close contact sensing zones being separated by a flex zone which is either free of any attachment means or includes second attachment means for establishing a second attachment force between the flex zone and the absorbent hygiene article, the second attachment force being a smaller force than the first contact force.

Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

Abstract: A method for improving the yield of a lithographic process, the method including: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated with an allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

Abstract: A method including evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold.

Abstract: A method for optimizing a sequence of processes for manufacturing of product units, includes: associating measurement results of performance parameters (e.g., fingerprints) with the recorded process characteristics (e.g., context); obtaining a characteristic (e.g., context) of a previous process (e.g. deposition) in the sequence already performed on a product unit; obtaining a characteristic (e.g., context) of a subsequent process (e.g., exposure) in the sequence to be performed on the product unit; determining a predicted performance parameter (e.g., fingerprint) of the product unit associated with the sequence of previous and subsequent processes by using the obtained characteristics to retrieve measurement results of the performance parameters (e.g., fingerprints) corresponding to the recorded characteristics; and determining corrections to be applied to future processes (e.g. exposure, etch) in the sequence to be performed on the product unit, based on the determined predicted performance parameter.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.