Patents by Inventor Eun Sol Kim

Eun Sol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240105934
    Abstract: A positive electrode active material for a lithium secondary battery has a mixture of microparticles having a predetermined average particle size (D50) and macroparticles having a larger average particle size (D50) than the microparticles. The microparticles have the average particle size (D50) of 1 to 10 ?m and are at least one selected from the group consisting of particles having a carbon material coating layer on all or part of a surface of primary macroparticles having an average particle size (D50) of 1 ?m or more, particles having a carbon material coating layer on all or part of a surface of secondary particles formed by agglomeration of the primary macroparticles, and a mixture thereof. The macroparticles are secondary particles having an average particle size (D50) of 5 to 20 ?m formed by agglomeration of primary microparticles having a smaller average particle size (D50) than the primary macroparticles.
    Type: Application
    Filed: June 9, 2022
    Publication date: March 28, 2024
    Applicant: LG Energy Solution, Ltd.
    Inventors: Gi-Beom Han, Jong-Woo Kim, Eun-Sol Lho, Kang-Joon Park, Min Kwak, Seul-Ki Kim, Hyeong-Il Kim, Sang-Min Park, Sang-Wook Lee, Wang-Mo Jung
  • Patent number: 11942018
    Abstract: A display device is described including a display panel for displaying an image and an input sensing unit disposed on the display panel for sensing a user input. The input sensing unit includes: an electrode unit including first electrodes and second electrodes which intersect each other and a control unit for determining the proximity of an object or the shape of the object, based on capacitance change values of the first electrodes and the second electrodes. In a first mode the input sensing unit is driven using a self-capacitance method. The control unit may merge the capacitance change values, and determine the proximity of the object based on the merged value. In a second mode based on mutual capacitance, the control unit may determine the shape of the object.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: March 26, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jae Woo Choi, Tae Joon Kim, Eun Sol Seo, Hyun Wook Cho
  • Publication number: 20240070492
    Abstract: Disclosed herein are a reasoning method based on a structural attention mechanism for knowledge-based question answering and a computing apparatus for performing the reasoning method. The reasoning method includes: recognizing one or more entities in a query including content and a question, and linking the recognized entities to a knowledge base; constructing a question hypergraph and a query-aware knowledge hypergraph by performing a multi-hop graph walk on a question graph and the knowledge base; and inferring a correct answer to the question by applying as attention mechanism to a query hyperedge and a knowledge hyperedge included in the question hypergraph and the query-aware knowledge hypergraph, respectively.
    Type: Application
    Filed: December 16, 2022
    Publication date: February 29, 2024
    Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Byoung-Tak ZHANG, Yu-Jung HEO, Eun-Sol KIM, Woo Suk CHOI
  • Publication number: 20230359163
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Application
    Filed: July 17, 2023
    Publication date: November 9, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20230324874
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Application
    Filed: June 12, 2023
    Publication date: October 12, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20230242888
    Abstract: The present invention relates to a method for mass-producing vaccinia virus using suspended cells. Although methods for producing vaccinia virus using adherent cells in the related art have limitations that are not suitable for mass production of viruses due to the characteristics of adherent cells, the present inventors have developed a technique capable of producing viruses even in a bioreactor using a low appropriate cell number, MOI, culture FBS concentration, and a medium while using suspended cells, and it was also confirmed that the present invention has high virus productivity similar to that in the case of using adherent cells. Accordingly, the technique of producing vaccinia virus using suspended cells according to the present invention enables mass production of vaccinia virus with high productivity.
    Type: Application
    Filed: June 22, 2021
    Publication date: August 3, 2023
    Inventors: Sung Jin KIM, Sang Yong KIM, Eun Sol KIM, Ka Ul KIM, Sujeong KIM
  • Patent number: 11703824
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Grant
    Filed: December 27, 2021
    Date of Patent: July 18, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20230213860
    Abstract: The present invention relates to a positive-type photosensitive resin composition and to a cured film prepared therefrom. The positive-type photosensitive resin composition may have excellent storage stability as it comprises an orthoester, and a cured film prepared therefrom may have excellent adhesion and chemical resistance.
    Type: Application
    Filed: December 5, 2022
    Publication date: July 6, 2023
    Inventors: Jin Kyu IM, Ju-Young JUNG, Eun Sol KIM, Yeonok KIM
  • Patent number: 11675330
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: June 13, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20220269254
    Abstract: A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.
    Type: Application
    Filed: February 25, 2022
    Publication date: August 25, 2022
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Andrew Sundstrom, Damas Limoge, Vadim Pinskiy, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
  • Publication number: 20220129491
    Abstract: According to the present disclosure, an agent support method including acquiring information on or regarding at least one keyword related to counseling, identifying information on or regarding an index corresponding to the at least one keyword, and displaying a title related to a counseling record and an answer content list related to the index based on the information on the index and a computing device thereof is provided.
    Type: Application
    Filed: January 22, 2021
    Publication date: April 28, 2022
    Inventors: Jeong Hun Lee, Hye Jin Kim, Cho Rong Kim, Mi Sun Lim, Yoo Jung Jo, Eun Sol Kim, So Yeon Son, Sang Gwee Bae, Han Na Kang
  • Publication number: 20220121169
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Application
    Filed: December 27, 2021
    Publication date: April 21, 2022
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20220043420
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Application
    Filed: October 25, 2021
    Publication date: February 10, 2022
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Patent number: 11209795
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: December 28, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Patent number: 11156982
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: October 26, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20210311440
    Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.
    Type: Application
    Filed: June 18, 2021
    Publication date: October 7, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Andrew Sundstrom, Eun-Sol Kim, Damas Limoge, Vadim Pinskiy, Matthew C. Putman
  • Publication number: 20210192779
    Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.
    Type: Application
    Filed: March 9, 2021
    Publication date: June 24, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
  • Publication number: 20210132593
    Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.
    Type: Application
    Filed: November 6, 2020
    Publication date: May 6, 2021
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
  • Patent number: 10786895
    Abstract: A home robot device includes a memory, a movement module, and a processor. The processor is configured to execute a motion based on specified motion execution information stored in the memory, obtain feedback information of a user, generate modified motion execution information by modifying at least a portion of the specified motion execution information based on the feedback information of the user, where the modified motion execution information includes a movement value of at least one joint unit of the home robot device or at least one support linked to the at least one joint unit selected from a probability model of the specified motion execution information, and execute a motion of the home robot device based on the modified motion execution information.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: September 29, 2020
    Assignees: Samsung Electronics Co., Ltd., SNU R&DB Foundation
    Inventors: So Hee Lee, Dong Hyun Kwak, Eun Sol Kim, Ji Seob Kim, Kyoung Woon On, Byoung Tak Zhang, Kyung Shik Roh, Suk June Yoon
  • Publication number: 20200293019
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Application
    Filed: April 20, 2020
    Publication date: September 17, 2020
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-sol Kim, Andrew Sundstrom