Patents by Inventor Eriko Toshimitsu

Eriko Toshimitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIN BLACK MATRIX, LIGHT BLOCKING PHOTOSENSITIVE RESIN COMPOSITION, TFT ELEMENT SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE
    Publication number: 20100243970
    Abstract: Provided is a highly reliable resin black matrix, which has sufficient light-blocking characteristics, suppresses temperature increase due to heat generated by a TFT element and does not have failures of a TFT element substrate and fluctuation in liquid crystal drive. The maximum light transmittance of the resin black matrix in a wavelength range of 400 nm-700 nm is permitted to be 1% or less and the average light transmittance in a wavelength range of 850 nm-3,000 nm to be 60% or higher. Alternatively, the minimum light transmittance is permitted to be 50% or more.
    Type: Application
    Filed: August 20, 2008
    Publication date: September 30, 2010
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Eriko Toshimitsu, Takao Hirota, Masami Kadowaki
  • Method for treating photosensitive lithographic printing plate
    Patent number: 6861202
    Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 ?m.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: March 1, 2005
    Assignee: Lastra S.p.A.
    Inventors: Eriko Toshimitsu, Hideaki Okamoto
  • Method for treating photosensitive lithographic printing plate
    Publication number: 20030194654
    Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 &mgr;m.
    Type: Application
    Filed: March 5, 2003
    Publication date: October 16, 2003
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Eriko Toshimitsu, Hideaki Okamoto
  • Method for treating photosensitive lithographic printing plate
    Patent number: 6558875
    Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 &mgr;m.
    Type: Grant
    Filed: July 25, 2000
    Date of Patent: May 6, 2003
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Eriko Toshimitsu, Hideaki Okamoto