Patents by Inventor Franciscus Antonius Chrysogonus Marie Commissaris

Franciscus Antonius Chrysogonus Marie Commissaris has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
    Patent number: 7626684
    Abstract: A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
    Type: Grant
    Filed: June 16, 2008
    Date of Patent: December 1, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Andre Bernardus Jeunink, M'hamed Akhssay, Johannes Jacobus Matheus Baselmans, Franciscus Antonius Chrysogonus Marie Commissaris, Simon De Groot, Wim Tjibbo Tel, Alexander Hendrikus Martinus Van der Hoff, Arnout Van de Stadt, Remco Marcel Van Dijk
  • Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
    Publication number: 20080252870
    Abstract: A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
    Type: Application
    Filed: June 16, 2008
    Publication date: October 16, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andre Bernardus Jeunink, M'hamed Akhssay, Johannes Jacobus Matheus Baselmans, Franciscus Antonius Chrysogonus Marie Commissaris, Simon De Groot, Wim Tjibbo Tel, Alexander Hendrikus Martinus Van Der Hoff, Amout Van De Stadt, Remco Marcel Van Dijk
  • Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
    Patent number: 7403264
    Abstract: A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image. Adjustments may therefore be determined optimally for a given application.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: July 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Andre Bernardus Jeunink, M'hamed Akhssay, Johannes Jacobus Matheus Baselmans, Franciscus Antonius Chrysogonus Marie Commissaris, Simon De Groot, Wim Tjibbo Tel, Alexander Hendrikus Martinus Van Der Hoff, Arnout Van De Stadt, Remco Marcel Van Dijk
  • Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus
    Patent number: 7262831
    Abstract: A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.
    Type: Grant
    Filed: December 1, 2004
    Date of Patent: August 28, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: M'hamed Akhssay, Johannes Jacobus Matheus Baselmans, Franciscus Antonius Chrysogonus Marie Commissaris, Simon De Groot, Andre Bernardus Jeunink, Wim Tjibbo Tel, Alexander Hendrikus Martinus Van Der Hoff, Arnout Van De Stadt
  • Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6563564
    Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: May 13, 2003
    Assignee: ASM Lithography B.V.
    Inventors: Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden
  • Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020036758
    Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect.
    Type: Application
    Filed: June 12, 2001
    Publication date: March 28, 2002
    Inventors: Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden