Abstract: In various embodiments, an alignment mark arrangement may include a plurality of alignment marks disposed next to each other in a row, wherein at least one of the following holds true: a first alignment mark of the plurality of alignment marks has a first width and a second alignment mark of the plurality of alignment marks has a second width that is different from the first width; a first pair of neighboring alignment marks of the plurality of alignment marks is arranged at a first pitch and a second pair of neighboring alignment marks of the plurality of alignment marks is arranged at a second pitch that is different from the first pitch.

Abstract: In various embodiments, an alignment mark arrangement may include a plurality of alignment marks disposed next to each other in a row, wherein at least one of the following holds true: a first alignment mark of the plurality of alignment marks has a first width and a second alignment mark of the plurality of alignment marks has a second width that is different from the first width; a first pair of neighboring alignment marks of the plurality of alignment marks is arranged at a first pitch and a second pair of neighboring alignment marks of the plurality of alignment marks is arranged at a second pitch that is different from the first pitch.

Abstract: An alignment mark may include: an elongate pattern having first and second end portions and a central portion located between the first and second end portions, wherein at least one of the first and second end portions has a larger width than the central portion.

Abstract: An apparatus includes a substrate and a photoresist material structure arranged adjacent to the substrate so that a cavity is formed between the substrate and the photoresist material structure. The cavity has an opening. The photoresist material structure includes a frame portion disposed on a main side of the substrate and a cap portion spanning over a part of the main side of the substrate at a distance to the main side. The cap portion is formed in the first photoresist layer and the frame portion is formed in the second photoresist layer.

Abstract: An apparatus includes a substrate and a photoresist material structure arranged adjacent to the substrate so that a cavity is formed between the substrate and the photoresist material structure. The cavity has an opening. The photoresist material structure includes a frame portion disposed on a main side of the substrate and a cap portion spanning over a part of the main side of the substrate at a distance to the main side. The cap portion is formed in the first photoresist layer and the frame portion is formed in the second photoresist layer.

Abstract: In the case of the method for the computer-aided monitoring of process parameters of a manufacturing process of a physical object, object data which identify the physical object are assigned to various hierarchical levels, object data of various hierarchical levels are grouped to form hierarchical object data records, limit values for at least one process parameter are stored and respectively assigned to a hierarchical object data record, process data of the at least one process parameter, measured during the manufacture of physical objects, are stored and the hierarchical object data records corresponding to the object data are determined for physical objects manufactured.

Abstract: In the case of a method for monitoring of a manufacturing process of a plurality of physical objects, several rules which relate to at least one status of at least one of the plurality of physical objects are stored. Furthermore, in the case of the method, a sample is selected from the plurality of physical objects by using the several rules, with physical objects of the sample being marked in such a way that they can be subjected to a measurement, the rules being formed on the basis of the criterion that the number of measurements is reduced and redundant measurements are avoided, and it being possible in the case of the method for the several rules to be combined with one another and checked against one another.

Abstract: In the case of the method for the computer-aided monitoring of process parameters of a manufacturing process of a physical object, object data which identify the physical object are assigned to various hierarchical levels, object data of various hierarchical levels are grouped to form hierarchical object data records, limit values for at least one process parameter are stored and respectively assigned to a hierarchical object data record, process data of the at least one process parameter, measured during the manufacture of physical objects, are stored and the hierarchical object data records corresponding to the object data are determined for physical objects manufactured.

Abstract: In the case of a method for monitoring of a manufacturing process of a plurality of physical objects, several rules which relate to at least one status of at least one of the plurality of physical objects are stored. Furthermore, in the case of the method, a sample is selected from the plurality of physical objects by using the several rules, with physical objects of the sample being marked in such a way that they can be subjected to a measurement, the rules being formed on the basis of the criterion that the number of measurements is reduced and redundant measurements are avoided, and it being possible in the case of the method for the several rules to be combined with one another and checked against one another.