Abstract: A flexible, polymer-based biosensor deployable into the arterial system which can assess shear stress in the arterial geometry in the presence of time-varying component of blood flow. Also, a method of fabricating a biosensor which may be used for in vivo procedures, involving the sequential depositing onto a substrate of a silicon dioxide layer, a metal heating element on the silicon dioxide layer, and a biocompatible polymer on the heating element, followed by etching the polymer layer to provide holes to allow for electrode contact with the heating element. A second metal layer is then deposited to form electrodes, followed by a second biocompatible polymer layer to form the device structure and removing the fabricated biosensor from the substrate by etching the substrate. In addition, a method of determining intravascular shear stress by measuring the temperature, flow rate and pressure of a bodily fluid with a biocompatible biosensor is disclosed.

Abstract: A DNA probe synthesis system may include a target holder for holding a target chip, an ejector array chip, a wash and dry station, and conveyance means for moving the target holder and the chip between the ejector array chip and the wash and dry station. The ejector array chip may include ejectors, reservoirs for containing DNA bases, and microchannels all on the same substrate. The ejectors may be Self Focusing Acoustic Transducers (SFATs).

Abstract: A MEMS silicon inertial sensor formed of a mass that is supported and constrained to vibrate in only specified ways. The sensors can be separately optimized from the support, to adjust the sensitivity separate from the bandwidth. The sensor can sense three dimensionally, or can only sense in a single plane. Vibration cancellation may be provided.

Abstract: A DNA probe synthesis system may include a target holder for holding a target chip, an ejector array chip, a wash and dry station, and conveyance means for moving the target holder and the chip between the ejector array chip and the wash and dry station. The ejector array chip may include ejectors, reservoirs for containing DNA bases, and microchannels all on the same substrate. The ejectors may be Self Focusing Acoustic Transducers (SFATs).

Abstract: A micromachined piezoelectric microspeaker and its fabricating method are disclosed. The micromachined piezoelectric microspeaker comprises a diaphragm and a plurality of contact pads. The diaphragm comprises an active area which is flat, and a non-active area which is wrinkled and surrounds the active area. The plurality of contact pads for electrodes are located outside of the diaphragm and over a wafer.

Abstract: A micromachined piezoelectric microspeaker and its fabricating method are disclosed. The micromachined piezoelectric microspeaker comprises a diaphragm and a plurality of contact pads. The diaphragm comprises an active area which is flat, and a non-active area which is wrinkled and surrounds the active area. The plurality of contact pads for electrodes are located outside of the diaphragm and over a wafer.

Abstract: A micromachined acoustic transducer comprising a parylene diaphragm piezoelectric transducer. The parylene diaphragm has far lower stiffness than the silicon nitride. The method for fabricating the parylene diaphragm acoustic transducer utilizes a prestructured disphragm layer utilizing silicon nitride which is compatible with high temperature semiconductor process. A silicon nitride layer is patterned and partially removed after forming the parylene diaphragm layer in order to enhance the structural qualities of the parylene diaphragm. The diaphragm may be flat or dome-shaped.

Abstract: A micromachined piezoelectric microspeaker and its fabricating method are disclosed. The micromachined piezoelectric microspeaker comprises a diaphragm and a plurality of contact pads. The diaphragm comprises an active area which is flat, and a non-active area which is wrinkled and surrounds the active area. The plurality of contact pads for electrodes are located outside of the diaphragm and over a wafer.

Abstract: A Fresnel Annular Sector Actuator (FASA) for micromixing of fluids, utilizes a self-focusing acoustic wave transducer which focuses acoustic waves through constructive wave interference. In the transducer, RF power is applied between the electrodes (sandwiching a piezoelectric film) with its frequency preferably corresponding to the thickness mode resonance of the piezoelectric film. Strong acoustic waves are generated over the electrode area, and interfere with each other as they propagate in the fluid. By proper design of the electrodes, and forming various combinations of the electrodes, wave focusing can be achieved. The mixing can be further enhanced by providing selective actuation and sequencing of the different segments by an RF signal source.

Abstract: A micromachined piezoelectric microspeaker and its fabricating method are disclosed. The micromachined piezoelectric microspeaker comprises a diaphragm and a plurality of contact pads. The diaphragm comprises an active area which is flat, and a non-active area which is wrinkled and surrounds the active area. The plurality of contact pads for electrodes are located outside of the diaphragm and over a wafer.

Abstract: A DNA probe synthesis system may include a target holder for holding a target chip, an ejector array chip, a wash and dry station, and conveyance means for moving the target holder and the chip between the ejector array chip and the wash and dry station. The ejector array chip may include ejectors, reservoirs for containing DNA bases, and microchannels all on the same substrate. The ejectors may be Self Focusing Acoustic Transducers (SFATs).

Abstract: During the formation of a spherical cavity in a substrate, self-limiting etching behavior of an isotropic etchant can be utilized when a tape is used as an etch mask. Such a self-limiting behavior is due to the presence of gas bubbles (consisted of SiF4 and NO, etch by-products) which close the etch window and limit the mass transport of the etchant to this silicon surface. Because of that, the spherical cavity size depends mostly on the size of the etch-mask opening, and is independent of the etching time. This self-limiting etching behavior precisely controls the dimension and uniformity of the spherical cavity.