Patents by Inventor Franciscus Andreas Cornelis Spanjers

Franciscus Andreas Cornelis Spanjers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic support structure
    Publication number: 20080297758
    Abstract: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
    Type: Application
    Filed: June 26, 2008
    Publication date: December 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Van Meer, Patrick Johannes Cornelus Smulders, Franciscus Andreas Cornelis Spanjers, Johannes Petrus Martinus Ber Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050219481
    Abstract: A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system which supplies liquid between the projection system and the substrate.
    Type: Application
    Filed: April 2, 2004
    Publication date: October 6, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Henrikus Herman Cox, Petrus Marinus Christianus Van Den Biggelaar, Frits Meulen, Franciscus Andreas Cornelis Spanjers, Jan-Gerard Van Der Toorn, Arend-Jan Migchelbrink