Abstract: A thin film transistor, a method for fabricating the same, an array substrate, a display panel, and a display device are provided. The thin film transistor includes a substrate, and an active layer on the substrate, wherein the active layer includes a poly-silicon layer and has a channel region and two electrode connection regions respectively on two sides of the channel region, and the channel region includes a plurality of lightly drain doping segments, which are spaced apart along from one of the electrode connection regions to the other electrode connection region, and channel segments located between the lightly drain doping segments.

Abstract: The present disclosure relates to the technical field of display. Disclosed are an array substrate and a preparation method therefor, and a display panel and a display device. The array substrate includes: a substrate; multiple gate lines, wherein the gate lines are located on the substrate, and extend along a first direction; multiple data lines, wherein the data lines are located on the substrate, and extend along a second direction, and the gate lines and the data lines intersect to define multiple pixel areas; and a touch-control electrode wiring wherein the touch-control electrode wiring has the same direction as that of the gate lines, and is arranged insulated from the gate lines on a different layer, and the orthographic projection of the touch-control electrode wiring on the substrate at least has an overlapping area with the orthographic projection of part of the gate lines on the substrate.

Abstract: An array substrate is provided. The array substrate include a base, a first electrode and a second electrode which are on the base and a touch line on the base, both the first electrode and the second electrode are configured to transmit a display signal, the touch line is configured to transmit a touch signal; the first electrode and the touch line are respectively in different layers, and an orthographic projection of the first electrode on the base at least partially overlaps with an orthographic projection of the touch line on the base. A preparation method of the array substrate and a touch display panel are further provided.

Abstract: An array substrate, a display panel and a display device are provided. The array substrate includes a base substrate, and a metal connecting member, a first insulating layer, a signal line, a second insulating layer and a first electrode which are disposed on the base substrate in this order. The first insulating layer is located between the metal connecting member and the signal line, and the second insulating layer is located between the signal line and the common electrode. A material of the metal connecting member is different from a material of the signal line. The signal line is electrically connected to the first electrode through the metal connecting member. A contact resistance between the material of the metal connecting member and a material of the first electrode is smaller than a contact resistance between the material of the signal line and the material of the first electrode.

Abstract: An array substrate and a method for manufacturing the same, a display panel and a display device are provided. The array substrate includes: a substrate; a gate metal layer arranged on the substrate, the gate metal layer including a gate line and a patterned auxiliary metal; a source and drain metal layer, the source and drain metal layer including source signal lines and touch signal lines, and the source and drain metal layer being separated from the gate metal layer by an insulating layer; a planarization layer arranged on the source and drain metal layer; and a common electrode arranged on the planarization layer. The patterned auxiliary metal is electrically connected to the touch signal lines through first holes penetrating the insulating layer, and is electrically connected to the common electrode through second holes penetrating the insulating layer and third holes penetrating the planarization layer.

Abstract: The present application provides a thin film transistor, an array substrate, a display device and a method of fabricating a thin film transistor. According to embodiments of the present application, the thin film transistor includes: a substrate; a first source/drain electrode on the substrate; an active layer at a side of the first source/drain electrode facing away from the substrate; and a second source/drain electrode at a side of the active layer facing away from the first source/drain electrode. The first source/drain electrode and the second source/drain electrode are electrically connected to the active layer independently.

Abstract: A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes: forming a first electrode; forming a first insulation layer on the first electrode; forming a first via hole in the first insulation layer; forming an active layer on the first insulation layer, which is electrically connected with the first electrode through the first via hole; forming a gate insulation layer on the active layer; forming a first gate electrode on the gate insulation layer, which overlaps with at least part of the active layer; forming a second insulation layer on the first gate electrode and the gate insulation layer, forming a second via hole in the second insulation layer and the gate insulation layer; forming a pixel electrode on the second insulation layer, which is electrically connected with the active layer through the second via hole.

Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes a base substrate; a first conductive layer located on the base substrate, including a source electrode of a switching element; and a color filter layer located on the first conductive layer, wherein the source electrode of the switching element and the color filter layer are abutted in a direction perpendicular to the base substrate.

Abstract: This disclosure provides a display panel, a production method, and a display apparatus. The display panel comprises a first substrate, a second substrate, and a liquid crystal layer provided between the first substrate and the second substrate. The first substrate is provided with a black matrix, and the second substrate is provided oppositely to the first substrate and is provided with a light-shielding layer pattern. A surface of the light-shielding layer pattern has a light-reflecting property, and a projection of at least a part of the light-shielding layer pattern on the second substrate extends beyond a projection of the black matrix on the second substrate.

Abstract: The present application provides a thin film transistor, an array substrate, a display device and a method of fabricating a thin film transistor. According to embodiments of the present application, the thin film transistor includes: a substrate; a first source/drain electrode on the substrate; an active layer at a side of the first source/drain electrode facing away from the substrate; and a second source/drain electrode at a side of the active layer facing away from the first source/drain electrode. The first source/drain electrode and the second source/drain electrode are electrically connected to the active layer independently.

Abstract: An array substrate and a method for manufacturing the same, a display panel and a display device are provided. The array substrate includes: a substrate; a gate metal layer arranged on the substrate, the gate metal layer including a gate line and a patterned auxiliary metal; a source and drain metal layer, the source and drain metal layer including source signal lines and touch signal lines, and the source and drain metal layer being separated from the gate metal layer by an insulating layer; a planarization layer arranged on the source and drain metal layer; and a common electrode arranged on the planarization layer. The patterned auxiliary metal is electrically connected to the touch signal lines through first holes penetrating the insulating layer, and is electrically connected to the common electrode through second holes penetrating the insulating layer and third holes penetrating the planarization layer.

Abstract: A display device is provided, including an array substrate and an opposite substrate, a fan-out gate array formed on the array substrate and a transparent conductive material layer overlying the fan-out gate array; and a fan-out region formed on the opposite substrate and a base layer formed on the fan-out region.

Abstract: A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes: forming a first electrode; forming a first insulation layer on the first electrode; forming a first via hole in the first insulation layer; forming an active layer on the first insulation layer, which is electrically connected with the first electrode through the first via hole; forming a gate insulation layer on the active layer; forming a first gate electrode on the gate insulation layer, which overlaps with at least part of the active layer; forming a second insulation layer on the first gate electrode and the gate insulation layer, forming a second via hole in the second insulation layer and the gate insulation layer; forming a pixel electrode on the second insulation layer, which is electrically connected with the active layer through the second via hole.

Abstract: An array substrate and a manufacturing method thereof and a display panel are provided. The array substrate includes: a base substrate; a first layer, located on the base substrate, including a force electrode configured to detect a touch force; a buffer layer located on the first layer; a thin film transistor including a gate electrode located on the buffer layer; and a second layer including a force electrode wire and the gate electrode; the force electrode wire and the force electrode being electrically connected.

Abstract: An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes a base substrate; a first conductive layer located on the base substrate, including a source electrode of a switching element; and a color filter layer located on the first conductive layer, wherein the source electrode of the switching element and the color filter layer are abutted in a direction perpendicular to the base substrate.

Abstract: A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer (4) by a dry etching. And following the step of patterning a non-metallic layer (4) by the dry etching, the method further comprises performing surface planarization on a first film layer (3) to recover the first film layer (3) with a rough surface caused by the dry etching to be planar. The first film layer (3) is located below the non-metallic layer (4).

Abstract: Disclosed herein is a thin film patterning method and a thin film patterning apparatus. The thin film patterning method comprises the steps of: disposing a mask above a substrate, wherein the mask is provided with hollow-out parts which are identical with preset deposition patterns; and covering the mask with a thin film, wherein the thin film at hollow-out parts of the mask is formed on the substrate, while the remaining area of the substrate shielded by the mask is free of the thin film, so that a patterned thin film is formed on the substrate. The thin film patterning method in the present disclosure can transfer directly patterns on the mask to the substrate through one-step deposition, omit the process steps of photolithography and etching, simplify the process flow to a large extent, and save the costs of the thin film patterning.

Abstract: A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer (4) by a dry etching. And following the step of patterning a non-metallic layer (4) by the dry etching, the method further comprises performing surface planarization on a first film layer (3) to recover the first film layer (3) with a rough surface caused by the dry etching to be planar. The first film layer (3) is located below the non-metallic layer (4).

Abstract: The present disclosure provides a method and a device for titling, which can achieve automatic correction when deviation occurs between a real titling position of a product to be titled and a preset titling position, so as to avoid an ID shift phenomenon, and thus ensure accuracy of titling positions and improve titling efficiency. The titling method provided in the present disclosure comprises: determining a real titling position of a product to be titled; comparing the real titling position with a preset titling position; and titling the product to be titled in accordance with the comparison result.

Abstract: The present disclosure provides a method and a device for titling, which can achieve automatic correction when deviation occurs between a real titling position of a product to be titled and a preset titling position, so as to avoid an ID shift phenomenon, and thus ensure accuracy of titling positions and improve titling efficiency. The titling method provided in the present disclosure comprises: determining a real titling position of a product to be titled; comparing the real titling position with a preset titling position; and titling the product to be titled in accordance with the comparison result.