Patents by Inventor Etsuro Matsuda

Etsuro Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6375793
    Abstract: The present invention provides a method and a tower for removing residual monomers in the manufacture of vinyl chloride resins (PVC). When residual monomers are removed from a PVC slurry after the slurry has undergone a polymerization due to contact with steam, the bubbles generated in the slurry are controlled to maintain stable fluid conditions. Residual monomers are effectively removed, and inclusion of foreign matter is inhibited. The tower has two or more levels and is divided into upper and lower sections. The inner diameter of the upper section is greater than that of the lower section. Each section is provided with at least one perforated tray. In addition, at least one hot water-ejecting device is provided in the tower.
    Type: Grant
    Filed: February 7, 1995
    Date of Patent: April 23, 2002
    Assignee: Swarovski Optik KG
    Inventors: Seiichi Uchida, Toshinobu Kurazono, Seigo Ishibashi, Etsuro Matsuda
  • Patent number: 6332958
    Abstract: An apparatus and a method for removing residual monomers from a slurry containing a polyvinyl chloride. The apparatus has a cylindrical tower with plural perforated plates provided in a vertical direction in the tower, plural chambers formed on the perforated plates serving as their bottom surface, slurry introducing portions provided at two or more of the chambers, flow-down sections provided between the perforated plates to allow the slurry to sequentially flow down from the perforated plate of an upper chamber to the perforated plate of a lower chamber, a steam introducing port at a bottom portion of the tower, a deaerating port at a top portion of the tower, a slurry discharging port at a chamber below a chamber having the slurry introducing port, and hot water ejectors directly under the perforated plates directed at least toward the lower surface of the perforated plates.
    Type: Grant
    Filed: August 19, 1999
    Date of Patent: December 25, 2001
    Assignee: Chisso Corporation
    Inventors: Etsuro Matsuda, Yuichi Ito, Toshinobu Kurazono
  • Patent number: 5804039
    Abstract: A method for removing residual vinyl chloride monomers from an aqueous slurry is disclosed. The method preferably utilizes a tower having a plurality of vertically spaced plates, which define a plurality of chambers, each chamber defined between adjacent plates. The tower features a plate in one of the chambers having a diameter of 1.05 to 5 times larger than the diameter of the plates in chambers above and below the chamber having the large plate. The method is based upon introducing the slurry to a particular location in the tower depending upon the porosity of the polyvinyl chloride in the slurry.
    Type: Grant
    Filed: July 31, 1996
    Date of Patent: September 8, 1998
    Assignee: Chisso Corporation
    Inventors: Toshinobu Kurazono, Seiichi Uchida, Seigo Ishibashi, Etsuro Matsuda