Patents by Inventor Erik R. Loopstra
Erik R. Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8446570Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: September 15, 2010Date of Patent: May 21, 2013Assignee: ASML Holding N.V.Inventors: Santiago Del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20130010277Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20110001955Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 15, 2010Publication date: January 6, 2011Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 7830497Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: April 18, 2007Date of Patent: November 9, 2010Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Patent number: 7209220Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: December 13, 2005Date of Patent: April 24, 2007Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 7019815Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.Type: GrantFiled: October 29, 2004Date of Patent: March 28, 2006Assignee: ASML Netherlands B.V.Inventors: Johannes C. M. Jasper, Erik R. Loopstra, Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicolaas A. A. J. van Asten, Frederik T. E. Heuts, Jacobus Gemen, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer, Thomas J. M. Castenmiller
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Patent number: 6987278Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N2 by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.Type: GrantFiled: March 3, 2003Date of Patent: January 17, 2006Assignee: ASML Netherlands B.V.Inventor: Erik R. Loopstra
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Patent number: 6906783Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: February 20, 2003Date of Patent: June 14, 2005Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 6894261Abstract: A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.Type: GrantFiled: December 20, 2000Date of Patent: May 17, 2005Assignee: ASML Netherlands B.V.Inventors: Thomas J. M. Castenmiller, Andreas B G. Ariens, Martinus H. H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, YimBun P. Kwan
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Patent number: 6879063Abstract: A positioning device comprising a first part (1) which is movable relatively to a second part (2) in an X-direction and a Y-direction, said first part (1) comprising a carrier (5) on which a system of magnets (3) is arranged according to a pattern of rows (7) and columns (8) extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row (7) and each column (8) rotates 90° counter-clockwise. The second part (2) comprises an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45°, and the other type having an offset of ?45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.Type: GrantFiled: March 6, 2003Date of Patent: April 12, 2005Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics, N.V.Inventors: Petrus C.M. Frissen, Johan C. Compter, Antonius T.A. Peijnenburg, Erik R. Loopstra
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Patent number: 6875992Abstract: A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.Type: GrantFiled: May 14, 2004Date of Patent: April 5, 2005Assignee: ASML Netherlands B.V.Inventors: Thomas J. M. Castenmiller, Andreas B. G. Ariens, Martinus H. H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, YimBun P. Kwan
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Publication number: 20040211921Abstract: A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.Type: ApplicationFiled: May 14, 2004Publication date: October 28, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Thomas J.M. Castenmiller, Andreas B.G. Ariens, Martinus H.H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, Yim Bun P. Kwan
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Publication number: 20040190677Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.Type: ApplicationFiled: April 8, 2004Publication date: September 30, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Jan E. Van Der Werf, Mark Kroon, Wilhelmus C. Keur, Vadim Y. Banine, Hans Van Der Laan, Johannes H.J. Moors, Erik R. Loopstra
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Publication number: 20040184018Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.Type: ApplicationFiled: April 2, 2004Publication date: September 23, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Rogier H.M. Groeneveld, Erik R. Loopstra, Jacobus Burghoorn, Leon M. Levasier, Alexander Straaijer
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Patent number: 6791443Abstract: An actuator comprises a magnet yoke and a carrier member movable relative to the magnet yoke. The magnet yoke has at least one permanent magnet and the carrier member is positioned in the magnetic field produced by this magnet. The carrier member has an auxiliary magnetic member that produces a relative bias force between the carrier member and the magnet yoke. The bias force will be used to compensate for a weight applied to the device and acts as a bearing with a very large compliance. The carrier member also comprises a coil. Passing current through the coil produces a Lorentz force for further control of the actuator; alternatively, the device provides a velocity transducer by sensing the EMF generated in the coil by relative motion of the carrier member and magnet yoke.Type: GrantFiled: November 12, 2003Date of Patent: September 14, 2004Assignee: ASML Netherlands B.V.Inventor: Erik R. Loopstra
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Patent number: 6765218Abstract: In a lithographic projection apparatus the positions and/or orientations of reflective optical elements is dynamically controlled. The position of a reflective optical element such as a mirror in an illumination or projection system is first measured using an absolute position sensor mounted on a reference frame and thereafter measured by a relative position sensor also mounted on said reference frame. The position of the element is controlled in accordance with the measured position, e.g. to maintain it stationary in spite of vibrations that might otherwise disturb it. The absolute sensor may be a capacitive or inductive sensor and the relative sensor may be an interferometer.Type: GrantFiled: March 12, 2003Date of Patent: July 20, 2004Assignee: ASML Netherlands B.V.Inventors: Erik R. Loopstra, Antonius J. J. van Dijsseldonk
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Publication number: 20040095217Abstract: An actuator comprises a magnet yoke and a carrier member movable relative to the magnet yoke. The magnet yoke has at least one permanent magnet and the carrier member is positioned in the magnetic field produced by this magnet. The carrier member has an auxiliary magnetic member that produces a relative bias force between the carrier member and the magnet yoke. The bias force will be used to compensate for a weight applied to the device and acts as a bearing with a very large compliance. The carrier member also comprises a coil. Passing current through the coil produces a Lorentz force for further control of the actuator; alternatively, the device provides a velocity transducer by sensing the EMF generated in the coil by relative motion of the carrier member and magnet yoke.Type: ApplicationFiled: November 12, 2003Publication date: May 20, 2004Applicant: ASML NETHERLANDS B.V.Inventor: Erik R. Loopstra
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Patent number: 6730920Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.Type: GrantFiled: January 12, 2001Date of Patent: May 4, 2004Assignee: ASML Netherlands B.V.Inventors: Rogier H. M. Groeneveld, Erik R. Loopstra, Jacobus Burghoom, Leon M. Levasier, Alexander Straaijer
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Patent number: 6721389Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.Type: GrantFiled: August 23, 2001Date of Patent: April 13, 2004Assignee: ASML Netherlands B.V.Inventors: Jan E. Van Der Werf, Mark Kroon, Wilhelmus C. Keur, Vadim Y. Banine, Hans Van Der Laan, Johannes H. J. Moors, Erik R. Loopstra
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Patent number: 6710353Abstract: An actuator comprises a magnet yoke (10a, 10b) and a carrier member (2) movable relative to the magnet yoke. The magnet yoke (10a, 10b) has at least one permanent magnet (14) and the carrier member (20) is positioned in the magnetic field produced by this magnet. The carrier member (20) has an auxiliary magnetic member (28) that produces a relative bias force between the carrier member (20) and the magnet yoke (10a, 10b). The bias force will be used to compensate for a weight applied to the device and acts as a bearing with a very large compliance. The carrier member (2) also comprises a coil (26). Passing current through the coil (26) produces a Lorentz force for further control of the actuator; alternatively, the device provides a velocity transducer by sensing the EMF generated in the coil by relative motion of the carrier member (20) and magnet yoke (10a, 10b).Type: GrantFiled: November 8, 1999Date of Patent: March 23, 2004Assignee: ASML Netherlands B.V.Inventor: Erik R. Loopstra