Patents by Inventor Fong M. Chang

Fong M. Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wiring arrangement ensuring all-or-none operation of a series of modular load elements
    Patent number: 6618265
    Abstract: All-or-none operation of a series of modular load elements is ensured by routing high and low voltage lines from a power source through opposite nodes positioned at either end of the series of load elements. This arrangement prevents activation of only a portion of the load elements where electrical connection between them is not successfully established.
    Type: Grant
    Filed: October 1, 2001
    Date of Patent: September 9, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Fong M. Chang, Yu Chang
  • Wiring arrangement ensuring all-or-none operation of a series of modular load elements
    Publication number: 20030063446
    Abstract: All-or-none operation of a series of modular load elements is ensured by routing high and low voltage lines from a power source through opposite nodes positioned at either end of the series of load elements. This arrangement prevents activation of only a portion of the load elements where electrical connection between them is not successfully established.
    Type: Application
    Filed: October 1, 2001
    Publication date: April 3, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Fong M. Chang, Yu Chang
  • Apparatus and method for depositing low K dielectric materials
    Patent number: 6176198
    Abstract: The invention provides a deposition system and methods of depositing materials onto substrates. In one aspect, a modular processing chamber is provided which includes a chamber body defining a processing region. The chamber body includes a removable gas feedthrough, an electrical feedthrough, a gas distribution assembly mounted on a chamber lid and a microwave applicator for generating reactive gases remote from the processing region.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: January 23, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Yeh-Jen Kao, Fong M. Chang, Robert B. Majewski, John Parks, David Wanamaker, Yen-Kun Wang