Patents by Inventor Francois A. d'Avitaya

Francois A. d'Avitaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the deposition by epitaxy of a doped material
    Patent number: 4847216
    Abstract: The process consists of depositing at least one layer of a doped material on a heated substrate placed in an enclosure, subjecting the substrate surface to the action of a molecular flux of the material, to the action of a doping particle beam and to the action of an electron beam.
    Type: Grant
    Filed: April 18, 1988
    Date of Patent: July 11, 1989
    Assignee: Centre National d'Etudes des Telecommunications
    Inventors: Francois A. d'Avitaya, Yves Campidelli