Patents by Inventor Eva E. Simonyi

Eva E. Simonyi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7843067
    Abstract: The present disclosure relates to a microelectronic structure and the manufacture of the microelectronic structure. Specifically, the disclosure relates to an interconnect barrier layer between a rhodium contact structure and a copper interconnect structure in a microelectronic structure. The microelectronic structure provides for low resistance in microelectronic devices.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: November 30, 2010
    Assignee: International Business Machines Corporation
    Inventors: John M. Cotte, Balasubramanian Haran, Christopher C. Parks, Xiaoyan Shao, Eva E. Simonyi
  • Publication number: 20090239062
    Abstract: The present disclosure relates to a microelectronic structure and the manufacture of the microelectronic structure. Specifically, the disclosure relates to an interconnect barrier layer between a rhodium contact structure and a copper interconnect structure in a microelectronic structure. The microelectronic structure provides for low resistance in microelectronic devices.
    Type: Application
    Filed: March 24, 2008
    Publication date: September 24, 2009
    Inventors: John M. Cotte, Balasubramanian Haran, Christopher C. Parks, Xiaoyan Shao, Eva E. Simonyi
  • Patent number: 6114413
    Abstract: A conductive paste structure is is disclosed which is a combination of a polymeric material and particles, e.g. Cu, having a thermally conductive coating, e.g. Sn. Heat is applied to fuse the coating of adjacent particles. The polymeric material is a thermoplastic. The conductive paste structure is disposed between two thermally conductive surfaces, e.g.chip and substrate pads, to provide thermal interconnection and adhesion between their pads.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: September 5, 2000
    Assignee: International Business Machines Corporation
    Inventors: Sung Kwon Kang, Sampath Purushothaman, Eva E. Simonyi
  • Patent number: 5898991
    Abstract: Methods are described for fabricating devices having vias containing more than one electrical conductor, in particular coaxial electrical conductors. A plurality of wires are bonded to a first substrate, such as a copper wire to a copper substrate. A second substrate having through-holes with side walls covered with an electrical conductor is disposed over the first substrate so that the wires are within the through-holes and spaced apart from the side walls. The first substrate is spaced apart from the second substrate by dielectric spacers. A polymer is injected into the space between the first and second substrates to provide electrical isolation therebetween. A polymer is injected into the space in the via between the elongated conductors and the conductive sidewall to provide dielectric isolation therebetween. The second substrate has electrically conductive pattern on both sides which are electrically interconnected by the electrically conductive sidewall to form an inner coil of electrical conductors.
    Type: Grant
    Filed: January 16, 1997
    Date of Patent: May 4, 1999
    Assignee: International Business Machines Corporation
    Inventors: Keith Edward Fogel, Jeffrey Curtis Hedrick, David Andrew Lewis, Eva E. Simonyi, Alfred Viehbeck, Stanley Joseph Whitehair
  • Patent number: 5541567
    Abstract: Structures are described having vias with more than one electrical conductor at least one of which is a solid conductor which is formed by inserting the wire into the via in a substrate wherein the wire is attached to an electrically conductive plate which is spaced apart from the substrate by a spacer which leave a space between the substrate and plate. The space is filled with a dielectric material. The space with via between the conductor and via sidewall is filled with a dielectric material. The via is used for making transformers and inductors wherein one of the via conductors is used for inner windings and another of the via conductors is used for outer windings.
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: July 30, 1996
    Assignee: International Business Machines Corporation
    Inventors: Keith E. Fogel, Jeffrey C. Hedrick, David A. Lewis, Eva E. Simonyi, Alfred Viehbeck, Stanley J. Whitehair
  • Patent number: 5176947
    Abstract: Improved electroerosion recording media can be prepared by utilizing, on top of a polyester, paper, or metal substrate, a polyvinylbutyral polymer cross-linked with a mixed phenol-tert-butylphenol formaldehyde cross-linking agent as a base layer, and an erodible metallic layer sufficiently thin to be erodible in response to current pulses delivered by a stylus of an electroerosion printer. In a preferred embodiment, the polymeric layer further contains silica. The recording medium may also be top coated with a lubricating agent. The formulation provides excellent adhesion of the conductive layer, and allows the thickness of the aluminum to be increased up to 75%, resulting in an optical density (with aluminum as the metallic layer) of up to 3.5.
    Type: Grant
    Filed: December 7, 1990
    Date of Patent: January 5, 1993
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Mukesh K. Desai, Jahn P. Hoekstra, Keith S. Pennington, Eva E. Simonyi
  • Patent number: 4810119
    Abstract: An improved thermal transfer resistive ribbon usable in high resolution printing comprising a dual resistive layer formed of a first layer of low resistivity and a second layer of high resistivity, method of production thereof, use thereof and apparatus including the same.
    Type: Grant
    Filed: October 30, 1987
    Date of Patent: March 7, 1989
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Ronald T. Cannavaro, Walter Crooks, Mukesh Desai, Keith S. Pennington, Jean-Piet Hoekstra, Eva E. Simonyi