Abstract: Methods and systems for multiple manufacturing line qualification are provided. A method includes establishing a product template and producing products on one or more manufacturing lines. The products include product macros placed on a chip. The method also includes establishing allowed parametric match from line to line. The method further includes determining that products from the one or more manufacturing lines meet the allowed parametric match.

Abstract: Methods and systems for semiconductor line scribe centering are provided. A method includes placing and measuring substantially identical test macros within a chip and in a scribe line. The method also includes establishing an estimate correlation between scribe line measurements taken during a manufacturing process and product measurements taken on a final product. The method also includes determining empirical scribe line specification limits consistent with established product screen limits. The method also includes adjusting the manufacturing process in order to optimize performance to the empirical scribe line specification limits.

Abstract: Approaches are provided for improving timing of new and existing semiconductor products. Specifically, a method is provided implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions operable to set starting across chip variation assumptions using design rules. The programming instructions are further operable to design a test chip and/or product chip using the starting across chip variation assumptions to close timing of the design. The programming instructions are further operable to place devices in the test chip and/or product chip. The programming instructions are further operable to compare performance of the devices within the test chip and/or the product chip to the starting across chip variation assumptions. The programming instructions are further operable to adjust the starting across chip variation assumptions based on the measured performance of the test chip and/or the product chip.

Abstract: A method and apparatus measure transistor bandwidth of a device under test in-line and on-wafer. The method includes disposing a measurement circuit on a chip within a wafer, the measurement circuit including a ring oscillator generating an oscillation frequency for transition through the device under test on the wafer, and obtaining an amplitude gain based on the measurement circuit for the corresponding frequency.

Abstract: Methods and systems for semiconductor line scribe centering are provided. A method includes placing and measuring substantially identical test macros within a chip and in a scribe line. The method also includes establishing an estimate correlation between scribe line measurements taken during a manufacturing process and product measurements taken on a final product. The method also includes determining empirical scribe line specification limits consistent with established product screen limits. The method also includes adjusting the manufacturing process in order to optimize performance to the empirical scribe line specification limits.

Abstract: Methods and systems for multiple manufacturing line qualification are provided. A method includes establishing a product template and producing products on one or more manufacturing lines. The products include product macros placed on a chip. The method also includes establishing allowed parametric match from line to line. The method further includes determining that products from the one or more manufacturing lines meet the allowed parametric match.

Abstract: Approaches are provided for improving timing of new and existing semiconductor products. Specifically, a method is provided implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions operable to set starting across chip variation assumptions using design rules. The programming instructions are further operable to design a test chip and/or product chip using the starting across chip variation assumptions to close timing of the design. The programming instructions are further operable to place devices in the test chip and/or product chip. The programming instructions are further operable to compare performance of the devices within the test chip and/or the product chip to the starting across chip variation assumptions. The programming instructions are further operable to adjust the starting across chip variation assumptions based on the measured performance of the test chip and/or the product chip.

Abstract: A hardware description language (HDL) design structure embodied on a machine-readable data storage medium includes elements that when processed in a computer aided design system generates a machine executable representation of a device for implementing dynamic refresh protocols for DRAM based cache. The HDL design structure further includes a DRAM cache partitioned into a refreshable portion and a non-refreshable portion; and a cache controller configured to assign incoming individual cache lines to one of the refreshable portion and the non-refreshable portion of the cache based on a usage history of the cache lines; wherein cache lines corresponding to data having a usage history below a defined frequency are assigned by the controller to the refreshable portion of the cache, and cache lines corresponding to data having a usage history at or above the defined frequency are assigned to the non-refreshable portion of the cache.

Abstract: A method for implementing dynamic refresh protocols for DRAM based cache includes partitioning a DRAM cache into a refreshable portion and a non-refreshable portion, and assigning incoming individual cache lines to one of the refreshable portion and the non-refreshable portion of the cache based on a usage history of the cache lines. Cache lines corresponding to data having a usage history below a defined frequency are assigned to the refreshable portion of the cache, and cache lines corresponding to data having a usage history at or above the defined frequency are assigned to the non-refreshable portion of the cache.

Abstract: The present invention relates to a laser fuse structure for high power applications. Specifically, the laser fuse structure of the present invention comprises first and second conductive supporting elements (12a, 12b), at least one conductive fusible link (14), first and second connection elements (20a, 20b), and first and second metal lines (22a, 22b). The conductive supporting elements (12a, 12b), the conductive fusible link (14), and the metal lines (22a, 22b) are located at a first metal level (3), while the connect elements (20a, 20b) are located at a second, different metal level (4) and are connected to the conductive supporting elements (12a, 12b) and the metal lines (22a, 22b) by conductive via stacks (18a, 18b, 23a, 23b) that extend between the first and second metal levels (3, 4).

Abstract: A method for implementing dynamic refresh protocols for DRAM based cache includes partitioning a DRAM cache into a refreshable portion and a non-refreshable portion, and assigning incoming individual cache lines to one of the refreshable portion and the non-refreshable portion of the cache based on a usage history of the cache lines. Cache lines corresponding to data having a usage history below a defined frequency are assigned to the refreshable portion of the cache, and cache lines corresponding to data having a usage history at or above the defined frequency are assigned to the non-refreshable portion of the cache.

Abstract: A hardware description language (HDL) design structure embodied on a machine-readable data storage medium includes elements that when processed in a computer aided design system generates a machine executable representation of a device for implementing dynamic refresh protocols for DRAM based cache. The HDL design structure further includes a DRAM cache partitioned into a refreshable portion and a non-refreshable portion; and a cache controller configured to assign incoming individual cache lines to one of the refreshable portion and the non-refreshable portion of the cache based on a usage history of the cache lines; wherein cache lines corresponding to data having a usage history below a defined frequency are assigned by the controller to the refreshable portion of the cache, and cache lines corresponding to data having a usage history at or above the defined frequency are assigned to the non-refreshable portion of the cache.

Abstract: A design structure embodied in a machine readable medium used in a design process includes a cache structure having a cache tag array associated with a eDRAM data cache comprising a plurality of cache lines, the cache tag array having an address tag, a valid bit and an access bit corresponding to each of the plurality of cache lines; and each access bit configured to indicate whether the corresponding cache line has been accessed as a result of a read or a write operation during a defined assessment period, which is smaller than retention time of data in the DRAM data cache; wherein, for any of the cache lines not accessed as a result of a read or a write operation during the defined assessment period, the individual valid bit associated therewith is set to a logic state that indicates the data in the associated cache line is invalid.

Abstract: An apparatus for implementing a refreshless, embedded dynamic random access memory (eDRAM) cache device includes a cache structure having a cache tag array associated with a DRAM data cache with a plurality of cache lines, the cache tag array having an address tag, a valid bit and an access bit corresponding to each of the plurality of cache lines; and each access bit configured to indicate whether the corresponding cache line has been accessed as a result of a read or a write operation during a defined assessment period, the defined assessment period being smaller than retention time of data in the DRAM data cache. For any of the cache lines that have not been accessed during the defined assessment period, the individual valid bit associated therewith is set to a logic state that indicates the data in the associated cache line is invalid.

Abstract: Custom connections between pairs of copper wires in a last damascene wiring level are effected by creating openings in an overlying insulating layer which span a distance between portions of the two wires, then filling the openings with aluminum. The openings can be created (or completed) by a second, maskless UV laser exposure of positive photoresist which is used for patterning the insulating layer. If an opening is not created, an aluminum connecting shape overlying the insulating layer will not effect a connection between the two wires. Similar results can be achieved by laser exposure of a resist used to pattern the aluminum layer, thereby causing breaks in connecting shape when it is desired not to have a connection.

Abstract: Method for forming a first one time, voltage programmable logic element in a semiconductor substrate of first conductivity type, forming a first layer beneath a surface of the substrate, the first layer having a second conductivity type. A trench is formed through the surface and passing through the first layer. The trench comprises an interior surface, a dielectric material lining the interior surface and a conductive material filling the lined trench. The first logic element is configured so that a predetermined voltage or higher applied between the conductive material and the first layer causes a breakdown within a region of the trench.

Abstract: A gap conductor structure for an integrated electronic circuit that may function as an electronic fuse device or as a low capacitance inter level signal line is integrated as part of the semi-conductor chip wiring. The gap conducting structure includes one or more air gap regions of predefined volume that fully or partially exposes a length of interlevel conductor layer in an IC. Alternately, the air gap region may wholly located within the dielectric region below a corresponding conductor and separated by insulator. When functioning as a fuse, the gap region acts to reduce thermal conductivity away from the exposed portion of the conductor enabling generation of higher heat currents in the conducting line with lower applied voltages sufficient to melt a part of the conducting line. The presence of gaps, and hence, the fuses, are scalable and may be tailored to the capacity of currents they must carry with the characteristics of the fuses defined by a circuit designer.

Abstract: A burn-in process is provided for a memory array having redundant bits and addressable storage locations. The burn-in process includes the steps of raising the temperature of the memory array to a pre-determined temperature, testing all bits in the array, detecting faulty bits and operable bits, replacing faulty bits with redundant operable bits, correcting any defects in the array in-situ, and lowering the temperature of the memory array to ambient temperature to complete the burn-in process. An apparatus for carrying out the above process is provided that includes a test circuit for generating a test pattern and for applying the test pattern to the memory array so as to test all bits within the memory array. A comparison circuit, coupled to the test circuit and adapted to couple to the memory array, compares an actual response and an expected response of the memory array to the test pattern and detects faulty and operable bits based thereon.

Abstract: Mask programmable conductors of the same construction as the mask layers they define are utilized for mask vintage identification. When the actual mask layer is altered, the change is recorded within the mask itself. Mask identification can be fabricated to identify the following type of mask layers: DT—deep trench; SS—surface strap; DIFF—Diffusion; NDIFF—N Diffusion; PDIFF—P Diffusion; WL—N wells; PC—polysilicon gates; BN—N diffusion Implant; BP—P diffusion Implant; C1—first contact; M1—first metal layer; C2—second contact; and, M2—second metal layer. Conducting paths that incorporate, in series, the mask programmable conductor technology devices are: M1-C1-PC-C1-DIFF-C1-M1-C2-M2; M1-C1-PDIFF-SS-DT-SS-PDIFF-C1-M1-C2-M2; M2-C2-M1-C1-PC-C1-M1; M2-C2-M1-C1-NDIFF-WL-NDIFF-C1-M1; and, M2-C2-M1-C1-NDIFF-C1-M1-C1-PC-C1-M1. These conducting paths are electrically opened with the omission of any of the layers in the series path.

Abstract: An improved chip sparing system and method of operation are provided in which a failed chip is detected even if there are multiple errors on a single chip and one or more spare chips are provided within the system; and in which spare chips or space chip I/Os are dynamically inserted into the system upon detection of a failed chip or chip I/O without the necessity of shutting down and rebooting the system or even without the necessity of re-initializing the memory.