Patents by Inventor Erumu Kikuchi
Erumu Kikuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9748401Abstract: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: ?1 and ?2, ?1<?2 is satisfied, and ?2 is 300 seconds or less. In addition, a semiconductor device including the transistor is manufactured.Type: GrantFiled: November 19, 2014Date of Patent: August 29, 2017Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Masashi Tsubuku, Takayuki Inoue, Suzunosuke Hiraishi, Erumu Kikuchi, Hiromichi Godo, Shuhei Yoshitomi, Koki Inoue, Akiharu Miyanaga, Shunpei Yamazaki
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Patent number: 9601633Abstract: An oxide semiconductor layer in which “safe” traps exist exhibits two kinds of modes in photoresponse characteristics. By using the oxide semiconductor layer, a transistor in which light deterioration is suppressed to the minimum and the electric characteristics are stable can be achieved. The oxide semiconductor layer exhibiting two kinds of modes in photoresponse characteristics has a photoelectric current value of 1 pA to 10 nA inclusive. When the average time ?1 until which carriers are captured by the “safe” traps is large enough, there are two kinds of modes in photoresponse characteristics, that is, a region where the current value falls rapidly and a region where the current value falls gradually, in the result of a change in photoelectric current over time.Type: GrantFiled: July 14, 2014Date of Patent: March 21, 2017Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Takayuki Inoue, Masashi Tsubuku, Suzunosuke Hiraishi, Junichiro Sakata, Erumu Kikuchi, Hiromichi Godo, Akiharu Miyanaga, Shunpei Yamazaki
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Patent number: 9577107Abstract: To improve crystallinity of an oxide semiconductor. To provide a crystalline oxide semiconductor film in which a crystallized region extends to the interface with a base or the vicinity of the interface, and to provide a method for forming the oxide semiconductor film. An oxide semiconductor film containing indium, gallium, and zinc is formed, and the oxide semiconductor film is irradiated with an energy beam, thereby being heated. Note that the oxide semiconductor film includes a c-axis aligned crystal region or microcrystal.Type: GrantFiled: March 13, 2014Date of Patent: February 21, 2017Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihisa Shimomura, Takahisa Ishiyama, Masaki Koyama, Erumu Kikuchi, Takuya Hirohashi, Masashi Oota
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Patent number: 9159793Abstract: An oxide semiconductor material having p-type conductivity and a semiconductor device using the oxide semiconductor material are provided. The oxide semiconductor material having p-type conductivity can be provided using a molybdenum oxide material containing molybdenum oxide (MoOy (2<y<3)) having an intermediate composition between molybdenum dioxide and molybdenum trioxide. For example, a semiconductor device is formed using a molybdenum oxide material containing molybdenum trioxide (MoO3) as its main component and MoOy (2<y<3) at 4% or more.Type: GrantFiled: July 3, 2014Date of Patent: October 13, 2015Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Yoshinobu Asami, Riho Kataishi, Erumu Kikuchi
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Publication number: 20150069393Abstract: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: ?1 and ?2, ?1<?2 is satisfied, and ?2 is 300 seconds or less. In addition, a semiconductor device including the transistor is manufactured.Type: ApplicationFiled: November 19, 2014Publication date: March 12, 2015Inventors: Masashi TSUBUKU, Takayuki INOUE, Suzunosuke HIRAISHI, Erumu KIKUCHI, Hiromichi GODO, Shuhei YOSHITOMI, Koki INOUE, Akiharu MIYANAGA, Shunpei YAMAZAKI
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Patent number: 8951894Abstract: A structure of the plasma treatment apparatus is employed in which an upper electrode has projected portions provided with first introduction holes and recessed portions provided with second introduction holes, the first introduction hole of the upper electrode is connected to a first cylinder filled with a gas which is not likely to be dissociated, the second introduction hole is connected to a second cylinder filled with a gas which is likely to be dissociated, the gas which is not likely to be dissociated is introduced into a reaction chamber from an introduction port of the first introduction hole provided on a surface of the projected portion of the upper electrode, and the gas which is likely to be dissociated is introduced into the reaction chamber from an introduction port of the second introduction hole provided on a surface of the recessed portion.Type: GrantFiled: September 14, 2012Date of Patent: February 10, 2015Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Takayuki Inoue, Erumu Kikuchi, Hiroto Inoue
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Publication number: 20150001535Abstract: An oxide semiconductor material having p-type conductivity and a semiconductor device using the oxide semiconductor material are provided. The oxide semiconductor material having p-type conductivity can be provided using a molybdenum oxide material containing molybdenum oxide (MoOy (2<y<3)) having an intermediate composition between molybdenum dioxide and molybdenum trioxide. For example, a semiconductor device is formed using a molybdenum oxide material containing molybdenum trioxide (MoO3) as its main component and MoOy (2<y<3) at 4% or more.Type: ApplicationFiled: July 3, 2014Publication date: January 1, 2015Inventors: Yoshinobu Asami, Riho KATAISHI, Erumu KIKUCHI
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Patent number: 8895976Abstract: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: ?1 and ?2, ?1<?2 is satisfied, and ?2 is 300 seconds or less. In addition, a semiconductor device including the transistor is manufactured.Type: GrantFiled: June 20, 2011Date of Patent: November 25, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Masashi Tsubuku, Takayuki Inoue, Suzunosuke Hiraishi, Erumu Kikuchi, Hiromichi Godo, Shuhei Yoshitomi, Koki Inoue, Akiharu Miyanaga, Shunpei Yamazaki
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Publication number: 20140319519Abstract: An oxide semiconductor layer in which “safe” traps exist exhibits two kinds of modes in photoresponse characteristics. By using the oxide semiconductor layer, a transistor in which light deterioration is suppressed to the minimum and the electric characteristics are stable can be achieved. The oxide semiconductor layer exhibiting two kinds of modes in photoresponse characteristics has a photoelectric current value of 1 pA to 10 nA inclusive. When the average time ?1 until which carriers are captured by the “safe” traps is large enough, there are two kinds of modes in photoresponse characteristics, that is, a region where the current value falls rapidly and a region where the current value falls gradually, in the result of a change in photoelectric current over time.Type: ApplicationFiled: July 14, 2014Publication date: October 30, 2014Inventors: Takayuki Inoue, Masashi Tsubuku, Suzunosuke Hiraishi, Junichiro Sakata, Erumu Kikuchi, Hiromichi Godo, Akiharu Miyanaga, Shunpei Yamazaki
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Patent number: 8847482Abstract: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.Type: GrantFiled: December 21, 2011Date of Patent: September 30, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Gen Fujii, Erika Takahashi, Erumu Kikuchi, Sachiko Kawakami
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Publication number: 20140284597Abstract: To improve crystallinity of an oxide semiconductor. To provide a crystalline oxide semiconductor film in which a crystallized region extends to the interface with a base or the vicinity of the interface, and to provide a method for forming the oxide semiconductor film. An oxide semiconductor film containing indium, gallium, and zinc is formed, and the oxide semiconductor film is irradiated with an energy beam, thereby being heated. Note that the oxide semiconductor film includes a c-axis aligned crystal region or microcrystal.Type: ApplicationFiled: March 13, 2014Publication date: September 25, 2014Applicant: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihisa SHIMOMURA, Takahisa ISHIYAMA, Masaki KOYAMA, Erumu KIKUCHI, Takuya HIROHASHI, Masashi OOTA
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Patent number: 8772770Abstract: An oxide semiconductor material having p-type conductivity and a semiconductor device using the oxide semiconductor material are provided. The oxide semiconductor material having p-type conductivity can be provided using a molybdenum oxide material containing molybdenum oxide (MoOy (2<y<3)) having an intermediate composition between molybdenum dioxide and molybdenum trioxide. For example, a semiconductor device is formed using a molybdenum oxide material containing molybdenum trioxide (MoO3) as its main component and MoOy (2<y<3) at 4% or more.Type: GrantFiled: February 15, 2013Date of Patent: July 8, 2014Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Yoshinobu Asami, Riho Kataishi, Erumu Kikuchi
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Publication number: 20130012006Abstract: A structure of the plasma treatment apparatus is employed in which an upper electrode has projected portions provided with first introduction holes and recessed portions provided with second introduction holes, the first introduction hole of the upper electrode is connected to a first cylinder filled with a gas which is not likely to be dissociated, the second introduction hole is connected to a second cylinder filled with a gas which is likely to be dissociated, the gas which is not likely to be dissociated is introduced into a reaction chamber from an introduction port of the first introduction hole provided on a surface of the projected portion of the upper electrode, and the gas which is likely to be dissociated is introduced into the reaction chamber from an introduction port of the second introduction hole provided on a surface of the recessed portion.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei YAMAZAKI, Takayuki INOUE, Erumu KIKUCHI, Hiroto INOUE
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Patent number: 8258025Abstract: A microcrystalline semiconductor film with high crystallinity is manufactured. In addition, a thin film transistor with excellent electric characteristics and high reliability, and a display device including the thin film transistor are manufactured with high productivity. A deposition gas containing silicon or germanium is introduced from an electrode including a plurality of projecting portions provided in a treatment chamber of a plasma CVD apparatus, glow discharge is caused by supplying high-frequency power, and thereby crystal particles are formed over a substrate, and a microcrystalline semiconductor film is formed over the crystal particles by a plasma CVD method.Type: GrantFiled: August 2, 2010Date of Patent: September 4, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Yukie Suzuki, Yasuyuki Arai, Takayuki Inoue, Erumu Kikuchi
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Publication number: 20120091444Abstract: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.Type: ApplicationFiled: December 21, 2011Publication date: April 19, 2012Inventors: Gen Fujii, Erika Takahashi, Erumu Kikuchi, Sachiko Kawakami
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Publication number: 20120056101Abstract: When hydrogen is introduced into a plasma chamber which includes the dielectric plate as part of an exterior wall, and surface waves are generated on the dielectric plate using microwaves, a region where negative hydrogen ions are easily generated is formed in the plasma chamber. Since only hydrogen negative ions each with a molecular weight of 1 are generated, only ions with the same mass can be added to an object by application of an electric field, without mass separation.Type: ApplicationFiled: August 26, 2011Publication date: March 8, 2012Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Erumu KIKUCHI, Wataru SEKINE
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Publication number: 20110315979Abstract: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: ?1 and ?2, ?1<?2 is satisfied, and ?2 is 300 seconds or less. In addition, a semiconductor device including the transistor is manufactured.Type: ApplicationFiled: June 20, 2011Publication date: December 29, 2011Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Masashi Tsubuku, Takayuki Inoue, Suzunosuke Hiraishi, Erumu Kikuchi, Hiromichi Godo, Shuhei Yoshitomi, Koki Inoue, Akiharu Miyanaga, Shunpei Yamazaki
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Patent number: 8083956Abstract: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.Type: GrantFiled: October 7, 2008Date of Patent: December 27, 2011Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Gen Fujii, Erika Takahashi, Erumu Kikuchi, Sachiko Kawakami
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Publication number: 20110227082Abstract: An oxide semiconductor layer in which “safe” traps exist exhibits two kinds of modes in photoresponse characteristics. By using the oxide semiconductor layer, a transistor in which light deterioration is suppressed to the minimum and the electric characteristics are stable can be achieved. The oxide semiconductor layer exhibiting two kinds of modes in photoresponse characteristics has a photoelectric current value of 1 pA to 10 nA inclusive. When the average time ?1 until which carriers are captured by the “safe” traps is large enough, there are two kinds of modes in photoresponse characteristics, that is, a region where the current value falls rapidly and a region where the current value falls gradually, in the result of a change in photoelectric current over time.Type: ApplicationFiled: March 15, 2011Publication date: September 22, 2011Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Takayuki Inoue, Masashi Tsubuku, Suzunosuke Hiraishi, Junichiro Sakata, Erumu Kikuchi, Hiromichi Godo, Akiharu Miyanaga, Shunpei Yamazaki
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Publication number: 20110039402Abstract: A microcrystalline semiconductor film with high crystallinity is manufactured. In addition, a thin film transistor with excellent electric characteristics and high reliability, and a display device including the thin film transistor are manufactured with high productivity. A deposition gas containing silicon or germanium is introduced from an electrode including a plurality of projecting portions provided in a treatment chamber of a plasma CVD apparatus, glow discharge is caused by supplying high-frequency power, and thereby crystal particles are formed over a substrate, and a microcrystalline semiconductor film is formed over the crystal particles by a plasma CVD method.Type: ApplicationFiled: August 2, 2010Publication date: February 17, 2011Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.Inventors: Shunpei YAMAZAKI, Yukie SUZUKI, Yasuyuki ARAI, Takayuki INOUE, Erumu KIKUCHI