Patents by Inventor Frank Bernhard Sperling

Frank Bernhard Sperling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LASER FOCUSSING MODULE
    Publication number: 20220206397
    Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
    Type: Application
    Filed: April 3, 2020
    Publication date: June 30, 2022
    Applicants: ASML Netherlands B.V., Trumpf Lasersystems For Semiconductor Manufacturing GmbH
    Inventors: Ruud Antonius Catharina Maria BEERENS, Nico Johannes Antonius BOONEN, Stefan Michael Bruno BÄUMER, Tolga Mehmet ERGIN, Andreas Kristian HOPF, Derk Jan Wilfred KLUNDER, Martin Anton LAMBERT, Stefan PIEHLER, Manisha RANJAN, Frank Bernhard SPERLING, Andrey Sergeevich TYCHKOV, Jasper WITTE, Jiayue YUAN
  • Positioning device, control device and control method
    Patent number: 9507276
    Abstract: The present invention relates to a positioning device, e.g. for use as a wafer stage, having a very stable temperature, a very low power consumption and a uniform temperature distribution. A long stroke stage (20) and a short stroke stage (50) are stacked upon each other. To initiate a movement of the long stroke stage (20) and the short stroke stage (50) in a desired movement direction (M1) the long stroke stage (20) is first moved in an opposite direction (M2) that is opposite to the desired movement direction (M1) and/or the short stroke stage (50) is first moved in the desired movement direction (M1) for a predetermined time interval and for a distance smaller than the distance (d) between a ferromagnetic center stroke element (52) and the closest one of two actuators (30, 40) in a stationary state of the long stroke stage (20). Subsequently, the long stroke stage (20) is moved in the desired movement direction (M1).
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: November 29, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Anne Johannes Wilhelmus Van Lievenoogen, Frank Bernhard Sperling
  • POSITIONING DEVICE, CONTROL DEVICE AND CONTROL METHOD
    Publication number: 20150235887
    Abstract: The present invention relates to a positioning device, e.g. for use as a wafer stage, having a very stable temperature, a very low power consumption and a uniform temperature distribution. A long stroke stage (20) and a short stroke stage (50) are stacked upon each other. To initiate a movement of the long stroke stage (20) and the short stroke stage (50) in a desired movement direction (M1) the long stroke stage (20) is first moved in an opposite direction (M2) that is opposite to the desired movement direction (M1) and/or the short stroke stage (50) is first moved in the desired movement direction (M1) for a predetermined time interval and for a distance smaller than the distance (d) between a ferromagnetic center stroke element (52) and the closest one of two actuators (30, 40) in a stationary state of the long stroke stage (20). Subsequently, the long stroke stage (20) is moved in the desired movement direction (M1).
    Type: Application
    Filed: September 27, 2013
    Publication date: August 20, 2015
    Applicant: KONINKLIJKE PHILIPS N.V.
    Inventors: Anne Johannes Wilhelmus Van Lievenoogen, Frank Bernhard Sperling
  • Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
    Patent number: 8634052
    Abstract: A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: January 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Suzan Leonie Auer-Jongepier, Jeroen Johannes Sophia Maria Mertens, Frank Bernhard Sperling, Teunis Cornelis Van Den Dool, Eva Mondt, Alexander Nikolov Zdravkov, Paulus Martinus Hubertus Vissers
  • Lithographic apparatus and method
    Publication number: 20080186460
    Abstract: A lithographic apparatus is disclosed that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
    Type: Application
    Filed: November 27, 2007
    Publication date: August 7, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Suzan Leonie Auer-Jongepier, Jeroen Johannes Sophia Maria Mertens, Frank Bernhard Sperling, Teunis Cornelis Van Den Dool, Eva Mondt, Alexander Nikolov Zdravkov, Paulus Martinus Hubertus Vissers