Abstract: The present invention is directed to RNA monomers comprising O-acetal levulinyl protecting groups at the 2? and/or the 5?-hydroxy functionalities of the ribose moiety. Said monomers may be incorporated into oligoribonucleotides or RNA polynucleotides. Furthermore, the invention is directed to methods for the synthesis of said RNA monomers, oligoribonucleotides and RNA polynucleotides, as well as methods for their deprotection and methods for the use of said compounds and compositions comprising said compounds. In particular, such compounds and compositions comprising them are used in methods for light-directed synthesis of RNA microarrays.

Abstract: The present invention is directed to RNA monomers comprising O-acetal levulinyl protecting groups at the 2? and/or the 5?-hydroxy functionalities of the ribose moiety. Said monomers may be incorporated into oligoribonucleotides or RNA polynucleotides. Furthermore, the invention is directed to methods for the synthesis of said RNA monomers, oligoribonucleotides and RNA polynucleotides, as well as methods for their deprotection and methods for the use of said compounds and compositions comprising said compounds. In particular, such compounds and compositions comprising them are used in methods for light-directed synthesis of RNA microarrays.

Abstract: The present invention is directed to RNA monomers comprising O-acetal levulinyl protecting groups at the 2? and/or the 5?-hydroxy functionalities of the ribose moiety. Said monomers may be incorporated into oligoribonucleotides or RNA polynucleotides. Furthermore, the invention is directed to methods for the synthesis of said RNA monomers, oligoribonucleotides and RNA polynucleotides, as well as methods for their deprotection and methods for the use of said compounds and compositions comprising said compounds. In particular, such compounds and compositions comprising them are used in methods for light-directed synthesis of RNA microarrays.

Abstract: A device and a method for synthesizing a microarray are provided. The device includes a reduction optics assembly and a target assembly. The reduction optics assembly is configured to receive a light array of selectable regions of light and dark areas, to reduce a size of the light array in two-dimensions, and to project a pattern of the light array on a target surface. The target assembly includes a first stage and a second stage. The first stage is configured to move the target surface in at least two directions in plane with the projected pattern with a first precision. The second stage is mounted to the first stage and is configured to move the target surface in the at least two directions in plane with the projected pattern with a second precision that is smaller than the first precision.

Abstract: The present invention is directed to RNA monomers comprising O-acetal levulinyl protecting groups at the 2? and/or the 5?-hydroxy functionalities of the ribose moiety. Said monomers may be incorporated into oligoribonucleotides or RNA polynucleotides. Furthermore, the invention is directed to methods for the synthesis of said RNA monomers, oligoribonucleotides and RNA polynucleotides, as well as methods for their deprotection and methods for the use of said compounds and compositions comprising said compounds. In particular, such compounds and compositions comprising them are used in methods for light-directed synthesis of RNA microarrays.

Abstract: A prepared substrate upon which light directed DNA synthesis is to occur is exposed to light via an inverse mask pattern to deprotect inactive regions of the substrate where the synthesis is not intended to occur. The deprotected sites are then capped to disable permanently the inactive areas, thereby forming an inverse capped substrate. Unwanted DNA synthesis in the inactive areas is thus prevented, resulting in purer quality DNA, even though such areas may be exposed to light due to diffraction, scattering and flare during subsequent DNA synthesis of the intended active areas of the substrate.

Abstract: Methods for synthesizing chain molecules on particles in a multi-stream laminar flow, microfluidic reaction cells in which the methods can be carried out, and microfluidic systems incorporating the microfluidic reaction cells are provided. The methods, cells and systems are well suited for the rapid, large-scale production of chain biomolecules, such as oligonucleotides, in parallel.

Abstract: A method is disclosed for the direct synthesis of double stranded DNA molecules of a variety of sizes and with any desired sequence. The DNA molecule to be synthesis is logically broken up into smaller overlapping DNA segments. A maskless microarray synthesizer is used to make a DNA microarray on a substrate in which each element or feature of the array is populated by DNA of a one of the overlapping DNA segments. The complement of each segment is also made in the microarray. The DNA segments are released from the substrate and held under conditions favoring hybridization of DNA, under which conditions the segments will hybridize to form duplexes. The duplexes are then separated using a DNA binding agent which binds to improperly formed DNA helixes to remove errors from the set of DNA molecules. The segments can then be hybridized to each other to assemble the larger target DNA sequence.

Abstract: Synthesis of arrays of chain molecules, such as oligonucleotides, in large quantities can be carried out utilizing projection onto an active substrate of a magnified image of a light emitting object array having selectable regions of light and dark areas forming a pattern. Projection optics formed entirely of mirrors are used to receive the light emitted from the object array and image the pattern of the array onto the active surface of the substrate. The mirrors in the projection optics include a first, concave mirror, a second, convex mirror, a third, concave mirror, and a fourth, convex mirror, each receiving the beam of light in turn, with the light reflected from the fourth mirror being imaged onto the active surface of the substrate with an image area greater than that of the original light emitting array.

Abstract: A device and a method for synthesizing a microarray are provided. The device includes a reduction optics assembly and a target assembly. The reduction optics assembly is configured to receive a light array of selectable regions of light and dark areas, to reduce a size of the light array in two-dimensions, and to project a pattern of the light array on a target surface. The target assembly includes a first stage and a second stage. The first stage is configured to move the target surface in at least two directions in plane with the projected pattern with a first precision. The second stage is mounted to the first stage and is configured to move the target surface in the at least two directions in plane with the projected pattern with a second precision that is smaller than the first precision.

Abstract: The present invention provides a substrate, system and method for synthesizing chain molecules in parallel using light-directed chemistry by imaging a selected pattern of light onto a dense array of microwells extending into a substrate surface, wherein the microwells are packed with high-surface-area carrier particles on which the chain molecules are grown in a series of sequential photoinitiated chemical steps.

Abstract: Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.

Abstract: Synthesis of arrays of chain molecules, such as oligonucleotides, in large quantities can be carried out utilizing projection onto an active substrate of a magnified image of a light emitting object array having selectable regions of light and dark areas forming a pattern. Projection optics formed entirely of mirrors are used to receive the light emitted from the object array and image the pattern of the array onto the active surface of the substrate. The mirrors in the projection optics include a first, concave mirror, a second, convex mirror, a third, concave mirror, and a fourth, convex mirror, each receiving the beam of light in turn, with the light reflected from the fourth mirror being imaged onto the active surface of the substrate with an image area greater than that of the original light emitting array.

Abstract: A prepared substrate upon which light directed DNA synthesis is to occur is exposed to light via an inverse mask pattern to deprotect inactive regions of the substrate where the synthesis is not intended to occur. The deprotected sites are then capped to disable permanently the inactive areas, thereby forming an inverse capped substrate. Unwanted DNA synthesis in the inactive areas is thus prevented, resulting in purer quality DNA, even though such areas may be exposed to light due to diffraction, scattering and flare during subsequent DNA synthesis of the intended active areas of the substrate.

Abstract: A method is disclosed for the direct synthesis of double stranded DNA molecules of a variety of sizes and with any desired sequence. The DNA molecule to be synthesis is logically broken up into smaller overlapping DNA segments. A maskless microarray synthesizer is used to make a DNA microarray on a substrate in which each element or feature of the array is populated by DNA of a one of the overlapping DNA segments. The complement of each segment is also made in the microarray. The DNA segments are released from the substrate and held under conditions favoring hybridization of DNA, under which conditions the segments will hybridize to form duplexes. The duplexes are then separated using a DNA binding agent which binds to improperly formed DNA helixes to remove errors from the set of DNA molecules. The segments can then be hybridized to each other to assemble the larger target DNA sequence.

Abstract: Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.

Abstract: Inspection of objects such as X-ray lithography masks is carried out by passing X-rays or extreme ultraviolet light through an object which absorbs in a pattern to provide a patterned X-ray or ultraviolet image which is then directed to a converter. The converter converts the image incident upon it to an image formed by electrons emitted from the converter. The emitted electrons are magnified in an electron microscope and the magnified electron image is displayed by the electron microscope. The visible image may be further digitized and processed by a computer, including long-term storage or display on a computer monitor. X-ray lithography masks may be inspected by passing X-rays through masks of the same type that will be used for lithography so that the magnified image of the X-rays passed through the masks corresponds to the pattern of X-rays that will be incident on a photoresist, allowing accurate inspection of X-ray masks before use.

Abstract: An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

Abstract: An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

Abstract: An x-ray interface (40) provides increased x-ray collection efficiency for use in x-ray photolithography. The interface (40) comprises a housing (44) having a plurality of mirrored funnels (46) for collecting the x-rays. The mirrored funnels (46) are shaped to partially collimate and focus the x-rays. The interface (40) collects a greater percentage of the available x-rays from an x-ray source, and the interface (40) also permits a greater number of beamlines to be coupled to the x-ray source.