Abstract: A method for printing a pattern from a hologram mask into a photosensitive layer on a substrate, which method includes arranging the hologram mask on a coupling element, arranging the substrate so that it is substantially parallel with the hologram mask and separated from it by an amount substantially corresponding to the focal distance of the hologram mask, reconstructing the pattern recorded in the hologram mask by scanning an exposure beam of substantially collimated across the hologram mask while continuously measuring the local separation between the hologram mask and substrate in at least two locations where the pattern is being reconstructed by scanning at least two focus beams across the hologram mask, and continuously adjusting the separation and the angle of tilt between the hologram mask and substrate in order that the pattern reconstructed from the hologram mask is accurately focussed onto the photosensitive layer on the substrate.

Abstract: The present invention relates to a method and an apparatus for forming a hologram from a mask. According to the invention a photoresist is used as the holographic recording medium and the planes of polarisation of the object and reference beams incident on the holographic recording medium are arranged such that their polarisation vectors are substantially mutually orthogonal in the holographic recording medium and such that the polarisation vectors of the incident and totally internally reflected reference beams are also substantially orthogonal. Preferably, just the transmission hologram is formed in the holographic recording layer.

Abstract: A method is disclosed for reconstructing an image from a total internal reflection hologram that includes the steps of arranging the hologram in relation to the first face of a coupling body, generating a substantially collimated illumination beam, directing the beam through a second face of the coupling body so that it reconstructs the image recorded in the hologram, recycling at least once the light in the illumination beam that is reflected from the hologram by redirecting it through the second face of the coupling body so that it also reconstructs the image recorded in the hologram, and scanning the illumination and recycled beams across the hologram, for the purpose of increasing the effective reconstruction efficiency of the total internal reflection hologram.

Abstract: A method is disclosed for reconstructing an image from a total internal reflection hologram that includes the steps of arranging the hologram in relation to the first face of a coupling body, generating a substantially collimated illumination beam, directing the beam through a second face of the coupling body so that it reconstructs the image recorded in the hologram, recycling at least once the light in the illumination beam that is reflected from the hologram by redirecting it through the second face of the coupling body so that it also reconstructs the image recorded in the hologram, and scanning the illumination and recycled beams across the hologram, for the purpose of increasing the effective reconstruction efficiency of the total internal reflection hologram.

Abstract: Lithography processes that use multiple layers require registration between layers. The accuracy requirement depends on the application of the lithograph. For microlithography, the registration requirement could be less than one micron. Systems that use lenses for imaging such as optical steppers can image conventional alignment marks through those lenses. A unique microlithography system that employs holograms has properties that are not compatible with known alignment techniques. The present invention is a new system for alignment of holographic microlithography elements.

Abstract: The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask in a holographic recording layer. In holographic lithography the object beam is directed to the first substrate bearing a holographic recording layer such that it passes the mask substrate and interferes with a reference beam in the recording layer to form a hologram of the mask pattern. According to the new method the object beam is directed to the second substrate at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.

Abstract: An apparatus is disclosed for changing the scale of a pattern printed from a total internal reflection hologram into a photosensitive layer, which apparatus includes means for reconstructing an image from said total internal reflection hologram by illuminating said total internal reflection hologram with a scanning beam and means for moving at least one of the hologram and photosensitive layer such that the magnitude of movement of the hologram relative to the photosensitive layer is equal to that of the scanning beam multiplied by the change of scale required and such that if said change of scale is a magnification the direction of said movement of the hologram relative to the photosensitive layer is the same as that of the scanning beam whereas if said change of scale is a demagnification then the direction of said movement of the hologram relative to the photosensitive layer is opposite to that of the scanning beam, and optionally comprising also means for increasing or reducing the convergence or divergen