Patents by Inventor Evgenia KURGANOVA
Evgenia KURGANOVA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11971654Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: June 9, 2023Date of Patent: April 30, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11947256Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.Type: GrantFiled: June 26, 2018Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Publication number: 20240027893Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: July 11, 2023Publication date: January 25, 2024Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20230350301Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.Type: ApplicationFiled: February 17, 2021Publication date: November 2, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Evgenia KURGANOVA, Gosse Charles DE VRIES, Alexey Olegovich POLYAKOV, Jim Vincent OVERKAMP, Teis Johan COENEN, Tamara DRUZHININA, Sonia CASTELLANOS ORTEGA, Olivier Christian Maurice LUGIER
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Publication number: 20230324786Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: June 9, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Patent number: 11754918Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: December 13, 2021Date of Patent: September 12, 2023Assignee: ASML NETHERLANDS B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20230280662Abstract: Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.Type: ApplicationFiled: August 17, 2021Publication date: September 7, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Evgenia KURGANOVA, Marijke SCOTUZZI, Vina FARAMARZI, Bastiaan Maurice VAN DEN BROEK
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Patent number: 11686997Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: March 3, 2022Date of Patent: June 27, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11467486Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.Type: GrantFiled: February 7, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Alexander Ludwig Klein, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Sten Vollebregt, Willem-Pieter Voorthuijzen
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Publication number: 20220213593Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.Type: ApplicationFiled: March 20, 2020Publication date: July 7, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Tamara DRUZHININA, Jim Vincent OVERKAMP, Alexey Olegovich POLYAKOV, Teis Johan COENEN, Evgenia KURGANOVA, Ionel Mugurel CIOBICA, Alexander Ludwig KLEIN, Albertus Victor Gerardus MANGNUS, Marijke SCOTUZZI, Bastiaan Maurice VAN DEN BROEK
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Publication number: 20220187701Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: March 3, 2022Publication date: June 16, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20220121111Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: December 13, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11287737Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: November 5, 2018Date of Patent: March 29, 2022Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20220035239Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: October 2, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander BALTUSSEN, Dennis DE GRAAF, Johannes Christiaan Leonardus FRANKEN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Alexey Sergeevich KUZNETSOV, Arnoud Willem NOTENBOOM, Mahdiar VALEFI, Marcus Adrianus VAN DE KERKHOF, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Ties Wouter VAN DER WOORD, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11231646Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: June 8, 2018Date of Patent: January 25, 2022Assignee: ASML Netherlands B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20210181618Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: November 5, 2018Publication date: June 17, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Publication number: 20210079519Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.Type: ApplicationFiled: February 21, 2019Publication date: March 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV
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Publication number: 20200406244Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.Type: ApplicationFiled: February 7, 2019Publication date: December 31, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Evgenia KURGANOVA, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Pieter-Jan VAN ZWOL, David Ferdinand VLES, Sten VOLLEBREGT, Willem-Pieter VOORTHUIJZEN
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Publication number: 20200209736Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: June 8, 2018Publication date: July 2, 2020Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Flendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Maria PETER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20200159107Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.Type: ApplicationFiled: June 26, 2018Publication date: May 21, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Evgenia KURGANOVA, Adrianus Johannes Maria GIESBERS, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Pieter-Jan VAN ZWOL, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN