Patents by Inventor Erik Theodorus Maria Bijlaart

Erik Theodorus Maria Bijlaart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 10962891
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: March 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200225590
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Application
    Filed: December 9, 2019
    Publication date: July 16, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria BIJLAART, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Helmar VAN SANTEN, Antonius Theodorus Anna Maria DERKSEN, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY
  • Lithographic apparatus and device manufacturing method
    Patent number: 10678139
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: June 9, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Lithographic apparatus and device manufacturing method
    Patent number: 10527955
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 10503084
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: December 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190302631
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Application
    Filed: April 12, 2019
    Publication date: October 3, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria BIJLAART, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Helmar VAN SANTEN, Antonius Theodorus Anna Maria DERKSEN, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190250518
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: January 11, 2019
    Publication date: August 15, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Johannes Catherinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Erik Theodorus Maria BIJLAART, Christiaan Alexander HOOGENDAM, Helmar VAN SANTEN, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Arie Jeffrey DEN BOEF, Joost Jeroen OTTENS, Jeroen Johannes Sophia Maria MERTENS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190227444
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: March 29, 2019
    Publication date: July 25, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob STREEFKERK, Johannes Catharinus Hubertus MULKENS, Erik Theodorus Maria BIJLAART, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Bernardus Antonius SLAGHEKKE, Patricius Aloysius Jacobus TINNEMANS, Helmar VAN SANTEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 10261428
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 10248034
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 10180629
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: January 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebranc Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christian Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170102621
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 13, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Johannes Catherinus Hubertus MULKENS, Roelof Aeilko Siebranc RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Erik Theodorus Maria BIJLAART, Christiaan Alexander HOOGENDAM, Helmar VAN SANTEN, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Arie Jeffrey DEN BOEF, Joost Jeroen OTTENS, Jeroen Johannes Sophia Maria MERTENS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170045830
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: October 28, 2016
    Publication date: February 16, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob STREEFKERK, Johannes Catharinus Hubertus MULKENS, Erik Theodorus Maria BIJLAART, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Bernardus Antonius SLAGHEKKE, Patricius Aloysius Jacobus TINNEMANS, Helmar VAN SANTEN
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170010545
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Application
    Filed: June 17, 2016
    Publication date: January 12, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid
    Patent number: 9541843
    Abstract: A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: January 10, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Joost Jeroen Ottens, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 9482962
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: November 1, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 9482966
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: November 1, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method involving a member and a fluid opening
    Patent number: 9152058
    Abstract: An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: October 6, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolensnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
    Patent number: 9081299
    Abstract: An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: July 14, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140375972
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: September 9, 2014
    Publication date: December 25, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen