Patents by Inventor Feibiao CHEN

Feibiao CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10197923
    Abstract: In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (600a, 600b, 600c, 600d, 600e, 600f), so that each of the alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) is arranged on the same straight line as a respective one of the focusing sensors (600a, 600b, 600c, 600d, 600e, 600f). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: February 5, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Feibiao Chen, Chang Zhou, Yuefei Chen, Qi Cheng, Lei Diao, Jingchao Qi
  • Patent number: 10040717
    Abstract: Devices, methods, and systems are described for thick-film paste with multiple discrete frits. The paste may be applied to contacting crystalline silicon solar cell emitter surfaces. Each frit contains both lead and tellurium. The described multiple discrete frit paste has superior solar cell performance compared with single frit pastes made from the individual discrete frits that make-up the multiple frit paste.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: August 7, 2018
    Assignee: Jiangxi Jiayin Science and Technology, Ltd.
    Inventors: Kurt R. Mikeska, Meijun Lu, Feibiao Chen
  • Patent number: 9857702
    Abstract: A focusing and leveling apparatus, including: an illumination light source (201) for emanating a light beam; an illumination lens group (202), a projecting unit, an object (209) being measured, a detecting unit, a refractive unit, a relay lens group and a photoelectric detector (220), disposed sequentially in this order in a transmission path of the light beam. The projecting unit includes projection slits (203) defining a plurality of non-linearly arranged marks, such that after passing sequentially through the illumination lens group (202), the projecting unit, the object (209) being measured and the detecting unit, the light beam emanated by the illumination light source (201) becomes a plurality of non-linearly arranged sub-beams corresponding to the plurality of marks. The refractive unit is so configured that after passing through the refractive unit, the plurality of sub-beams form a plurality of linearly arranged light spots.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: January 2, 2018
    Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
    Inventors: Haijun Song, Kan Lu, Feibiao Chen
  • Publication number: 20170351185
    Abstract: Disclosed is an adaptive groove focusing and leveling device for measuring the height and the inclination of the surface of a measured object (400).
    Type: Application
    Filed: December 27, 2015
    Publication date: December 7, 2017
    Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Jingchao QI, Feibiao CHEN
  • Publication number: 20170219935
    Abstract: In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (600a, 600b, 600c, 600d, 600e, 600f), so that each of the alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) is arranged on the same straight line as a respective one of the focusing sensors (600a, 600b, 600c, 600d, 600e, 600f). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.
    Type: Application
    Filed: July 13, 2015
    Publication date: August 3, 2017
    Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Feibiao CHEN, Chang ZHOU, Yuefei CHEN, Qi CHENG, Lei DIAO, Jingchao QI
  • Publication number: 20160327875
    Abstract: A focusing and leveling apparatus, including: an illumination light source (201) for emanating a light beam; an illumination lens group (202), a projecting unit, an object (209) being measured, a detecting unit, a refractive unit, a relay lens group and a photoelectric detector (220), disposed sequentially in this order in a transmission path of the light beam. The projecting unit includes projection slits (203) defining a plurality of non-linearly arranged marks, such that after passing sequentially through the illumination lens group (202), the projecting unit, the object (209) being measured and the detecting unit, the light beam emanated by the illumination light source (201) becomes a plurality of non-linearly arranged sub-beams corresponding to the plurality of marks. The refractive unit is so configured that after passing through the refractive unit, the plurality of sub-beams form a plurality of linearly arranged light spots.
    Type: Application
    Filed: December 24, 2014
    Publication date: November 10, 2016
    Inventors: Haijun SONG, Kan LU, Feibiao CHEN