Patents by Inventor Fan Piao

Fan Piao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of and system for improving stability of photomasks
    Patent number: 6627355
    Abstract: The present invention provides a method of and system for reducing the absorption of light by opaque material in a photomask. The method includes providing a photomask substrate, and applying an opaque material to one side of the photomask substrate. The interface between the opaque material and photomask substrate reflects at least 80 percent of the light through the photomask.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: September 30, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Harry J. Levinson, Fan Piao, Christopher A. Spence
  • Barrier for and a method of reducing outgassing from a photoresist material
    Patent number: 6555234
    Abstract: A barrier layer can be provided over a photoresist film to prevent outgassing. The barrier layer can be relatively highly transmissive to radiation at the actinic wavelength. The barrier layer can be removed before the photoresist layer is developed.
    Type: Grant
    Filed: February 1, 2001
    Date of Patent: April 29, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Fan Piao
  • Inverse integrated circuit fabrication process
    Patent number: 6458686
    Abstract: An inverse IC process provides surface uniformity. A method of fabricating an integrated circuit structure includes a number of interconnect layers and a number of transistors. The method includes providing interconnect layers above a substrate, providing a semiconductor layer above the interconnect layers and providing gate conductors on a top surface of the semiconductor layer. The top surface is opposite a bottom surface. The bottom surface is closer to the interconnect layers than the top surface.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: October 1, 2002
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Fan Piao
  • Method of and system for improving stability of photomasks
    Publication number: 20020132171
    Abstract: The present invention provides a method of and system for reducing the absorption of light by opaque material in a photomask. The method includes providing a photomask substrate, and applying an opaque material to one side of the photomask substrate. The interface between the opaque material and photomask substrate reflects at least 80 percent of the light through the photomask.
    Type: Application
    Filed: December 20, 2000
    Publication date: September 19, 2002
    Applicant: Advanced Micro Devices, Inc.
    Inventors: Harry J. Levinson, Fan Piao, Christopher A. Spence
  • Configurable patterning device and a method of making integrated circuits using such a device
    Publication number: 20020115021
    Abstract: A lithographic system for an integrated circuit fabrication process includes a computer and a configurable mask. The configurable mask is coupled to the computer. The configurable mask allows light to be transmitted in the pattern controlled by a control signal from the computer. The mask can allow ASIC type functionality for designing custom design integrated circuits.
    Type: Application
    Filed: February 1, 2001
    Publication date: August 22, 2002
    Applicant: Advanced Micro Devices, Inc.
    Inventor: Fan Piao