Abstract: A method for extracting a shielding element from a processing chamber of a substrate processing system or inserting the shielding element into the processing chamber is provided. The substrate processing system includes the processing chamber, a first shielding element for excluding application of material onto parts of a substrate, and a substrate transportation system for transporting substrates or substrate carriers into and out of the processing chamber. The method includes transporting the first shielding element by the substrate transportation system.

Abstract: A substrate processing system for processing an essentially vertically oriented substrate is described. The system includes a first processing chamber having a first processing region to deposit a first layer comprising a first material, a second processing chamber having a second processing region to deposit a second layer over the first layer, the second layer comprising a second material, a third processing chamber having a third processing region to deposit a layer comprising the second material, a transfer chamber providing essentially linear transport paths with the first, second, and third chambers, respectively, and a chamber comprising a first and a second transportation track, wherein at least one of the first and second transportation tracks forms an essentially linear transportation path with the first processing chamber, wherein the first chamber is adapted to receive the substrate from the transfer chamber, and to deposit a further layer comprising the first material.

Abstract: A substrate processing system is provided. The substrate processing system includes a front end module, a load module, and a process module. The modules are arranged for substrate transfer between these modules along a transport direction. At least one of the front end module, load module and process module includes a transfer device providing at least two individual tracks for supporting a substrate or substrate carrier. Two or more of the at least two tracks of the transfer device may be movable relatively to each other in a switch direction perpendicular to the transport direction. At least the first load module, the second load module and the process module may each include a dual-track transfer device.

Abstract: A method for extracting a shielding element from a processing chamber of a substrate processing system or inserting the shielding element into the processing chamber is provided. The substrate processing system includes the processing chamber, a first shielding element for excluding application of material onto parts of a substrate, and a substrate transportation system for transporting substrates or substrate carriers into and out of the processing chamber. The method includes transporting the first shielding element by the substrate transportation system.

Abstract: A substrate processing system for processing an essentially vertically oriented substrate is described. The system includes a first processing chamber having a first processing region to deposit a first layer comprising a first material, a second processing chamber having a second processing region to deposit a second layer over the first layer, the second layer comprising a second material, a third processing chamber having a third processing region to deposit a layer comprising the second material, a transfer chamber providing essentially linear transport paths with the first, second, and third chambers, respectively, and a chamber comprising a first and a second transportation track, wherein at least one of the first and second transportation tracks forms an essentially linear transportation path with the first processing chamber, wherein the first chamber is adapted to receive the substrate from the transfer chamber, and to deposit a further layer comprising the first material.

Abstract: A substrate processing system for processing an essentially vertically oriented substrate is described.

Abstract: A coating system 1 comprises a swing station 2 including a swing module and an arrangement of chambers. The arrangement of chambers comprises a lock chamber 3 and a first coating chamber 4. The lock chamber 3 is configured as a combined lock-in/lock-out chamber. The arrangement of chambers has a first substantially linear transport path T1 indicated by dashed lines, and a second substantially linear transport path T2 indicated by dashed lines. The arrangement of the paths T1 and T2 establishes a dual track. The system 1 includes a transport system for moving a substrate through the arrangement of chambers 3, 4 along the first transport path T1 and/or along the second transport path T2 as indicated by arrows. One or particularly both chambers 3 and 4 comprise transfer means for transferring the substrate/carrier from the first path T1 to the second path T2 by a lateral movement of a dual or triple track section and/or from the second path T2 to the first path T1.

Abstract: A coating system comprises a swing station including a swing module and an arrangement of chambers. The arrangement of chambers comprises a lock chamber and a first coating chamber. The lock chamber is configured as a combined lock-in/lock-out chamber. The arrangement of chambers has a first substantially linear transport path indicated by dashed lines, and a second substantially linear transport path indicated by dashed lines. The arrangement of the paths establishes a dual track. The system includes a transport system for moving a substrate through the arrangement of chambers, along the first transport path and/or along the second transport path as indicated by arrows. One or particularly both chambers comprise transfer means for transferring the substrate/carrier from the first path to the second path by a lateral movement and/or from the second path to the first path.

Abstract: A coating system comprises a lock-in chamber and a lock-out chamber. Furthermore, the coating system comprises a first transfer chamber connected with the lock-in chamber and the lock-out chamber. In the transfer chamber a first rotatable transfer module is arranged. The substrate holders may be rotated around a central axis such that substrate holders may be positioned in alignment with the lock-in chamber and the lock-out chamber, respectively. The coating station further includes a first process chamber and a second process chamber. Furthermore, the coating system includes a second transfer chamber having a second rotatable transfer module including a third substrate holder and a fourth substrate holder. The second transfer chamber is connected with the first process chamber and the second process chamber as well as a third process chamber and a fourth process chamber. The third process chamber and the fourth process chamber are arranged parallel, i.e.

Abstract: The present invention generally comprises a physical vapor deposition (PVD) system having separate susceptor, cathode, and lid sections in which each section is on a rail that elevates the sections off the ground. The cathode section may comprise a plurality of rotatable cathodes that lie in a plane such that the axis of rotation for the rotary cathodes is perpendicular to the ground. The lid section and the cathode section may be moved on the rails to open the cathode section for servicing. Of the plurality of rotatable cathodes, the cathodes corresponding to the center of the substrate upon which material will be deposited are spaced a greater distance from the substrate than rotatable cathodes corresponding to the edge of the substrate.

Abstract: A machine 1 for treating substrates S comprises an infeed area 6, at least a first process chamber 2, a second process chamber 3, a third process chamber 4, and a fourth process chamber 8 for the execution of a treatment, for example the application of a coating to a substrate S for coating, as well as an outfeed area 7. The four process chambers 2,3, 4 and 8 are connected to a central transport chamber 5. The first process chamber 2 fourth process chamber 8 are each arranged between one of the lock areas 6 or 7 and the central transport chamber 5 in series. The second process chamber 3 and the third process chamber 4 are connected in parallel and independently accessible from each other to the central transport chamber.