Abstract: Advanced techniques for programmable photolithography provide enhanced resolution and can image features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed on the resist. Electro-Optic phase shifting material may be applied to the shutter so as to adjust the single shutter intensity profile, or to adjust the interaction of adjacent shutters. An apodizing mask may be used to engineer the wavefronts of the light striking the resist to achieve better resolution.

Abstract: Advanced techniques for programmable photolithography provide enhanced resolution and can image features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed on the resist. Electro-Optic phase shifting material may be applied to the shutter so as to adjust the single shutter intensity profile, or to adjust the interaction of adjacent shutters. An apodizing mask may be used to engineer the wavefronts of the light striking the resist to achieve better resolution.

Abstract: Advanced techniques for programmable photolithograhy provide enhanced resolution and other aspects of a photolithography system. The pseudo-inverse of a matrix is applied to the results of a calculation to control exposure energies.

Abstract: Advanced techniques for programmable photolithography provide enhanced resolution and other aspects of a photolithography system. A combination of multiple exposures and movement of a substrate relative to a programmable mask in a photolithographic system accomplishes single shutter exposure overlaps to create features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Advanced timing adjustment capabilities are used to modulate the light so that no unwanted features are created. Additionally, a library of shapes may be used, one shape on each pixel, with the small features of the shapes created by phase shifting. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed on the resist. Electro-Optic phase shifting material may be applied to the shutter so as to adjust the single shutter intensity profile, or to adjust the interaction of adjacent shutters.

Abstract: A scanning SQUID microscope for acquiring spatially resolved images of physical properties of an object includes a SQUID sensor arranged in perpendicular to the plane of the object under investigation for detecting tangential component of the magnetic field generated by the object. During scanning of the SQUID sensor over the object under investigation, the position signal from a position interpreting unit, as well as relevant output signals from the SQUID sensor are processed by a processing unit which derives from the data, spatially resolved images of the physical properties of the object. The specific orientation of the SQUID sensor with respect to the plane of the object permits an enlarged area of the SQUID chip on which the modulation and feedback line can be fabricated in the same technological process with the SQUID sensor. Additionally, larger contact pads afforded provide for lower contact resistance and ease in forming contact with bias and read-out wires.

Abstract: Method and apparatus for exposing photo resists using programmable masks increases imaging resolution to provide fully dense integrated circuit patterns made of very small features on photoresist-coated silicon wafers by optical lithography. Small features are created by means of overlap exposure with either programmable or conventional masks. Blocking photoresists responding differently to two different wavelengths of light, two-color photoresists requiring two wavelengths of light to change solubility, and two-photon photoresists which change solubility only by absorbing two photons at a time may be used.

Abstract: A scanning SQUID microscope for acquiring spatially resolved images of physical properties of an object includes a SQUID sensor arranged in perpendicular to the plane of the object under investigation for detecting tangential component of the magnetic field generated by the object. During scanning of the SQUID sensor over the object under investigation, the position signal from a position interpreting unit, as well as relevant output signals from the SQUID sensor are processed by a processing unit which derives from the data, spatially resolved images of the physical properties of the object. The specific orientation of the SQUID sensor with respect to the plane of the object permits an enlarged area of the SQUID chip on which the modulation and feedback line can be fabricated in the same technological process with the SQUID sensor. Additionally, larger contact pads afforded provide for lower contact resistance and ease in forming contact with bias and read-out wires.

Abstract: Advanced techniques for programmable photolithography provide enhanced resolution and other aspects of a photolithography system. A combination of multiple exposures and movement of a substrate relative to a programmable mask in a photolithographic system accomplishes single shutter exposure overlaps to create features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Advanced timing adjustment capabilities are used to modulate the light so that no unwanted features are created. Additionally, a library of shapes may be used, one shape on each pixel, with the small features of the shapes created by phase shifting. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed on the resist. Electro-Optic phase shifting material may be applied to the shutter so as to adjust the single shutter intensity profile, or to adjust the interaction of adjacent shutters.

Abstract: Method and apparatus for exposing photo resists using programmable masks increases imaging resolution to provide fully dense integrated circuit patterns made of very small features on photoresist-coated silicon wafers by optical lithography. Small features are created by means of overlap exposure with either programmable or conventional masks. Blocking photoresists responding differently to two different wavelengths of light, two-color photoresists requiring two wavelengths of light to change solubility, and two-photon photoresists which change solubility only by absorbing two photons at a time may be used.