Patents by Inventor EUN SAEM AHN

EUN SAEM AHN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR TREATING SUBSTRATE
    Publication number: 20170309473
    Abstract: Disclosed are a method and an apparatus for applying a liquid onto a substrate. The method for treating a substrate, the method includes: a liquid supplying step of supplying a treatment liquid for forming a liquid film on the substrate while rotating the substrate; and a liquid diffusing step of diffusing the treatment liquid discharged to the substrate by rotating the substrate, after the liquid supplying step. The liquid diffusing step includes: a primary diffusion step of rotating the substrate at a first diffusion speed; and a secondary diffusion step of rotating the substrate at a second diffusion speed, after the primary diffusion step. The second diffusion speed is higher than the first diffusion speed. Accordingly, the treatment liquid can be applied to the substrate again by performing the secondary diffusion step, making it possible to adjust the thickness of a photosensitive film.
    Type: Application
    Filed: March 23, 2016
    Publication date: October 26, 2017
    Applicant: SEMES CO., LTD.
    Inventors: EUN SAEM AHN, Choongki Min, Jung Yul Lee, Min Jung Park
  • Method and apparatus for treating substrate
    Patent number: 9793118
    Abstract: Disclosed are a method and an apparatus for applying a liquid onto a substrate. The method for treating a substrate, the method includes: a liquid supplying step of supplying a treatment liquid for forming a liquid film on the substrate while rotating the substrate; and a liquid diffusing step of diffusing the treatment liquid discharged to the substrate by rotating the substrate, after the liquid supplying step. The liquid diffusing step includes: a primary diffusion step of rotating the substrate at a first diffusion speed; and a secondary diffusion step of rotating the substrate at a second diffusion speed, after the primary diffusion step. The second diffusion speed is higher than the first diffusion speed. Accordingly, the treatment liquid can be applied to the substrate again by performing the secondary diffusion step, making it possible to adjust the thickness of a photosensitive film.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: October 17, 2017
    Assignee: Semes Co., Ltd.
    Inventors: Eun Saem Ahn, Choongki Min, Jung Yul Lee, Min Jung Park
  • METHOD AND APPARATUS FOR TREATING SUBSTRATE
    Publication number: 20160293404
    Abstract: Disclosed are a method and an apparatus for applying a liquid onto a substrate. The method for treating a substrate, the method includes: a liquid supplying step of supplying a treatment liquid for forming a liquid film on the substrate while rotating the substrate; and a liquid diffusing step of diffusing the treatment liquid discharged to the substrate by rotating the substrate, after the liquid supplying step. The liquid diffusing step includes: a primary diffusion step of rotating the substrate at a first diffusion speed; and a secondary diffusion step of rotating the substrate at a second diffusion speed, after the primary diffusion step. The second diffusion speed is higher than the first diffusion speed. Accordingly, the treatment liquid can be applied to the substrate again by performing the secondary diffusion step, making it possible to adjust the thickness of a photosensitive film.
    Type: Application
    Filed: March 23, 2016
    Publication date: October 6, 2016
    Inventors: EUN SAEM AHN, Choongki Min, Jung Yul Lee, Min Jung Park