Patents by Inventor Fitih M. Cinnor

Fitih M. Cinnor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for single exposure—self-aligned double, triple, and quadruple patterning
    Patent number: 9666442
    Abstract: A method including forming a pattern on a surface of a substrate, the pattern including one of discrete structures including at least one sidewall defining an oblique angle relative to the surface and discrete structures complemented with a material layer therebetween, the material layer including a volume modified into distinct regions separated by at least one oblique angle relative to the surface; and defining circuit features on the substrate using the pattern, the features having a pitch less than a pitch of the pattern.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: May 30, 2017
    Assignee: Intel Corporation
    Inventors: Fitih M. Cinnor, Charles H. Wallace
  • METHODS FOR SINGLE EXPOSURE - SELF-ALIGNED DOUBLE, TRIPLE, AND QUADRUPLE PATTERNING
    Publication number: 20150187592
    Abstract: A method including forming a pattern on a surface of a substrate, the pattern including one of discrete structures including at least one sidewall defining an oblique angle relative to the surface and discrete structures complemented with a material layer therebetween, the material layer including a volume modified into distinct regions separated by at least one oblique angle relative to the surface; and defining circuit features on the substrate using the pattern, the features having a pitch less than a pitch of the pattern.
    Type: Application
    Filed: March 13, 2015
    Publication date: July 2, 2015
    Inventors: Fitih M. CINNOR, Charles H. WALLACE
  • Methods for single exposure—self-aligned double, triple, and quadruple patterning
    Patent number: 8980757
    Abstract: A method including forming a pattern on a surface of a substrate, the pattern including one of discrete structures including at least one sidewall defining an oblique angle relative to the surface and discrete structures complemented with a material layer therebetween, the material layer including a volume modified into distinct regions separated by at least one oblique angle relative to the surface; and defining circuit features on the substrate using the pattern, the features having a pitch less than a pitch of the pattern.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: March 17, 2015
    Assignee: Intel Corporation
    Inventors: Fitih M. Cinnor, Charles H. Wallace
  • METHODS FOR SINGLE EXPOSURE - SELF-ALIGNED DOUBLE, TRIPLE, AND QUADRUPLE PATTERNING
    Publication number: 20140073137
    Abstract: A method including forming a pattern on a surface of a substrate, the pattern including one of discrete structures including at least one sidewall defining an oblique angle relative to the surface and discrete structures complemented with a material layer therebetween, the material layer including a volume modified into distinct regions separated by at least one oblique angle relative to the surface; and defining circuit features on the substrate using the pattern, the features having a pitch less than a pitch of the pattern.
    Type: Application
    Filed: December 15, 2011
    Publication date: March 13, 2014
    Inventors: Fitih M. Cinnor, Charles H. Wallace