Patents by Inventor Fengjie LIN

Fengjie LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MICRO LIGHT EMITTING ELEMENT AND ITS PREPARATION METHOD
    Publication number: 20240128403
    Abstract: The present disclosure provides a micro light-emitting element, method for manufacturing a micro light-emitting element, and a light-emitting device. The micro light-emitting element includes a DBR structure layer, including a DBR adhesive layer, a DBR reflective layer, and a DBR sacrificial layer, where the DBR adhesive layer, the DBR reflective layer, and the DBR sacrificial layer are sequentially stacked. Subsequent structural coverage of a DBR reflective layer is improved by means of the DBR adhesion layer. Density of film layers of the DBR sacrificial layer, the DBR reflective layer, and the DBR adhesive layer are sequentially increased, so that etching rates of the DBR sacrificial layer, the DBR reflective layer, and the DBR adhesive layer are sequentially decreased during etching, thereby forming an inverted trapezoidal through hole which comprises an inclined side wall by an etching process.
    Type: Application
    Filed: December 22, 2023
    Publication date: April 18, 2024
    Applicant: XIAMEN CHANGELIGHT CO., LTD.
    Inventors: Wei LIU, Weiwen LIU, Shaowen PENG, Fengjie LIN, Hongyi ZHOU