Abstract: A PECVD coating apparatus includes a vacuum coating chamber for performing a PECVD process. At least one pair of spaced apart electrodes is positioned within the chamber and powered by an electric power supply generator to produce a plasma discharge generating voltage between the electrodes. Gas is fed between the electrodes in the chamber for producing a plasma discharge reaction that, in turn, forms a coating reaction product. A holding member is placed in the chamber for positioning one or more workpieces with their opposite surfaces at equally spaced positions from each of the electrodes of the pair of electrodes. The workpieces are electrically isolated from the chamber through the holding member so that a free floating electrical potential is maintained on the workpieces. As a result, the opposite surfaces of the workpieces are substantially identically coated in the chamber using the PECVD process.

Abstract: In order to dispose substrates, such as lenses, having different sizes in a working installation, a holding arrangement comprises a spring clasp (3) provided for the clamping holding of the substrates or lenses, which spring clasp is suitable for disposition in a holding device (9) of the arrangement.

Abstract: In a plasma-enhanced chemical vapor deposition method, in order to achieve greater space for positioning workpieces to be coated simultaneously and essentially identically on all sides, the workpiece are positioned at a distance from one electrode on the basis of a coating rate gradient.