Patents by Inventor Fernando JOVE

Fernando JOVE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230279031
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Application
    Filed: May 15, 2023
    Publication date: September 7, 2023
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando A. JOVE
  • Patent number: 11702434
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: July 18, 2023
    Assignee: GELEST, INC.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Patent number: 11434252
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: September 6, 2022
    Assignee: GELEST, INC.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Publication number: 20210206786
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Application
    Filed: March 24, 2021
    Publication date: July 8, 2021
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Patent number: 11001599
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: May 11, 2021
    Assignee: GELEST TECHNOLOGIES, INC.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Publication number: 20200010488
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Patent number: 10479806
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: November 19, 2019
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Patent number: 10081642
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: September 25, 2018
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Publication number: 20180030072
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Application
    Filed: October 10, 2017
    Publication date: February 1, 2018
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Publication number: 20180030071
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Application
    Filed: October 10, 2017
    Publication date: February 1, 2018
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Patent number: 9815858
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: November 14, 2017
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Publication number: 20160368934
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Application
    Filed: June 8, 2016
    Publication date: December 22, 2016
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE
  • Publication number: 20160280724
    Abstract: Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
    Type: Application
    Filed: March 15, 2016
    Publication date: September 29, 2016
    Inventors: Barry C. ARKLES, Youlin PAN, Fernando JOVE