Patents by Inventor Ernest Hasselbrink

Ernest Hasselbrink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9685571
    Abstract: A solar cell module includes solar cells that are encased in a protective package and a high electric susceptibility layer that is placed on the solar cells. The high electric susceptibility layer is polarized such that a sheet charge is developed at the interface of the high electric susceptibility layer and the solar cells. The protective package includes an encapsulant that encapsulates the solar cells. The encapsulant may be a multilayer encapsulant, with the high electric susceptibility layer being a layer of the encapsulant. The high electric susceptibility layer may also be a material that is separate from the encapsulant.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: June 20, 2017
    Assignee: SunPower Corporation
    Inventors: Yu-Chen Shen, Ernest Hasselbrink, Jr., David F. J. Kavulak
  • Publication number: 20150047690
    Abstract: A solar cell module includes solar cells that are encased in a protective package and a high electric susceptibility layer that is placed on the solar cells. The high electric susceptibility layer is polarized such that a sheet charge is developed at the interface of the high electric susceptibility layer and the solar cells. The protective package includes an encapsulant that encapsulates the solar cells. The encapsulant may be a multilayer encapsulant, with the high electric susceptibility layer being a layer of the encapsulant. The high electric susceptibility layer may also be a material that is separate from the encapsulant.
    Type: Application
    Filed: August 14, 2013
    Publication date: February 19, 2015
    Applicant: SunPower Corporation
    Inventors: Yu-Chen SHEN, Ernest HASSELBRINK, JR., David F.J. KAVULAK
  • Publication number: 20080105663
    Abstract: The invention provides a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small, of nanometer size, and are highly reproducible.
    Type: Application
    Filed: October 30, 2007
    Publication date: May 8, 2008
    Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN
    Inventors: Alan Hunt, Ernest Hasselbrink, Edgar Meyhofer, Kevin Ke
  • Publication number: 20050268693
    Abstract: A thermal modulator device for gas chromatography and associated methods. The thermal modulator device includes a recirculating fluid cooling member, an electrically conductive capillary in direct thermal contact with the cooling member, and a power supply electrically coupled to the capillary and operable for controlled resistive heating of the capillary. The capillary can include more than one separate thermally modulated sections.
    Type: Application
    Filed: May 23, 2005
    Publication date: December 8, 2005
    Inventors: Ernest Hasselbrink, Mark Libardoni, Richard Sacks
  • Publication number: 20050247104
    Abstract: A thermal modulator device for gas chromatography and associated methods. The thermal modulator device includes a cooling member, an electrically conductive capillary in direct thermal contact with the cooling member, and a power supply electrically coupled to the capillary and operable for controlled resistive heating of the capillary.
    Type: Application
    Filed: March 2, 2005
    Publication date: November 10, 2005
    Inventors: Ernest Hasselbrink, Mark Libardoni, Richard Sacks
  • Publication number: 20050097951
    Abstract: A cast-in-place and lithographically shaped mobile, monolithic polymer element for fluid flow control in microfluidic devices and method of manufacture. Microfluid flow control devices, or microvalves that provide for control of fluid or ionic current flow can be made incorporating a cast-in-place, mobile monolithic polymer element, disposed within a microchannel, and driven by fluid pressure (either liquid or gas) against a retaining or sealing surface. The polymer elements are made by the application of lithographic methods to monomer mixtures formulated in such a way that the polymer will not bond to microchannel walls. The polymer elements can seal against pressures greater than 5000 psi, and have a response time on the order of milliseconds. By the use of energetic radiation it is possible to depolymerize selected regions of the polymer element to form shapes that cannot be produced by conventional lithographic patterning and would be impossible to machine.
    Type: Application
    Filed: September 4, 2003
    Publication date: May 12, 2005
    Inventors: Ernest Hasselbrink, Jason Rehm, Timothy Shepodd, Brian Kirby
  • Publication number: 20050064137
    Abstract: The invention provides a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small, of nanometer size, and are highly reproducible.
    Type: Application
    Filed: November 11, 2004
    Publication date: March 24, 2005
    Inventors: Alan Hunt, Ernest Hasselbrink, Edgar Meyhofer, Kevin Ke
  • Publication number: 20050004250
    Abstract: A cast-in-place and lithographically shaped mobile, monolithic polymer element for fluid flow control in microfluidic devices and method of manufacture. Microfluid flow control devices, or microvalves that provide for control of fluid or ionic current flow can be made incorporating a cast-in-place, mobile monolithic polymer element, disposed within a microchannel, and driven by either fluid or gas pressure against a retaining or sealing surface. The polymer elements are made by the application of lithographic methods to monomer mixtures formulated in such a way that the polymer will not bond to microchannel walls. The polymer elements can seal against pressures greater than 5000 psi, and have a response time on the order of milliseconds. By the use of energetic radiation it is possible to depolymerize selected regions of the polymer element to form shapes that cannot be produced by conventional lithographic patterning and would be impossible to machine.
    Type: Application
    Filed: July 14, 2004
    Publication date: January 6, 2005
    Inventors: Ernest Hasselbrink, Jason Rehm, Timothy Shepodd