Abstract: An integrated circuit comprises a transistor body control circuit for controlling a body of a bidirectional power transistor. The transistor body control circuit comprises switches connected between a body terminal and a first current terminal, with a control terminal for controlling the current flowing through the switch. The control terminal of the switch is connected to alternating current, AC capacitive voltage divider. The AC capacitive voltage dividers are connected to the control terminals and arranged to control the switches to switch the voltage of the body terminal as a function of the voltage between the first current terminal and the second current terminal. The integrated circuit further comprises a bi-directional power transistor connected to the transistor body control circuit.

Abstract: An integrated circuit comprises a transistor body control circuit for controlling a body of a bidirectional power transistor. The transistor body control circuit comprises switches connected between a body terminal and a first current terminal, with a control terminal for controlling the current flowing through the switch. The control terminal of the switch is connected to alternating current, AC capacitive voltage divider. The AC capacitive voltage dividers are connected to the control terminals and arranged to control the switches to switch the voltage of the body terminal as a function of the voltage between the first current terminal and the second current terminal. The integrated circuit further comprises a bi-directional power transistor connected to the transistor body control circuit.

Abstract: A method of forming a power semiconductor device comprises forming a first semiconductor layer of a first conductivity type extending across the power semiconductor device; forming an epitaxial layer of the first conductivity type over the first semiconductor layer, the epitaxial layer having a doping concentration that increases from a first surface of the epitaxial layer towards the first semiconductor layer; forming a body region of a second conductivity type in the epitaxial layer extending from the first surface of the epitaxial layer into the epitaxial layer, wherein a junction between the body region and the epitaxial layer is at or substantially adjacent to a region of the epitaxial layer having a maximum doping concentration; and forming a gate region such that the gate region is adjacent at least a portion of the body region. In operation of the semiconductor device, the portion of the body region adjacent the gate region functions as a channel region of the semiconductor device.

Abstract: A method of forming a power semiconductor device comprises forming a first semiconductor layer of a first conductivity type extending across the power semiconductor device; forming an epitaxial layer of the first conductivity type over the first semiconductor layer, the epitaxial layer having a doping concentration that increases from a first surface of the epitaxial layer towards the first semiconductor layer; forming a body region of a second conductivity type in the epitaxial layer extending from the first surface of the epitaxial layer into the epitaxial layer, wherein a junction between the body region and the epitaxial layer is at or substantially adjacent to a region of the epitaxial layer having a maximum doping concentration; and forming a gate region such that the gate region is adjacent at least a portion of the body region. In operation of the semiconductor device, the portion of the body region adjacent the gate region functions as a channel region of the semiconductor device.