Patents by Inventor Erwin Polar

Erwin Polar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Temperature controlled chamber
    Patent number: 6598559
    Abstract: A substrate processing chamber 25 comprising a substrate support 85, and a wall 24 about the substrate support 85, the wall 24 having a radiation absorbing surface 36 adapted to preferentially absorb radiation having wavelengths in the visible or infra-red spectrum.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: July 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Kim Vellore, Qiwei Liang, Erwin Polar
  • Method and apparatus for transferring and supporting a substrate
    Patent number: 6537011
    Abstract: A method and apparatus for supporting and transferring a substrate in a semiconductor wafer processing system. In one aspect, a support ring having one or more substrate support members mounted thereon and defining a central opening therein for receipt of a substrate support member during processing is disclosed. In another aspect, a substrate handler blade having a plurality of substrate supports disposed thereon is provided which is adapted to support a substrate thereon and effectuate substrate transfer between the substrate handler blade and the support ring.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: March 25, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Danny Wang, Dmitry Lubomirsky, Erwin Polar, Brigitte Stoehr, Mark Wiltse, Yeuk-Fai Edwin Mok, Frank C. Ma