Abstract: A self-cleaning optical system for the transmission or reflection of light to and/or from a process region comprises a liquid bath and a transparent or reflective optical component continuously rotatable about a non-vertical axis so that a lower part of the component continuously rotates through the bath. When the component emerges from the bath, a coating of the liquid remains thereon which forms a substantially uniform film on at least a part of the component through which the light is transmitted or from which the light is reflected.

Abstract: A self-cleaning optical system for the transmission or reflection of light to and/or from a process region comprises a liquid bath and a transparent or reflective optical component continuously rotatable about a non-vertical axis so that a lower part of the component continuously rotates through the bath. When the component emerges from the bath, a coating of the liquid remains thereon which forms a substantially uniform film on at least a part of the component through which the light is transmitted or from which the light is reflected.

Abstract: A method of wetting a surface of a solid substrate with a liquid metal, comprises activating said surface with a high energy beam; and introducing the liquid metal to the surface while in the active state, the temperature of the surface being above the melting point of the liquid metal.

Abstract: A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.

Abstract: A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.

Abstract: An atmospheric pressure plasma system (1) sharing electrodes (4) defining a plasma region (5) mounted in an enclosure housing (2). The enclosure housing has an open to atmosphere entry port assembly (10) and exit port assembly (11) for the continuous transfer of work-pieces through the plasma region (5). The embodiment illustrated is for precursor process gases having a relative density less than that of the ambient air so that the precursor gases rise in the enclosure housing (2) expelling the heavier ambient and exhaust gases. Where the gases have a relative density greater than ambient the port assemblies (10 and 11) are sited above the plasma region (5).

Abstract: An atmospheric plasma assembly has a pair of parallel spaced apart planar electrodes each bonded to a dielectric plate. Two spacer plates separate the dielectric plates to form a plasma region. Sparge poles having nozzles are used to spray cooling water on the dielectric plates and electrodes. Ideally the dielectric plates and electrodes are vertically arranged.

Abstract: An atmospheric pressure plasma system (1) sharing electrodes (4) defining a plasma region (5) mounted in an enclosure housing (2). The enclosure housing has an open to atmosphere entry port assembly (10) and exit port assembly (11) for the continuous transfer of work-pieces through the plasma region (5). The embodiment illustrated is for precursor process gases having a relative density less than that of the ambient air so that the precursor gases rise in the enclosure housing (2) expelling the heavier ambient and exhaust gases. Where the gases have a relative density greater than ambient the port assemblies (10 and 11) are sited above the plasma region (5).