Abstract: A getter device is shaped like a substrate used in a deposition process. Embodiments of the device include a powdered getter material coated onto one or both sides of a support with a narrow rim portion left uncoated so that the device can be manipulated by automatic handling equipment. A method for using the getter device includes providing a vacuum chamber and automatic handling equipment, loading the device into the chamber, reducing the chamber pressure to a desired value by using the getter device in conjunction with an external pump, removing the getter device and replacing it with a substrate, and depositing a thin film on the substrate. The getter device can be in an activated state when loaded into the chamber, or it can be activated after being loaded by employing heating equipment ordinarily used to heat substrates placed in the chamber. The getter material of the device may also be activated in a separate activation chamber before the getter device is loaded into the vacuum chamber.

Abstract: A getter device is shaped like a substrate used in a deposition process. Embodiments of the device include a powdered getter material coated onto one or both sides of a support with a narrow rim portion left uncoated so that the device can be manipulated by automatic handling equipment. A method for using the getter device includes providing a vacuum chamber and automatic handling equipment, loading the device into the chamber, reducing the chamber pressure to a desired value by using the getter device in conjunction with an external pump, removing the getter device and replacing it with a substrate, and depositing a thin film on the substrate. The getter device can be in an activated state when loaded into the chamber, or it can be activated after being loaded by employing heating equipment ordinarily used to heat substrates placed in the chamber. The getter material of the device may also be activated in a separate activation chamber before the getter device is loaded into the vacuum chamber.

Abstract: A getter device is shaped like a substrate used in a deposition process. Embodiments of the device include a powdered getter material coated onto one or both sides of a support with a narrow rim portion left uncoated so that the device can be manipulated by automatic handling equipment. A method for using the getter device includes providing a vacuum chamber and automatic handling equipment, loading the device into the chamber, reducing the chamber pressure to a desired value by using the getter device in conjunction with an external pump, removing the getter device and replacing it with a substrate, and depositing a thin film on the substrate. The getter device can be in an activated state when loaded into the chamber, or it can be activated after being loaded by employing heating equipment ordinarily used to heat substrates placed in the chamber. The getter material of the device may also be activated in a separate activation chamber before the getter device is loaded into the vacuum chamber.

Abstract: A getter device is shaped like a substrate used in a deposition process. Embodiments of the device include a powdered getter material coated onto one or both sides of a support with a narrow rim portion left uncoated so that the device can be manipulated by automatic handling equipment. A method for using the getter device includes providing a vacuum chamber and automatic handling equipment, loading the device into the chamber, reducing the chamber pressure to a desired value by using the getter device in conjunction with an external pump, removing the getter device and replacing it with a substrate, and depositing a thin film on the substrate. The getter device can be in an activated state when loaded into the chamber, or it can be activated after being loaded by employing heating equipment ordinarily used to heat substrates placed in the chamber. The getter material of the device may also be activated in a separate activation chamber before the getter device is loaded into the vacuum chamber.

Abstract: A getter system for purifying the gaseous atmosphere within a confinement volume of a process chamber is disclosed. In a process chamber provided with at least one screen that defines a confinement volume, the getter system includes at least one substantially planar getter device disposed within the confinement volume such that the at least one getter device is substantially parallel to and spaced apart from the at least one screen. The at least one getter device has an inner surface facing the at least one screen and an outer surface facing the confinement volume, with at least the inner surface being formed of getter material. The at least one getter device is spaced apart from the at least one screen such that the inner surface and the at least one screen define an inner space that is in gas flow communication with the confinement volume.

Abstract: A getter system for purifying the gaseous atmosphere within a confinement volume of a process chamber is disclosed. In a process chamber provided with at least one screen that defines a confinement volume, the getter system includes at least one substantially planar getter device disposed within the confinement volume such that the at least one getter device is substantially parallel to and spaced apart from the at least one screen. The at least one getter device has an inner surface facing the at least one screen and an outer surface facing the confinement volume, with at least the inner surface being formed of getter material. The at least one getter device is spaced apart from the at least one screen such that the inner surface and the at least one screen define an inner space that is in gas flow communication with the confinement volume.